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Bi-stable electrowetting structure and preparation process thereof

A preparation process and bistable technology, applied in optical components, optics, instruments, etc., can solve the problems of low aperture ratio, large size, unfavorable miniaturization, etc., achieve improved reliability, low operating voltage, and easy large-scale processing Effect

Active Publication Date: 2018-10-09
南京晶奥微光电技术有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method needs to block half of the area to achieve the switching effect, the aperture ratio is low, and the size is large, which is not conducive to miniaturization

Method used

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  • Bi-stable electrowetting structure and preparation process thereof
  • Bi-stable electrowetting structure and preparation process thereof
  • Bi-stable electrowetting structure and preparation process thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] A bistable electrowetting structure such as Figure 2 to Figure 4 As shown, it includes a substrate layer 6 (bottom sheet), an encapsulation layer 1 (top sheet), and a pixel pattern layer sealed therebetween, an electrode layer 5, a hydrophobic layer 4, an ink layer 9 and a water layer 3.

[0043] The pixel graphic layer is composed of an array of pixel graphic blocks 7 made of light-transmitting insulating materials, the lower surface of the packaging layer 1 is provided with an ITO conductive layer 2, the hydrophobic layer 4 fully covers the electrode layer 5, and the electrode layer 5 continuously covers All the pixel pattern blocks 7, there is a channel for containing ink between the pixel pattern blocks 7 covering the electrode layer 5 and the hydrophobic layer 4, and the electrode layer part covering the pixel pattern blocks 7 is a pixel electrode 5-1, covering adjacent pixel patterns The portion of the electrode layer between the blocks 7 is the channel electrode...

Embodiment 2

[0056] On the basis of Example 1, in order to ensure a higher display effect, in the step 6), after removing the photoresist and before preparing the hydrophobic layer 4, a layer of insulating medium is prepared on the electrode layer 5 to form a Dielectric layer (not shown), the dielectric layer can be prepared by PECVD method Si 3 N 4 or silicon oxide layer (such as 800nm ​​thick Si 3 N 4 material), or an insulating layer (such as aluminum oxide, hafnium oxide, etc.) grown by ALD method.

Embodiment 3

[0058] On the basis of embodiment one and embodiment two, it is preferred to adopt such as Figure 5 As shown in the electrode pattern, as shown by the solid line in the figure, the rectangular outline etched on the electrode layer on the top surface of the pixel pattern block 7 has a concave arc-shaped part in the lower left corner and upper right corner respectively, forming a double defect electrode. Figure 5 The dotted line in the middle indicates the pixel pattern block, and the solid line represents the dividing line between the pixel electrode and the channel electrode, that is, the place where the electrode layer is etched away in step 5).

[0059] The present invention can realize the processing and preparation of three-dimensional pattern electrodes. In this case, the distance between the electrode and the three-phase contact point of the oil layer, water layer, and hydrophobic layer is greatly reduced. It can be known from the electrowetting theory that when the sta...

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Abstract

The invention discloses a bistable electrowetting structure which comprises a substrate layer located below and an encapsulation layer located above. An array of pixel pattern blocks made of a light-transmissive insulating material is arranged on the substrate layer. The structure is characterized in that an electrode layer, a hydrophobic layer, an ink layer and a water layer are sequentially arranged between the substrate layer and the encapsulation layer; a conductive layer is arranged on the lower surface of the encapsulation layer; the hydrophobic layer completely covers the electrode layer; and the electrode layer continuously covers all pixel pattern blocks. According to the invention, the electrowetting structure can be prepared by a full photolithography process, and is easy to beprocessed on a large scale; due to the special structure design, the distance between the electrode and the water layer is reduced; the working voltage of bistable electrowetting is greatly reduced; the contrast and reliability of bistable electrowetting display can be improved; and transmissive and reflective bistable electrowetting display can be realized.

Description

technical field [0001] The invention belongs to the technical field of electrowetting display, and in particular relates to a bistable electrowetting structure and a preparation process thereof. Background technique [0002] Electrowetting is a phenomenon in which the solid-liquid contact angle can be changed under the condition of an external electric field. The position control of the droplet can be realized by using the electrowetting effect, so as to achieve the switching effect of reflected or transmitted light, such as figure 1 As shown, this switch control effect on light is the basis of electrowetting display technology. Compared with other reflective display technologies, electrowetting display technology has the advantages of fast response (<10ms), color display, high contrast, and high light reflectivity. [0003] The electrowetting device can also be designed as a bistable structure, that is, two stable states of the droplet (display ink) are obtained in the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B26/00
CPCG02B26/005
Inventor 肖长诗梁学磊徐庆宇
Owner 南京晶奥微光电技术有限公司
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