Ion bombardment preparation method for self-organizing nano-structure with saw-toothed outline

A nanostructure and ion bombardment technology, applied in nanotechnology, microstructure technology, microstructure devices, etc., can solve the problem of no blazed grating structure, and achieve the effect of widening the control range, low cost and low cost

Active Publication Date: 2018-11-06
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is almost no research on the use of the new technology of impurity co-deposition to obtain blazed grating-like structures with sawtooth profiles.

Method used

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  • Ion bombardment preparation method for self-organizing nano-structure with saw-toothed outline
  • Ion bombardment preparation method for self-organizing nano-structure with saw-toothed outline
  • Ion bombardment preparation method for self-organizing nano-structure with saw-toothed outline

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Example 1, comparing the surface morphology produced by simple ion bombardment without introducing impurities and ion bombardment introducing impurities:

[0053] The fused silica sample (20mm×20mm×2mm) to be processed was ultrasonically soaked in acetone or soaked in SPM solution (concentrated sulfuric acid:hydrogen peroxide=2:1) ​​for 30 minutes. After taking it out, rinse it with 80°C deionized water for 5 minutes. Finally put it into an oven at 110°C and bake for 30 minutes. The surface of the high-purity molybdenum metal target to be bombarded (purity 99.99%, 10mm×20mm×1mm) was polished to a mirror-like state with 7000-grit sandpaper, and then ultrasonically cleaned with acetone.

[0054] Complete the pretreatment of high-purity molybdenum metal target according to figure 1 The geometric relationship shown is fixed on the fused silica sample, and then the fused silica sample is fixed on the sample stage of the ion bombardment equipment with vacuum silicone grease...

Embodiment 2

[0059] Implementation example 2 shows how to regulate the structure facet angle by adjusting the ion beam incident angle θ:

[0060] The pretreatment process is consistent with the implementation example 1, but the fixed ion beam energy is 500eV, and the beam current density is 300μA cm -2 , The ion bombardment time is 30min, and the ion bombardment experiment is carried out on the fused silica samples to be processed under different ion beam incident angles θ, so as to obtain the sawtooth profile self-organized nanostructure with different facet angles; Use AFM to detect the surface morphology of the fused silica sample at the position of , and obtain AFM data, such as Figure 4 shown. Figure 5 is a schematic diagram of the facet angle of the cross-sectional view of the AFM image of the sample surface in the incident plane of the ion beam, where α - is the facet angle of the surface profile facing the direction of the ion beam, α + is the facet angle of the surface profil...

Embodiment 3

[0062] Example 3 is implemented, showing how to adjust the pattern period and amplitude by adjusting the ion bombardment time:

[0063] Pretreatment process is consistent with embodiment 1, but fixed ion beam incident angle 50 ° (as Figure 7 shown), ion beam energy 500eV, beam current density 300μA cm -2 , the ion bombardment experiments were carried out under different ion bombardment time t (ion beam flux) to obtain sawtooth profiles with different amplitudes and periods; after the ion bombardment experiments were completed, the AFM was used to detect the fused silica sample at a position 5mm away from the impurity target. Surface topography, get AFM data, such as Figure 8 shown. Figure 9 , 10 It is shown that the roughness and period of the pattern increase with the increase of ion bombardment time, and the facet angle is stable after 30 minutes of bombardment, so after the facet is stabilized, the amplitude and period of the sawtooth profile can be controlled by adju...

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Abstract

The invention relates to an ion bombardment preparation method for a self-organizing nano-structure with a saw-toothed outline. The self-organizing nano-structure with the certainly ordered saw-toothed outline and a period of about 100 nanometers can be directly inductively generated on the surface of smooth fused quartz through the combination of argon ion beam bombardment and simultaneous impurity deposition, and thus the method is a simple and economical self-organizing nano-structure manufacturing technology that efficiently generates a quasi-blazed grating structure with the hundred-nanometer scale period. According to the method provided by the invention, the feature size of the acquired nano-structure can be controlled through adjusting the parameters (such as the bombardment time and the incident angle of the ion beam) of the ion beam when in ion bombardment. The invention provides a preferred range of ion beam parameter adjustment and a preferred principle of impurity target material. The method provided by the invention is also applicable to various solid materials such as a monocrystal silicon sample, and the ion beam can be one kind of inert gas ions from helium, neon,argon, krypton and xenon.

Description

technical field [0001] The invention belongs to the technical field of manufacturing nanostructures on solid surfaces, and in particular relates to a method for preparing self-organized nanostructures with zigzag profiles, ie, blazed grating-like structures, on the surface of fused silica induced by ion bombardment technology. Background technique [0002] In recent years, the new technology of generating nanostructures by ion bombardment has gradually attracted the attention of the scientific research community. This technology uses the roughness and smoothness effects produced by ion bombardment on the surface of the material to spontaneously form a certain nanostructure on the surface. It is a new idea for simple, economical and large-scale fabrication of quasi-periodic nanostructures. The self-organized nanostructure obtained by this technology has many advantages: 1. There are many types of processing materials, and nanostructures can be produced on various materials su...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/3065B81C1/00B82Y40/00
CPCB81C1/00404B82Y40/00H01L21/3065
Inventor 刘颖陈德康洪义麟
Owner UNIV OF SCI & TECH OF CHINA
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