a kind in tio 2 Pulse chemical vapor deposition of amorphous tio on particle surfaces 2 Methods

A chemical vapor deposition, particle surface technology, used in gaseous chemical plating, metal material coating process, coating and other directions, can solve problems such as cost increase, the impact of titanium dioxide pigment optical properties, etc., to achieve easy operation, high color loss strength, and the effect of enhancing weather resistance

Active Publication Date: 2021-01-26
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the introduction of heterogeneous oxides will affect the optical properties of titanium dioxide pigments to a certain extent, and at the same time, the introduction of other raw materials in the industry will increase the cost

Method used

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  • a kind in tio <sub>2</sub> Pulse chemical vapor deposition of amorphous tio on particle surfaces <sub>2</sub> Methods
  • a kind in tio <sub>2</sub> Pulse chemical vapor deposition of amorphous tio on particle surfaces <sub>2</sub> Methods

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] a. Dry the anatase titanium dioxide at 120 °C for 90 minutes to remove the adsorbed water on the surface of the titanium dioxide.

[0020] b. Weigh 1.5g of dried titanium dioxide and disperse it in a petri dish, and place it in a vacuum desiccator.

[0021] c. Take a certain amount of TiCl with a sample bottle 4 , and placed in a vacuum desiccator, and evacuated to a vacuum degree of 0.095Mpa.

[0022] d. After standing for 60 min, part of the unreacted TiCl 4 Pump into the NaOH solution, then open the cover, let the water vapor in the air enter the reactor, and let it stand for 30 minutes, take out the titanium dioxide, and bake it in an oven at 105 °C for 120 minutes.

[0023] e. Repeat the above operations to increase amorphous TiO 2 Thickness of the film.

[0024] Take a small amount of the above-mentioned method obtained through 1 time ( figure 1 b), 2 times ( figure 1 c) and 3 times ( figure 1 d) coated titanium dioxide, and with uncoated titanium dioxide (...

Embodiment 2

[0027] a. Dry the titanium dioxide in a desiccator to remove the outer layer of adsorbed water on the surface of the titanium dioxide.

[0028] b. Take 1 Kg of dried titanium dioxide and place it in a titanium reactor with a volume of 15L (d=0.3 m, H=0.2 m).

[0029] c. Vacuum until the vacuum degree of the reactor is 0.095MPa, and then open the 4 connected to the valve so that the TiCl 4 Volatilize into the reactor, and place the whole reactor on the shaker for 100 min to shake TiCl 4 Full contact with titanium dioxide.

[0030] d. After the reaction, part of the unreacted TiCl 4 After the NaOH solution is pumped into the reactor, humid air containing relatively high water vapor is passed into the reactor to make the TiCl connected to the hydroxyl group 4 further hydrolysis.

[0031] e. Dry the coated titanium dioxide at 105°C, and repeat the above process to obtain amorphous TiO with different thicknesses 2 film.

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Abstract

The present invention discloses in TiO 2 Particle Surface Pulsed Chemical Vapor Deposition of Amorphous TiO 2 Methods. Coating SiO on the Surface of Titanium Dioxide 2 , Al 2 O 3 , and other inert materials can effectively inhibit its photocatalytic activity. At present, TiO is usually coated by liquid deposition technology in industrial applications. 2 surface, but the liquid-phase coating method cannot precisely control the thickness and uniformity of the film. We previously proposed a method for gas-phase atomic titanium dioxide coating on TiO 2 A layer of SiO with a thickness of 3 nm is deposited on the surface of the particles 2 film. However, excess SiO 2 Coating may also lead to TiO 2 The achromatic power is reduced because SiO 2 The refractive index of (1.46) is higher than that of anatase TiO 2 (2.55) low. The present invention proposes a method for pulsed chemical vapor deposition, using TiCl 4 It is the precursor of Ti, which is mixed with TiO at room temperature 2 The surface hydroxyl groups react to form uniform amorphous TiO with a thickness of 3 nm 2 film. Coated amorphous TiO 2 The photocatalytic activity of the titanium dioxide was effectively suppressed, and with the coated SiO 2 Compared with the latter sample, its achromatic power is obviously enhanced.

Description

technical field [0001] The invention relates to the field of chemical industry, in particular to a pulse chemical vapor phase deposition of amorphous TiO on the surface of pigment titanium dioxide particles 2 Methods. Background technique [0002] Due to its excellent physicochemical properties, TiO 2 White pigments are widely used in coatings, pharmaceuticals, plastics, cosmetics, synthetic fibers and papermaking. However TiO 2 The photocatalytic activity of the paint causes the degradation of organic molecules in the paint, especially when exposed to sunlight and ultraviolet light, resulting in discoloration and peeling of the paint. In order to suppress its photocatalytic activity, TiO 2 Pigments are usually coated with inert substances such as SiO 2 、Al 2 o 3 , ZrO 2 , NiO, CoO, CeO 2 , or SiO 2 -Al2O 3 . At present, TiO is usually processed by liquid phase deposition technology in industrial applications. 2 Surface coating, however, in these processes, the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/40C23C16/455
CPCC23C16/405C23C16/4417C23C16/45523
Inventor 梁斌于洋洋
Owner SICHUAN UNIV
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