Self-adaption harmonic wave confocal microscopic measurement method for illumination of ellipsoidal reflector

A technology of mirror illumination and confocal microscopy, applied in measuring devices, material analysis through optical means, instruments, etc., can solve the problems of reduced excitation efficiency of harmonic signals, interference of harmonic signal analysis, and reduction of optical microscopic systems, etc. Achieve the effect of improving measurement resolution and deep image

Inactive Publication Date: 2018-12-11
HARBIN INST OF TECH
View PDF13 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of harmonic microscopy imaging, aliasing signal noise will interfere with the analysis of harmonic signals, thereby reducing the measurement resolution of the microscopy system
The aberrations of the optical microscopy system will also reduce the excitation efficiency of harmonic signals and reduce the resolution of harmonic microscopy imaging

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-adaption harmonic wave confocal microscopic measurement method for illumination of ellipsoidal reflector

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] The implementation examples of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0013] The schematic diagram of the ellipsoid mirror illumination adaptive harmonic confocal microscopic measurement method in this embodiment is as follows figure 1 shown. The femtosecond laser pulse enters the adaptive optical aberration compensation unit after being beam shaped and reflected by the scanning galvanometer. After phase modulation and aberration correction, it forms an illumination beam that enters the ellipsoid mirror system and converges inside the sample to form a harmonic signal. Desired focus spot for excitation. After the sample is excited by the excitation light, the second and third harmonic signals will be generated simultaneously, which will be collected and analyzed by the two-way composite confocal microscopic measurement system on the right. After the harmonic signal is collected by a large numerical apert...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a self-adaption harmonic wave confocal microscopic measurement method for the illumination of an ellipsoidal reflector, belonging to the non-linear optical measurement. According to the method, an ellipsoidal reflection illumination system, a confocal microscopic measurement method, a self-adaption optical aberration correction method and a harmonic wave microscopic methodare organically combined, so that the harmonic wave microscopic measurement resolving power can be improved. A femtosecond laser pulse is subjected to beam shaping and scanning galvanometer reflection, enters the self-adaption optical aberration correction method and is subjected to phase modulation and aberration correction to generate illumination beams, and the illumination beams enter an ellipsoidal reflection mirror system and are assembled into a sample so as to generate stimulation focus light spots required by the generation of harmonic signals. The sample is stimulated by stimulationlight to simultaneously generate second and third harmonic signal, and the second and third harmonic signals are collected and analyzed by a double-path composited confocal microscopic measurement system on the right side. After being collected by a large-numerical aperture objective lens, the harmonic signals are separated into two wavelength signals by a bidirectional color selective mirror, are focused by a narrow band pass filter and an imaging objective lens, are transmitted through a needle hole and are received by a photomultiplier (PMT). An adopted harmonic wave collection module adopts a confocal collection mode. By virtue of an apodization effect of a confocal needle hole, the interference caused by aliasing signal noise to the analysis of the harmonic signals can be effectivelyinhibited, and the measurement resolving power of the microscopic system can be greatly improved.

Description

technical field [0001] The invention belongs to the field of optical microscopic measurement, and mainly relates to an ultra-precise non-contact measurement method for measuring three-dimensional fine structures in nano devices and biological samples. Background technique [0002] By using the nonlinear optical effects of the sample itself, such as second harmonic generation and third harmonic generation, microscopic imaging of biological samples without fluorescent labels, microstructure detection of nano-devices, and diagnosis of disease mechanisms can be performed. Radially polarized light has a strong axially polarized component at the focused focal plane and is an ideal illumination light mode for harmonic generation. However, in the process of harmonic microscopy imaging, aliasing signal noise will interfere with the analysis of harmonic signals, thereby reducing the measurement resolution of the microscopy system. The aberration of the optical microscope system will ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/63G01N21/01
CPCG01N21/01G01N21/63G01N2021/0106
Inventor 王伟波刘俭吴必伟谭久彬
Owner HARBIN INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products