Photocatalytic nitrogen-fixation Zn-doped indium oxide photocatalyst material as well as preparation method and application thereof

Abstract

The invention relates to a photocatalytic nitrogen-fixation Zn-doped indium oxide photocatalyst material as well as a preparation method and application thereof. The photocatalyst material is an iron-manganese ore type oxide and has a spherical microstructure, the particle size is 20nm-80nm, and the molecular formula is In1-xZnxO3, wherein x is more than 0 and less than or equal to 0.15. The preparation method comprises the steps of preparing a carbon sphere by virtue of a hydrothermal method, ammoniating the carbon sphere so as to obtain a carbon sphere template, and synthesizing and preparing the photocatalyst material by virtue of the carbon sphere template through a solvothermal method. By doping Zn, the oxygen vacancy concentration of In2O3 of a cubic iron-manganese ore structure is adjusted and controlled, so that the performance of photocatalytic nitrogen-fixation synthesis ammonia is improved, the photocatalyst material has a good visible light absorption property and a relatively large specific surface area, is rich in oxygen vacancies and beneficial to the adsorption of nitrogen and the dissociation of N-N bonds, can present excellent chemical stability in the applicationof photocatalytic nitrogen-fixation synthesis ammonia and can be circularly utilized.

Description

technical field [0001] The invention relates to the technical field of semiconductor photocatalytic nitrogen fixation and synthesis of ammonia, in particular to a photocatalytic nitrogen fixation Zn-doped indium oxide photocatalyst material and a preparation method and application thereof. Background technique [0002] Ammonia is a bulk product of modern chemical industry and the basic guarantee for agricultural development. The synthetic ammonia industry occupies a pivotal position in the national economy. At present, free nitrogen fixation is mainly through biological processes and chemical processes. Although biological nitrogen fixation conditions are mild and the reaction is efficient, it can only occur in a few plants and microorganisms, and it is difficult to achieve large-scale production and application. The Haber-Bosch (H-B) process in the early 20th century was the first to industrially synthesize ammonia through chemical reactions, revolutionizing the production ...

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Problems solved by technology

At present, free nitrogen fixation is mainly through biological processes and chemical processes. Although biological nitrogen fixation conditions are mild and the reaction is efficient, it can only occur in a few plants and microorganisms, and it is difficult to achieve large-scale production and application.

The Haber-Bosch (H-B) process in the early 20th century was the first to industrially synthesize ammonia through chemical reactions, revolutionizing the production of fertilizers and leading to fundamental changes in the way food is produced. Today, about 50% of the nitrogen atoms in human life still come from This is a single industrial process, but the traditional H-B industrial ammonia synthesis will consume nearly 2% of the world's total energy supply and is accompanied by a large amount of greenhouse gas emissions. Artificial nitrogen fixation method is imminent

In summary, oxygen vacancies play an extremely important role in the semiconductor photocatalytic nitrogen fixation and ammonia synthesis reaction. However, the performance of photocatalytic nitrogen fixation and ammonia synthesis still needs to be improved, and the adsorption of nitrogen and the dissociation ability of N≡N bonds are not enough. Requirements, common photocatalysts such as titanium dioxide have a low utilization rate of sunlight, generally less than 10%, and can only synthesize ammonia under high-intensity ultraviolet lamp radiation. Therefore, it is of great significance to prepare photocatalysts with suitable energy bands and realize visible light nitrogen fixation.

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