Surface plasmon lens design method used for nano-gap type near-field lithography

Abstract

The invention discloses a surface plasmon lens design method used for nano-gap type near-field lithography. According to the propagation characteristic of surface plasmons on the surface of an air / photoresist multilayer continuous dielectric, a concentric alternating semi-circular groove structure which enables beams to achieve super-diffraction-limited bunching in a nano-gap layer and maintain the bunching ability in a photoresist layer is designed. An ultra-small bow structure is designed at the center of the semi-circular groove is designed to excite a local surface plasmon with super-binding ability. The etching ability of a bunching light spot to penetrate the photoresist layer in the longitudinal direction is further enhanced. The concentric alternating semi-circular groove bow composite structure can form reflection electromagnetic wave coupling with a nanostructured metal film layer prepared on the surface of a disk. The energy-enhanced and small-sized bunching light spot is formed at the center of the bow, which helps to improve the depth-to-width ratio of nano-pattern processing. High-efficiency, high-resolution and low-cost nanofabrication can be realized.

Description

technical field [0001] The invention belongs to the technical field of nano-processing, and relates to a surface plasmon excitation method for realizing large aspect ratio near-field optical etching, in particular to a surface plasmon lens for nano-gap near-field lithography design method. Background technique [0002] Optical exposure is the use of optical imaging to image the mask pattern onto the photoresist surface. During the processing, the resolution of the processed pattern is an important basis for measuring the integration of the processed pattern. Limited by the optical diffraction limit, to obtain smaller processing size and higher processing resolution, higher resolution can be obtained by reducing the wavelength of incident light, increasing optical numerical aperture or reducing process parameters. Some methods that can break through the diffraction limit can also be used to achieve super-resolution beamforming. For the photolithography technology commonly u...

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Problems solved by technology

[0006] The purpose of the present invention is to provide a surface plasmon lens design method for nano-gap near-field lithography to solve the problems of low aspect ratio and poor image quality in nano-pattern processing of rotating field

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