Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Compact surface-enhanced Raman spectroscopy (SERS) substrate and preparation method and application thereof

A surface-enhanced Raman, dense technology, applied in Raman scattering, technology for producing decorative surface effects, optics, etc., can solve the problem of high-cost large-scale instruments, difficult to achieve low-concentration rapid detection, and reduce surface-enhanced Raman. The amount of the precious metal in the base and its stability, etc., can achieve the effect of short detection time, guaranteed stability and reproducibility, and high reproducibility

Inactive Publication Date: 2019-04-05
EAST CHINA NORMAL UNIVERSITY
View PDF3 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The prepared substrate has both chemical enhancement effect and electromagnetic enhancement effect, which reduces the amount of noble metal used in the surface-enhanced Raman substrate and its stability, and solves the problems of high cost and complex large-scale instruments, and it is difficult to achieve low-concentration rapid detection. It has great application prospects in environmental, medical and other fields.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Compact surface-enhanced Raman spectroscopy (SERS) substrate and preparation method and application thereof
  • Compact surface-enhanced Raman spectroscopy (SERS) substrate and preparation method and application thereof
  • Compact surface-enhanced Raman spectroscopy (SERS) substrate and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] A substrate for surface-enhanced Raman spectroscopy and its preparation method and application, comprising the following specific steps:

[0039] Step 1: Washing Glass Slides Depositing Raman Active Species

[0040] Clean the glass slides cut into a size of 2 cmⅹ2 cm with detergent to remove the surface dirt, then wash off the detergent with water, then use 20% HF for ten minutes to remove surface impurities, and use acetone and alcohol to ultrasonically clean them for 20 minutes. min, and finally ultrasonically cleaned with deionized water for 30 min, taken out and dried in an oven at 50 °C for later use;

[0041] Step 2: Modification of polymethylsiloxane (PDMS) on glass slides

[0042] The pre-PDMS polymer and curing agent were evenly mixed at a mass ratio of 10:1, put in a vacuum oven for degassing for 20 min, and then the treated polymer was evenly spin-coated on the surface of a glass slide. Put it in an oven at 100 ℃ for 30 minutes to cure, take it out and cool...

Embodiment 2

[0055] A substrate for surface-enhanced Raman spectroscopy and its preparation method and application, comprising the following specific steps:

[0056] Step 1: Cleaning the wafer on which the Raman active species is deposited

[0057] Clean the silicon wafers cut into a size of 1.5cmⅹ1.5cm with detergent to remove the surface dirt, then wash off the detergent with water, then soak in piranha solution for 10 minutes to remove surface impurities, and ultrasonically clean with acetone and alcohol for 20 minutes respectively , and finally ultrasonically cleaned with deionized water for 30 minutes, taken out and dried in a 60°C oven for later use;

[0058] Step 2: Modification of polymethylsiloxane (PDMS) on silicon wafer

[0059]Mix the pre-PDMS polymer and curing agent evenly at a mass ratio of 10:1, then put it in a vacuum drying oven for degassing for 20 minutes, and then spin-coat the treated polymer evenly on the surface of the silicon wafer; place it in an oven at 120 °C ...

Embodiment 3

[0072] A substrate for surface-enhanced Raman spectroscopy and its preparation method and application (such as figure 1 ), including the following specific steps:

[0073] Step 1: Washing Glass Slides Depositing Raman Active Species

[0074] Clean the glass slides cut to a size of 2.5 cmⅹ2.5 cm with detergent to remove the surface dirt, then wash off the detergent with water, then soak in piranha solution for ten minutes to remove surface impurities, and use acetone and alcohol to sonicate Wash for 20 minutes, and finally ultrasonically clean with deionized water for 30 minutes, take it out and put it in a 60 ℃ oven to dry for later use;

[0075] Step 2: Modification of polymethylsiloxane (PDMS) on glass slides

[0076] The pre-PDMS polymer and curing agent were mixed evenly at a mass ratio of 10:1, and then placed in a vacuum drying oven for degassing for 20 minutes. Then, the treated polymer was evenly spin-coated on the surface of a glass slide. Put it in an oven at 120 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a compact surface-enhanced Raman spectroscopy (SERS) substrate and a preparation method and application thereof. The compact SERS substrate comprises a glass slide, a polydimethylsiloxane (PDMS) coating modifying the glass slide, and compact coffee spot sediments covering the coating, constituted by hollow magnetic ZnO / ZnFe2O4@Ag nano-particles and having a certain thickness, and thus the active substrate with the surface-enhanced Raman effect is obtained; the substrate is obtained through the steps such as preparing of an enhanced Raman active material, washing of theglass slide, modifying of PDMS, and sedimentation of the Raman active material, and the substrate is prepared through a magnetic field effect and coffee ring restraining effect self-assembled sedimentation method; the method has the advantages of being convenient, simple, low in cost, easy to implement and the like; and the substrate is used for SERS detection of bacillus anthracis markers, has high detecting sensitivity and stability, can effectively monitor and analyze bacillus anthracis without directly making contact with a bacterium source, and has very huge application prospects in fields such as environments and medical treatment.

Description

technical field [0001] The invention belongs to the technical field of laser Raman detection, in particular to a method for preparing a compact enhanced Raman spectrum substrate and its application. Background technique [0002] Bacillus anthracis (Bacillus anthracis) belongs to the genus Bacillus, a kind of Gram-positive bacilli, which is the pathogenic bacteria of natural epidemic foci and zoonotic anthracis. Under normal circumstances, Bacillus anthracis will form "spores", and its spores It is easy to be infected through the respiratory tract, skin, etc. Its vitality is extremely tenacious, it can resist various harsh environments, and it can survive for a long time. After being buried deeply and sealed in vacuum for decades, it still has a strong pathogenic ability and can be used as a biochemical weapon. raw materials. Serious threat to human health and social security. Although the current medical level has made rapid progress, the society does not have sufficient m...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N21/65B22F9/24B81B7/04B81C1/00
CPCB22F9/24B81B7/04B81C1/00031B81C1/00206G01N21/65G01N21/658G01N2021/655
Inventor 施国跃张京飞张宇张闽朱安伟
Owner EAST CHINA NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products