Compact surface-enhanced Raman spectroscopy (SERS) substrate and preparation method and application thereof
A surface-enhanced Raman, dense technology, applied in Raman scattering, technology for producing decorative surface effects, optics, etc., can solve the problem of high-cost large-scale instruments, difficult to achieve low-concentration rapid detection, and reduce surface-enhanced Raman. The amount of the precious metal in the base and its stability, etc., can achieve the effect of short detection time, guaranteed stability and reproducibility, and high reproducibility
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0038] A substrate for surface-enhanced Raman spectroscopy and its preparation method and application, comprising the following specific steps:
[0039] Step 1: Washing Glass Slides Depositing Raman Active Species
[0040] Clean the glass slides cut into a size of 2 cmⅹ2 cm with detergent to remove the surface dirt, then wash off the detergent with water, then use 20% HF for ten minutes to remove surface impurities, and use acetone and alcohol to ultrasonically clean them for 20 minutes. min, and finally ultrasonically cleaned with deionized water for 30 min, taken out and dried in an oven at 50 °C for later use;
[0041] Step 2: Modification of polymethylsiloxane (PDMS) on glass slides
[0042] The pre-PDMS polymer and curing agent were evenly mixed at a mass ratio of 10:1, put in a vacuum oven for degassing for 20 min, and then the treated polymer was evenly spin-coated on the surface of a glass slide. Put it in an oven at 100 ℃ for 30 minutes to cure, take it out and cool...
Embodiment 2
[0055] A substrate for surface-enhanced Raman spectroscopy and its preparation method and application, comprising the following specific steps:
[0056] Step 1: Cleaning the wafer on which the Raman active species is deposited
[0057] Clean the silicon wafers cut into a size of 1.5cmⅹ1.5cm with detergent to remove the surface dirt, then wash off the detergent with water, then soak in piranha solution for 10 minutes to remove surface impurities, and ultrasonically clean with acetone and alcohol for 20 minutes respectively , and finally ultrasonically cleaned with deionized water for 30 minutes, taken out and dried in a 60°C oven for later use;
[0058] Step 2: Modification of polymethylsiloxane (PDMS) on silicon wafer
[0059]Mix the pre-PDMS polymer and curing agent evenly at a mass ratio of 10:1, then put it in a vacuum drying oven for degassing for 20 minutes, and then spin-coat the treated polymer evenly on the surface of the silicon wafer; place it in an oven at 120 °C ...
Embodiment 3
[0072] A substrate for surface-enhanced Raman spectroscopy and its preparation method and application (such as figure 1 ), including the following specific steps:
[0073] Step 1: Washing Glass Slides Depositing Raman Active Species
[0074] Clean the glass slides cut to a size of 2.5 cmⅹ2.5 cm with detergent to remove the surface dirt, then wash off the detergent with water, then soak in piranha solution for ten minutes to remove surface impurities, and use acetone and alcohol to sonicate Wash for 20 minutes, and finally ultrasonically clean with deionized water for 30 minutes, take it out and put it in a 60 ℃ oven to dry for later use;
[0075] Step 2: Modification of polymethylsiloxane (PDMS) on glass slides
[0076] The pre-PDMS polymer and curing agent were mixed evenly at a mass ratio of 10:1, and then placed in a vacuum drying oven for degassing for 20 minutes. Then, the treated polymer was evenly spin-coated on the surface of a glass slide. Put it in an oven at 120 ...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com