Lining film for vacuum chamber wall of sputtering equipment and preparation method

A technology of sputtering equipment and lining film, applied in the field of sputtering equipment, can solve the problems of non-seamless attachment, polluted support, environmental pollution, etc., and achieve the effects of prolonging service life, improving utilization rate and high recovery rate

Inactive Publication Date: 2019-05-07
NINGBO DUNHE TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The advantage of this method is that the lining material used is cheap, but the disadvantage is that on the one hand, it is easy to bring in pollutants; on the other hand, if the sputtering target is precious metal or heavy metal, random discarding will affect the utilization rate of the target. , it is also easy to cause environmental pollution
Moreover, because paper, cardboard, etc., and the vacuum chamber wall and support cannot be seamlessly attached, the target in the sputtering process is easy to pass through these gaps, contaminating the vacuum chamber wall and support

Method used

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  • Lining film for vacuum chamber wall of sputtering equipment and preparation method
  • Lining film for vacuum chamber wall of sputtering equipment and preparation method

Examples

Experimental program
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Effect test

Embodiment 1

[0030] A method for preparing a lining film for a vacuum chamber wall of a sputtering device. The lining film is composed of a base layer, a release layer, an adhesive layer, and a thin film layer. The release layer and the adhesive layer And the film layer is sequentially formed on the base layer, including the following steps:

[0031] (1) The step of coating the release layer: scrape the release layer paint on the base layer, and obtain the release layer after drying. The drying temperature is 80℃-120℃, and the drying time is 2-5 minutes;

[0032] (2) Steps of applying adhesive layer: scrape the adhesive layer paint on the release layer;

[0033] (3) Steps of making the film layer: After coating the degradable polymer material solution on the adhesive layer, evenly spread the chitin fiber, the drying temperature is 120℃-180℃, and the drying time is 2-5 minutes. The film layer obtained after drying is a semi-finished product;

[0034] (4) Cutting and forming step: separating the le...

Embodiment 2

[0042] Attached below figure 1 The present invention is further explained. But it does not limit the content of the present invention.

[0043] Attached figure 1 It is a schematic cross-sectional view of the lining film used in the vacuum chamber wall of the sputtering equipment.

[0044] The base layer (10) is a conventional polymer film, which can be polyester (PET), polyethylene (PE), polyvinyl chloride (PVC), polycarbonate (PC), polyimide (PI), etc. , The thickness can be between 3-300 microns. Preferably, it is a polyester (PET) film about 10 microns thick.

[0045] The base layer (10) is coated with a release layer (20) with a thickness of about 0.5-5 microns. The release layer contains emulsified wax or silicone. The most effective one is silicone, and it can also contain A certain amount of resin, such as PU resin.

[0046] The release layer (20) is coated with an adhesive layer (30) with a thickness of about 0.5-5 microns. The adhesive layer contains at least one of acryli...

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Abstract

The invention provides a lining film for a vacuum chamber wall of sputtering equipment and a preparation method. The lining film is composed of a base layer, a release layer, an adhesive layer and a thin film layer, the adhesive layer and the thin film layer are made of degradable high polymer materials. The lining film prepared by the method is used for protecting the vacuum chamber wall of the sputtering equipment, so that the vacuum chamber wall is prevented from being polluted when the sputtering process is carried out, so that the obtained vacuum chamber is easy to clean, and the servicelife of the vacuum chamber of the sputtering equipment is effectively prolonged, due to the fact that the used preparation material is mainly the degradable polymer material, the target material can be recycled more quickly without impurities, so that the utilization rate of the sputtering target material is improved.

Description

Technical field [0001] The invention relates to the field of sputtering equipment, in particular to a lining film used for the wall of a vacuum chamber of the sputtering equipment and a preparation method. Background technique [0002] In the magnetron sputtering process of a planar or tubular rotating target, after the target atoms are impacted by hydrogen ions, about 1 / 6 of the sputtered atoms will be deposited on the inner wall of the vacuum chamber and on the support, increasing the cleaning vacuum equipment Cost and downtime. The key to improving the utilization rate of the target is to realize the replacement of sputtering equipment. [0003] Sputtering equipment is more expensive, and it is difficult to update and replace, and it is not easy to replace the same model, which will increase the cost of manufacturers and cause waste of resources. At present, the usual practice is to add a lining outside the vacuum chamber wall, such as laying paper or cardboard on the outside ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05D7/24B05D7/02B05D7/00C23C14/34
Inventor 周利红黄平建
Owner NINGBO DUNHE TECH CO LTD
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