Preparation method of low-temperature sputtering alpha-Ta coating of inner cavity with large length-diameter ratio and application thereof

A technology with large aspect ratio and inner cavity, applied in the field of material science, can solve the problems of reducing the mechanical properties of steel materials, expensive inert gas, difficult to popularize and apply, etc. The effect of excellent corrosion performance and dense coating

Active Publication Date: 2019-05-10
INST OF METAL RESEARCH - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, Kr and Xe are extremely expensive and rare gases, making it difficult to popularize and apply them.
In addition, from the research of S.Myers in the United States, it can be concluded that when Ar gas is used as the sput

Method used

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  • Preparation method of low-temperature sputtering alpha-Ta coating of inner cavity with large length-diameter ratio and application thereof
  • Preparation method of low-temperature sputtering alpha-Ta coating of inner cavity with large length-diameter ratio and application thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0025] Using a cylindrical tantalum target with a diameter of 150mm and a large aspect ratio (13:1) inner cavity as the substrate, and a target purity of 99.99wt%, the diameter of the inner cavity with a large aspect ratio is the same as that of the target The diameter difference of the outer wall is 60mm (after adjusting the process parameters, the inner wall of the substrate can be placed within the negative glow area), and the inner cavity with a large aspect ratio is degreased and cleaned on the surface, then loaded into a cylindrical target and connected to a vacuum unit; Draw below 2×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 150°C, and then pump the background vacuum to 7×10 -3 Pa. Infuse argon to 4.0×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 3.3W / cm 2 , the deposition time is 12 hours.

[0026] Observing the cross section and surface of the deposited tantalum coating, it can...

Embodiment 2

[0028] The inner cavity with a diameter of 150mm and a large aspect ratio (aspect ratio of 20:1) is used as the substrate, the purity of the tantalum target is 99.99wt%, and the diameter difference between the inner cavity with a large aspect ratio and the outer wall of the target is 65mm (adjust the process parameters Finally, the inner wall of the matrix can be placed within the range of the negative glow area), and the inner cavity with a large aspect ratio is degreased and cleaned on the surface, and then loaded into a cylindrical target and connected to a vacuum unit; -2 Pa, turn on the heater, heat the surrounding of the sample to 250°C, and then pump the background vacuum to 5×10 -3 Pa. Inject argon to 2.5×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 5W / cm 2 , the deposition time is 12 hours.

[0029] Observation of the cross-section and surface of the deposited tantalum coating shows that the coating ha...

Embodiment 3

[0031] The inner cavity with a diameter of 125mm and a large aspect ratio (aspect ratio of 15:1) is used as the substrate, the purity of the tantalum target is 99.99wt%, and the diameter difference between the inner cavity with a large aspect ratio and the outer wall of the target is 55mm (adjust the process parameters Afterwards, the inner wall of the matrix can be placed within the scope of the negative glow area), the inner wall of the barrel is degreased and cleaned, and then loaded into a cylindrical target and connected to a vacuum unit; the inner wall of the barrel is vacuumed to less than 3×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 200°C, and then pump the background vacuum to 4×10 - 3 Pa. Inject argon to 6.0×10 -1 Pa, start sputtering. The power supply used is a DC power supply, and the sputtering power density is 2.6W / cm 2 , a deposition time of 4 hours.

[0032] Observation of the cross-section and surface of the deposited tantalum coa...

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Abstract

The invention discloses a preparation method of a magnetron sputtering alpha-Ta coating of an inner cavity with a large length-diameter ratio and an application thereof, and belongs to the technical field of the magnetron sputtering coating. According to the method, the large length-diameter ratio inner cavity is used as a vacuum cavity, a cylindrical magnetron target is used as a deposition source, and extends into the inner cavity for deposition, wherein the diameter difference between the outer wall of a target material and the large length-diameter ratio inner cavity is controlled to be between 50 mm-65 mm, and after magnetron sputtering parameters are adjusted, the surface of the inner wall of a pipe is in a negative glow region of glow discharge. The pipe of the large length-diameterratio is heated to 150-250 DEG C. The used power supply is a direct-current power supply or a pulsed power supply, the target material is pure tantalum, working gas is Ar, and the sputtering power density is 2.5W/cm<2>-10W/cm<2>. According to the method, the 100% alpha-Ta coating can be deposited, the bonding force and the ablation resistance of the coating are obviously superior to those of a conventional electroplating chromium coating, so that the method can be used for replacing a chrome plating process which is used on a large scale at the present stage and causes severe environment pollution.

Description

Technical field: [0001] The invention relates to the technical field of material science, in particular to a preparation method and application of a low-temperature sputtering α-Ta coating in a large aspect ratio inner cavity. Background technique: [0002] As early as the late 1980s, the U.S. military took the lead in using magnetron sputtering α-Ta coating for protection. However, when Ar was used as the sputtering gas, the deposition temperature of the barrel had to reach 400°C to realize the α-Ta coating in the coating. The phase structure is 100% α-Ta (Surface and Coatings Technology 120-121 (1999) 44-52). Below this temperature, the phase structure in the coating is mainly β phase, and the α phase cannot be completely formed. In addition, the U.S. military also proposed to use two inert gases, Kr and Xe, as sputtering gases, and at a deposition temperature of 100-200°C, a 100% α-Ta coating can also be deposited (Surface and Coatings Technology 146-147( 2001) 344-350)....

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/14C23C14/04
Inventor 朱圣龙牛云松陈明辉王福会
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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