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High-reflection film layer for laser device resistant to high temperature and strong acid corrosion in waste gas, and preparation method of high-reflection film layer

A laser device and high-reflection film technology, applied in coating, sputtering, metal material coating processes, etc., can solve the problems of poor bonding force and difficult thickness control, and achieve the effect of stable performance and strong bonding force

Inactive Publication Date: 2019-05-10
HENAN MECHANICAL & ELECTRICAL VOCATIONAL COLLEGE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] Using lipid hydrolysis method, the thickness prepared by this method is not easy to control; the bonding force prepared by electron beam evaporation coating method is poor, TiO 2 / SiO 2 The energy is around 10ev

Method used

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  • High-reflection film layer for laser device resistant to high temperature and strong acid corrosion in waste gas, and preparation method of high-reflection film layer
  • High-reflection film layer for laser device resistant to high temperature and strong acid corrosion in waste gas, and preparation method of high-reflection film layer
  • High-reflection film layer for laser device resistant to high temperature and strong acid corrosion in waste gas, and preparation method of high-reflection film layer

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Experimental program
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Effect test

preparation example Construction

[0043] The above-mentioned preparation method of the high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas, the specific steps are as follows:

[0044] 1) Substrate preparation: polishing substrate;

[0045] 2) Magnetron sputtering Ti film: Ti film is plated on the surface of the Ti alloy substrate;

[0046] 3) Coating Ag film: Coating Ag film with reflective film on the Ti film;

[0047] 4) TiO plating 2 Film: Ag film is coated with high transmission film TiO 2 membrane;

[0048] 5) Plating SiO 2 Film: on TiO 2 Coated with high-reflection film SiO 2 membrane;

[0049] 6) Alternate coating: TiO 2 Membrane and SiO 2 The films alternated for 8 cycles, at the end of the 4th cycle, the SiO 2 Ag film is plated on the film, and TiO is plated on the Ag film 2 Film, TiO 2 SiO plating on the film 2 Membranes...alternate the remaining 4 cycles, at the last layer of SiO 2 Re-coating TiO on the film ...

Embodiment 1

[0063] A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas, comprising a substrate, a Ti film is plated on the substrate, an Ag film is plated on the Ti film, and TiO is plated on the Ag film 2 Film, TiO 2 SiO plating on the film 2 Membrane, SiO 2 TiO plated on film 2 Film, TiO 2 Membrane and SiO 2 The films alternated for 4 cycles, at the end of the 4th cycle, the SiO 2 Ag film is plated on the film, and TiO is plated on the Ag film 2 Film, TiO 2 SiO plating on the film 2 film... 4 more cycles alternated, at the last layer of SiO 2 Re-coating TiO on the film 2 film to prepare a high-reflection film layer for laser devices.

[0064] The matrix is ​​Ti-6Al-4V alloy.

[0065] The thickness of the Ti film is 20nm, the Ag film, TiO 2 Membranes and SiO 2 The film thicknesses were all 500 nm.

[0066] The thickness of the substrate is 500 μm.

[0067] The above-mentioned preparation method...

Embodiment 2

[0078] A high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas, comprising a substrate, a Ti film is plated on the substrate, an Ag film is plated on the Ti film, and TiO is plated on the Ag film 2 Film, TiO 2 SiO plating on the film 2 Membrane, SiO 2 TiO plated on film 2 Film, TiO 2 Membrane and SiO 2 The films alternated for 4 cycles, at the end of the 4th cycle, the SiO 2 Ag film is plated on the film, and TiO is plated on the Ag film 2 Film, TiO 2 SiO plating on the film 2 film... 4 more cycles alternated, at the last layer of SiO 2 Re-coating TiO on the film 2 film to prepare a high-reflection film layer for laser devices.

[0079] The matrix is ​​Ti-6Al-4V alloy.

[0080] The thickness of the Ti film is 22 nm, the thickness of the Ag film is 620 nm, and the thickness of the TiO film is 22 nm. 2 The thickness of the film is 550 nm, SiO 2 The thickness of the film was 600 nm.

[0081]...

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Abstract

The invention discloses a high-reflection film layer for a laser device resistant to high temperature and strong acid corrosion in waste gas. The high-reflection film layer comprises a substrate; thesubstrate is coated with a Ti film; the Ti film is coated with an Ag film; the Ag film is coated with a TiO2 film; the TiO2 film is coated with an SiO2 film; the SiO2 film is coated with a TiO2 film;the TiO2 films and the SiO2 films are alternately coated for four cycles; at the end of the fourth cycle, the SiO2 film is coated with the Ag film, the Ag film is coated with the TiO2 film, the TiO2 film is coated with the SiO2 film......, and the TiO2 films and the SiO2 films are alternately coated for four cycles; the last layer of the SiO2 film is coated with the TiO2 film; and therefore, the high-reflection film layer for the laser device is prepared. The high-reflection film layer prepared with the preparation method is resistant to high temperature, resistant to stress generated by gas flow temperature change, resistant to strong acid corrosion in the waste gas, and stable in performance. The TiO2 / SiO2 binding force in preparation by magnetron sputtering is strong; the ion energy isabout 100 ev; and the thickness of the film layer can be accurately controlled according to the process.

Description

technical field [0001] The invention belongs to the technical field of optical reflective film systems, and particularly relates to a high-reflection film layer for laser devices with high temperature resistance and strong acid corrosion resistance in exhaust gas and a preparation method thereof. Background technique [0002] Ultrashort pulse lasers are widely used in biomedical, military, environmental monitoring, industrial processing and other fields, and have aroused great research interest. In recent years, laser technology has been widely used in industrial production. In the process of laser technology preparation, the requirements for the preparation of laser reflective films and related devices are getting higher and higher. For the film system with multiple reflections in the laser, increasing the reflectivity of the film system by 0.1% will increase the output power by 10%. The increase in reflectivity not only enhances the output power, but also reduces energy l...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/08C23C14/16C23C14/08C23C14/10C23C14/35
Inventor 王云飞高志廷张黎燕孔一君张文琼张文斌马俊杰孟祥伟岳金明
Owner HENAN MECHANICAL & ELECTRICAL VOCATIONAL COLLEGE
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