A method for preparing superhydrophilic/underwater superoleophobic aluminum mesh
An underwater super-oleophobic and super-hydrophilic technology, applied in separation methods, chemical instruments and methods, liquid separation, etc., can solve problems such as poor stability, expensive equipment, and difficult to obtain materials, and achieve the effect of stable separation efficiency
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Embodiment 1
[0026] Cut aluminum foils with length, width, and thickness of 30mm, 40mm, and 0.1mm, respectively, and spin-coat the aluminum substrate at 450r / min for 10s and 2000r / min for 25s. The preheating temperature is 90°C and the time is 25min. The exposure time is 35s. The developing time is 120s. Afterwards, the temperature is 130°C and the time is 25 minutes. The aluminum substrate after photolithography and the copper plate of the same size were used as the anode and cathode of electrochemical machining, respectively, and the electrolyte was NaNO with a mass fraction of 15%. 3 Solution, processing voltage 5V, time 100s. The aluminum substrate after electrochemistry was cleaned in a negative gel cleaner for 3 minutes, ultrasonically cleaned in deionized water for 4 minutes, and dried for later use. Immerse the cleaned aluminum substrate in 1mol / L CuCl 2 In the solution for 2s, room temperature 25°C; put the chemically etched aluminum mesh in deionized water and ultrasonically...
Embodiment 2
[0028] Cut the aluminum foil with length, width and thickness of 30mm, 40mm and 0.1mm respectively, and spin coat the aluminum substrate at 450r / min for 15s and 2000r / min for 20s. Preheating temperature 90 ℃, time 20min. The exposure time is 35s. The developing time is 120s. Afterwards, the temperature is 130°C and the time is 30 minutes. The aluminum substrate after photolithography and the copper plate of the same size were used as the anode and cathode of electrochemical machining, respectively, and the electrolyte was NaNO with a mass fraction of 15%. 3 Solution, processing voltage 6V, time 90s. The aluminum substrate after electrochemistry was cleaned in negative gel cleaner for 3 minutes, ultrasonically cleaned in deionized water for 3 minutes, and dried for later use. Immerse the cleaned aluminum substrate in 1mol / LCuCl 2 In the solution for 2s, at room temperature 20°C; put the chemically etched aluminum mesh in deionized water and ultrasonically clean it for 4 mi...
Embodiment 3
[0030] Cut aluminum foils with length, width, and thickness of 30mm, 40mm, and 0.1mm, respectively, and spin-coat the aluminum substrate at 450r / min for 10s and 2000r / min for 20s. The preheating temperature is 90°C and the time is 25min. Exposure time 30s. The developing time is 120s. Afterwards, the temperature is 130°C and the time is 20 minutes. The aluminum substrate after photolithography and the copper plate of the same size were used as the anode and cathode of electrochemical machining, respectively, and the electrolyte was NaNO with a mass fraction of 18%. 3 Solution, processing voltage 4V, time 120s. The aluminum substrate after electrochemistry was cleaned in a negative gel cleaner for 4 minutes, ultrasonically cleaned in deionized water for 4 minutes, and dried for later use. Immerse the cleaned aluminum substrate in 1mol / L CuCl 2 In the solution for 3s, at room temperature of 30°C; put the chemically etched aluminum mesh in deionized water and ultrasonically ...
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Abstract
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