Preparation method of anti-reflection self-cleaning coating on glass surface
A self-cleaning coating and glass surface technology, which is applied in the field of preparation of anti-reflection self-cleaning coatings on glass surfaces, can solve the problems of hydrophobic surfaces with reduced hydrophobicity and self-cleaning properties, and can not take into account anti-reflection and self-cleaning, etc., to achieve Enhanced anti-reflection performance, improved hydrophilicity, and increased roughness
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Embodiment 1
[0046] Step 1: Mix 15mL ethanol (AR, commercially available) solution and 35mL water (deionized water) solution, then add 0.08gCTAB (commercially available), 0.15mL tetrabutyl titanate (AR, commercially available) one by one under stirring ) solution and 0.04mL TEOS (AR, commercially available) solution, stirred at room temperature for 8h.
[0047] Step 2: 20 μL of ammonium hydroxide (AR, commercially available) solution (25 wt%) was added to the solution of step 1, stirred for 15 minutes, and then allowed to stand at room temperature for 5 minutes.
[0048] Step 3: Sonicate the glass substrate in deionized water for at least 15 min, then place it in 800mLmin -1 Process 10min in the oxygen plasma processor (70w);
[0049] Step 4: Put the glass substrate after the oxygen plasma treatment into a Teflon container and add the solution prepared in step 2 therein, put the container containing the reaction solution and the glass substrate in a 60°C oven, and put it in a static condi...
Embodiment 2
[0056] Step 1: Mix 15mL ethanol (AR, commercially available) solution and 35mL water (deionized water) solution, then add 0.06gCTAB (commercially available), 0.12mL tetrabutyl titanate (AR, commercially available) one by one under stirring ) solution and 0.06mL TEOS (AR, commercially available) solution, stirred at room temperature for 8h.
[0057] Step 2: 20 μL of ammonium hydroxide (AR, commercially available) solution (25 wt%) was added to the solution of step 1, stirred for 15 minutes, and then allowed to stand at room temperature for 5 minutes.
[0058] Step 3: Sonicate the glass substrate in deionized water for at least 15 min, then place it in 800mLmin -1 Process 10min in the oxygen plasma processor (70w);
[0059] Step 4: Put the glass substrate after the oxygen plasma treatment into a Teflon container and add the solution prepared in step 2 therein, put the container containing the reaction solution and the glass substrate in a 60°C oven, and put it in a static condi...
Embodiment 3
[0065] Step 1: Mix 15mL ethanol (AR, commercially available) solution and 35mL water (deionized water) solution, then add 0.04g CTAB (commercially available), 0.1 tetrabutyl titanate (AR, commercially available) one by one under stirring solution and 0.01mL TEOS (AR, commercially available) solution, stirred at room temperature for 8h.
[0066] Step 2: 20 μL of ammonium hydroxide (AR, commercially available) solution (25 wt%) was added to the solution of step 1, stirred for 15 minutes, and then allowed to stand at room temperature for 5 minutes.
[0067] Step 3: Sonicate the glass substrate in deionized water for at least 15 min, then place it in 800mLmin -1 Treat in the oxygen plasma treatment apparatus (70w) and process 10min;
[0068] Step 4: Put the glass substrate after the oxygen plasma treatment into a Teflon container and add the solution prepared in step 2 therein, put the container containing the reaction solution and the glass substrate in a 60°C oven, and put it i...
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