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Ferroelectric field regulated and controlled two-dimensional material PN junction photoelectric detector and preparation method thereof

A photodetector, two-dimensional material technology, applied in the fields of electric solid device, semiconductor/solid state device manufacturing, circuit, etc., can solve the problems of slow light response and low response rate, and achieve fast response speed, high response rate and sensitivity. high effect

Pending Publication Date: 2019-06-28
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the photocurrent of a single two-dimensional material mainly comes from the photoconductive effect, the photoresponse is slow and the responsivity is low.

Method used

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  • Ferroelectric field regulated and controlled two-dimensional material PN junction photoelectric detector and preparation method thereof
  • Ferroelectric field regulated and controlled two-dimensional material PN junction photoelectric detector and preparation method thereof
  • Ferroelectric field regulated and controlled two-dimensional material PN junction photoelectric detector and preparation method thereof

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Experimental program
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Effect test

Embodiment 1

[0053] In this embodiment, a MoTe with ferroelectric domain regulation is provided 2 In-plane PN junction, the structural section of the device is as figure 1 shown.

[0054] The detector includes a substrate 1 , a two-dimensional semiconductor 2 , a metal electrode 3 , and a ferroelectric functional layer 4 from bottom to top.

[0055] In embodiment 1, substrate 1 is a silicon / silicon dioxide substrate, and the thickness of silicon dioxide is 285 nanometers; the two-dimensional semiconductor 2 is a two-dimensional material MoTe 2 , its thickness is 10 nanometers; metal electrode 3 is chromium / gold electrode, chromium 10 nanometers, gold 20 nanometers; Ferroelectric function layer 4 is ferroelectric polymer P (VDF-TrFE), and its thickness is 50 nanometers.

[0056] Figure 4 The current-voltage relationship of the in-plane PN junction photodetector formed by regulating the two-dimensional material for the ferroelectric material under illumination has an obvious photocurrent...

Embodiment 2

[0058] In this embodiment, a MoTe with ferroelectric domain regulation is provided 2 In-plane PN junction, the structural section of the device is as figure 1 shown.

[0059] The detector includes a substrate 1 , a two-dimensional semiconductor 2 , a metal electrode 3 , and a ferroelectric functional layer 4 from bottom to top.

[0060] In embodiment 2, substrate 1 is a silicon / silicon dioxide substrate, and the thickness of silicon dioxide is 285 nanometers; the two-dimensional semiconductor 2 is a two-dimensional material MoTe 2 , its thickness is 12 nanometers; metal electrode 3 is chromium / gold electrode, chromium 10 nanometers, gold 20 nanometers; Ferroelectric function layer 4 is ferroelectric polymer P (VDF-TrFE), and its thickness is 50 nanometers.

[0061] Figure 5 The current-voltage relationship of the in-plane PN junction photodetector formed by regulating the two-dimensional material for the ferroelectric material under illumination has an obvious photocurrent...

Embodiment 3

[0063] In this embodiment, a MoTe with ferroelectric domain regulation is provided 2 In-plane PN junction, the structural section of the device is as figure 1 shown.

[0064] The detector includes a substrate 1 , a two-dimensional semiconductor 2 , a metal electrode 3 , and a ferroelectric functional layer 4 from bottom to top.

[0065] In embodiment 3, substrate 1 is a silicon / silicon dioxide substrate, and the thickness of silicon dioxide is 285 nanometers; the two-dimensional semiconductor 2 is a two-dimensional material MoTe 2 , its thickness is 15 nanometers; metal electrode 3 is chromium / gold electrode, chromium 10 nanometers, gold 20 nanometers; Ferroelectric function layer 4 is ferroelectric polymer P (VDF-TrFE), and its thickness is 50 nanometers.

[0066] Image 6 The current-voltage relationship of the in-plane PN junction photodetector formed by regulating the two-dimensional material for the ferroelectric material under illumination has an obvious photocurrent ...

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Abstract

The invention discloses a ferroelectric field regulated two-dimensional material PN junction photoelectric detector and a preparation method thereof. The structure of the detector sequentially comprises an insulating substrate, a bipolar two-dimensional semiconductor, a metal electrode and a ferroelectric functional layer from bottom to top. The preparation method of the detector comprises the following steps: preparing the bipolar two-dimensional semiconductor on the substrate by using a mechanical stripping method; preparing a metal electrode by combining an ultraviolet photoetching method or an electron beam photoetching method with a thermal evaporation and stripping process; preparing a ferroelectric film on the structure through a spin-coating method, then enabling ferroelectric materials at the two sides above a two-dimensional material to be opposite in polarization direction through a piezoelectric force microscope, regulating and controlling the electron conduction and hole conduction at the two sides of a two-dimensional semiconductor through a ferroelectric local area field to form an in-plane PN junction which is used for photoelectric detection. When the detector works, no external voltage is needed, the photoelectric detection is achieved by measuring current signal changes under illumination; and the detector can also be used for photovoltaic energy conversion.The detector has the characteristics of high sensitivity, low dark current, fast response, good stability, low power consumption and the like.

Description

technical field [0001] The invention relates to a two-dimensional semiconductor photodetection device, in particular to a two-dimensional material PN junction photodetector regulated by a ferroelectric field and a preparation method thereof. Background technique [0002] In the past ten years, two-dimensional materials have received extensive attention and research in various fields due to their unique properties. Two-dimensional materials represented by graphene, black phosphorus, and molybdenum disulfide have made major breakthroughs in different fields such as biology, medicine, chemistry, and physics. Since most 2D materials have semiconducting properties and their band gaps are varied enough to cover the entire spectrum, they also show great potential in the field of photodetection. For example, the detection research of graphene in the terahertz band and the detection research of other two-dimensional materials in the ultraviolet to infrared band provide a new way for...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/42H01L51/46H01L51/48
CPCY02E10/549Y02P70/50
Inventor 王建禄吴广健王旭东沈宏林铁孟祥建褚君浩
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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