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Device and method used for removing organic impurities in by-product sodium chloride salt

A technology for by-product sodium chloride and sodium chloride salt, which is applied in the field of removal devices for organic impurities in by-product sodium chloride salt, can solve the problems of low impurity content, single treatment, and carbonization equipment bonding, etc., and achieves a solution Nozzle clogging, broad market prospects, and high thermal efficiency utilization

Active Publication Date: 2019-07-02
HEBEI UNIVERSITY OF SCIENCE AND TECHNOLOGY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the methods reported in the literature to treat sodium chloride salt containing organic impurities mainly include the following: one is the salt washing method, using water and detergent to remove impurities or other components in organic waste salt, but this method is only suitable for processing single, Waste salt with less impurity content; the second is the high-temperature treatment method, which decomposes the organic impurities in the salt into gas at high temperature, and then treats the gas to achieve the purpose of removing organic impurities, but in high-temperature treatment, nozzles are prone to appear problems such as blockage, wear, high-temperature bonding, stuttering, and equipment corrosion; the third is the high-temperature carbonization method, which carbonizes and decomposes organic waste salt at high temperature, so that the organic impurities in the waste salt are partially decomposed into volatile gases, and part of the coke becomes Organic carbon, but there are problems such as the carbonization temperature and the surface softening of the salt are not easy to control, and it is easy to form a bond to the carbonization equipment and affect continuous production.
In addition to the engineering problems in the above method, the final total carbon content in the treated sodium chloride is difficult to meet the quality requirements of ion-exchange membrane caustic soda for sodium chloride raw materials

Method used

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  • Device and method used for removing organic impurities in by-product sodium chloride salt
  • Device and method used for removing organic impurities in by-product sodium chloride salt

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0068] The high-temperature oxidation reactor 1 has a diameter of 1 m and a total height of 15 m. The number of layers of sieve plates 18 is 18, and the layer spacing is 0.6 m; 4 burners 23 are installed on the device wall from the 5th floor to the 8th floor, 1 burner on every floor. The volume of the dissolution kettle A3 and the dissolution kettle B4 is 10m 3 . The liquid-phase deep oxidation tower 8 has a diameter of 1.8m and a total height of 15m. It is in the form of multi-layer sieve plate bubbling gas-liquid contact, the number of gas-liquid contact layers is 12, and the layer spacing is 1.0m. Board 0.5m. The average pore size of the nanofiltration membrane of the fine filter 13 is 1.2nm.

[0069] Open the valves of the air inlet pipe 24 and the gas inlet pipe 25 of the burner 23, and ignite the burner 23 at the same time. When the hot spot temperature in the high temperature oxidation reactor 1 reaches 300 ° C, the total carbon content TOC will be 1400 mg based on s...

Embodiment 2

[0073] The diameter of the high temperature oxidation reactor 1 is 1m, the total height is 12m, the number of layers of the sieve plate 18 is 16, and the layer spacing is 0.55m; 4 burners 23 are installed on the device wall from the 5th floor to the 8th floor, 1 burner on every floor. The volume of the dissolution kettle A3 and the dissolution kettle B4 is 10m 3 . The liquid phase deep oxidation tower 8 has a diameter of 1.6m and a total height of 14m. It is in the form of multi-layer sieve plate bubbling gas-liquid contact, the number of gas-liquid contact layers is 14, and the layer spacing is 0.8m. Board 0.45m. The average pore size of the nanofiltration membrane of the fine filter 13 is 1.6 nm.

[0074] Open the valves of the air inlet pipe 24 and the gas inlet pipe 25 of the burner 23, and ignite the burner 23 at the same time. When the temperature of the hot spot in the high temperature oxidation reactor 1 reaches 300 ° C, the total carbon content TOC will be 1500 mg ...

Embodiment 3

[0078] The diameter of the high temperature oxidation reactor 1 is 1m, the total height is 12m, the number of layers of the sieve plate 18 is 16, and the layer spacing is 0.5m; Six burners 23 are installed on the walls of the 5th to 8th floors, 2 burners are respectively installed on the 5th and 7th floors, and 1 burner is installed on the 6th and 8th floors. The volume of the dissolution kettle A3 and the dissolution kettle B4 is 10m 3 . The liquid-phase deep oxidation tower 8 has a diameter of 1.6m and a total height of 16m. It is in the form of packed gas-liquid contact, and the height of the packed layer is 10m. The average pore diameter of the nanofiltration membrane of the fine filter 13 is 1.5 nm.

[0079] Open the valves of the air inlet pipe 24 and the gas inlet pipe 25 of the burner 23, and ignite the burner 23 at the same time. When the hot spot temperature in the high temperature oxidation reactor 1 reaches 300 ° C, the total carbon content TOC will be 1800 mg base...

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Abstract

The invention belongs to the technical field of chemical technology and equipment, and relates to a device and a method used for removing organic impurities in by-product sodium chloride salt. The device comprises a high temperature oxidation reactor, a dissolving kettle A, a dissolving kettle B, a liquid phase deep oxidation tower, a liquid solid filter, a solid residue tank, and a nanofiltrationmembrane separator. The method comprises following steps: firstly, the multi-layer fluidized bed type high temperature oxidation reactor is used for high temperature oxidation of most organic impurities in by-product sodium chloride salt, then in the liquid phase deep oxidation tower, deep oxidation of residual trace amount organic impurities is carried out, and the nanofiltration membrane separator is adopted to remove the large molecular organic matter impurities further, so that requirements on organic matter impurities in sodium chloride raw material in ionic membrane caustic soda industrial device are satisfied. The device and the method are high in operation flexibility, and organic impurity processing efficiency is high.

Description

technical field [0001] The invention belongs to the technical field of chemical technology and equipment, and relates to a device and method for removing organic impurities in by-product sodium chloride salt. Background technique [0002] During the production process of organic chlorination industry, sodium chloride salt containing organic impurities will be produced by-product, and with the development of organic chlorination industry, the output of by-product sodium chloride salt is increasing, and with the new regulations of our country Introduced one after another, it has been classified as hazardous waste, and its supervision will be stricter. At the same time, the by-product sodium chloride salt will not be recycled, which will also cause a waste of resources. Therefore, the comprehensive utilization of by-product sodium chloride salt is inevitable. must do. The by-product sodium chloride salt is treated and purified as a raw material and returned to the salt chemica...

Claims

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Application Information

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IPC IPC(8): C01D3/14
CPCC01D3/14
Inventor 胡永琪姜海超刘小熙赵风云程丽华刘莉刘玉敏张向京申银山
Owner HEBEI UNIVERSITY OF SCIENCE AND TECHNOLOGY
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