Process for recovering high-purity N-methyl formamide from waste stripping solution
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- XINZHONGTIAN ENVIRONMENTAL PROTECTION
- Publication Date
- 2019-07-05
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Abstract
Description
technical field
[0001] The invention relates to the technical field of recovery of waste stripping liquid, in particular to a process for recovering high-purity N-methylformamide from waste stripping liquid. Background technique
[0002] The rapid development of the domestic electronics manufacturing industry has greatly increased the use of electronic chemicals such as strippers. In the production process of electronic components such as liquid crystal display panels and semiconductor integrated circuits, it is necessary to use a stripping solution to remove the photoresist coated on the microcircuit protection area as a mask. The stripping solution used is usually made of organic amine and polar organic A mixture of solvents, a mixture of N-methylformamide (NMF) and diethylene glycol methyl ether (MDG) is one of them. This group of solvents has a good effect after mixing, and the industrial usage has been increasing. However, the price is high, and it is difficult to reco...