QLED device
A device and light-emitting layer technology, applied in the field of QLED devices, can solve the problems of low photoluminescence efficiency, accumulation of T1 state excitons, quenching, etc.
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[0031] Based on the above-mentioned composite quantum dot light-emitting diode device, in combination with specific embodiments of the present invention, a method for preparing a QLED device is also provided, which includes the steps of:
[0032] S10 depositing at least one hole transport layer 102 on the surface of the anode substrate 101;
[0033] S20 depositing a light-emitting layer 103 composed of quantum dots and HLCT materials on the surface of the hole transport layer 102;
[0034] S30 depositing at least one electron transport layer 104 on the surface of the light emitting layer 103;
[0035] S40 depositing a cathode layer 105 on the surface of the electron transport layer 104 to obtain the QLED device.
[0036] Specifically, when prepared as figure 1 In the case of the composite quantum dot light-emitting diode device, the step B specifically includes: first mixing the quantum dot material and the HLCT material uniformly in a certain proportion according to the mas...
Embodiment 1
[0041] The structure of the QLED device in this embodiment is: an anode layer 101 , a hole functional layer 102 , a light emitting layer 103 , an electronic functional layer 104 and a cathode layer 105 are sequentially stacked on a glass substrate.
[0042] The material of the anode layer 101 is ITO, and the hole functional layer 102 is a composite layer formed by stacking PEDOT:PSS and TFB; the material of the light-emitting layer 103 is a light-emitting layer composed of TPA-PA and CdSeZnS core-shell quantum dots; the electronic function layer 104 is ZnS and A composite layer formed by stacking ZnO; the material of the cathode layer 105 is Al.
[0043] The preparation method of the QLED device in this embodiment is as follows:
[0044] a. Spin-coat one deck of PEDOT on ITO substrate:PSS thin film is used as hole injection layer;
[0045] b. Spin-coat a TFB layer on the PEDOT:PSS layer;
[0046] c. First mix CdSeZnS core-shell quantum dots and TPA-PA in a weight ratio of 5:...
Embodiment 2
[0050] The structure of the QLED device in this embodiment is: an anode layer 101 , a hole functional layer 102 , a light emitting layer 103 , an electronic functional layer 104 and a cathode layer 105 are sequentially stacked on a glass substrate.
[0051] The material of the anode layer 101 is ITO, and the hole functional layer 102 is a composite layer formed by stacking PEDOT:PSS and TFB; the material of the light-emitting layer 103 is a light-emitting layer composed of TPA-PA and CdSeZnS core-shell quantum dots; the electronic function layer 104 is ZnS and A composite layer formed by stacking ZnO; the material of the cathode layer 105 is Al.
[0052] The preparation method of the QLED device in this embodiment is as follows:
[0053] a. Spin-coat one deck of PEDOT on ITO substrate:PSS thin film is used as hole injection layer;
[0054] b. Spin-coat a TFB layer on the PEDOT:PSS layer;
[0055] c. First mix CdSe@ZnS quantum dots and TPA-PA in a weight ratio of 2:98, dissol...
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