A kind of stone preparation method and polishing system thereof

A stone and polishing medium technology, applied in the direction of manufacturing tools, metal processing equipment, used abrasive processing equipment, etc., can solve the problem of not being able to obtain polishing uniformity, not considering the impact of polishing products, and not proposing specific solutions, etc. problems, to achieve the effect of easy control, improved gloss, and accurate control

Active Publication Date: 2021-09-03
佛山市高明成丽厨饰有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Chinese Patent No. CN201510704339.4 discloses a stone polishing machine, which can eliminate the polishing range of stone edge materials, so that it has better adaptability, but the polishing process is carried out under the action of the grinding head of the polishing machine. Get a product with better polishing uniformity
Another example is that the application number US201816191263 20181114 discloses a device for chemical mechanical polishing, but does not take into account the impact on the polished product during the chemical mechanical polishing process
[0004] In the field of stone preparation and stone polishing, there are still many practical problems that need to be dealt with in practical applications, and no specific solutions have been proposed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of stone preparation method and polishing system thereof
  • A kind of stone preparation method and polishing system thereof
  • A kind of stone preparation method and polishing system thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] A method for preparing a stone, comprising the steps of:

[0036] 1) adding silicon dioxide and bonding material into the mold to form a silicon dioxide-containing layer with a thickness of 50-100 μm;

[0037] 2) adding an inorganic filler material and a binder material respectively into the mold, the inorganic filler material being selected from one or more of crushed stones, broken bricks, ceramic particles or chips, glass chips, and quartz particles;

[0038] 3) Stir evenly;

[0039]4) Oscillate the whole mold with an oscillating device, so that the distribution of the inorganic filler material becomes uniform and arranged tightly; use a vacuum device to make the inner space of the mold in a vacuum state, and eliminate the air bubbles in the inorganic filler material and the silicon dioxide-containing layer or defect;

[0040] 5) After the bonding material is cured, the mold is removed to obtain a material layer comprising silicon dioxide, an inorganic filler mater...

Embodiment 2

[0047] A method for preparing a stone, comprising the steps of:

[0048] 1) Add silicon dioxide and an adhesive material twice the amount of silicon dioxide to the mold to form a silicon dioxide-containing layer with a thickness of 50-100 μm;

[0049] 2) Adding 45% inorganic filler material and 20% binding material to the mold, the inorganic filler material is selected from crushed stones, broken bricks, ceramic particles or chips, glass chips, and One or more of quartz particles;

[0050] 3) Stir evenly;

[0051] 4) Oscillate the whole mold with an oscillating device, so that the distribution of the inorganic filler material becomes uniform and arranged tightly; use a vacuum device to make the inner space of the mold in a vacuum state, and eliminate the air bubbles in the inorganic filler material and the silicon dioxide-containing layer or defect;

[0052] 5) After the bonding material is cured, the mold is removed to obtain a material layer comprising silicon dioxide, an...

Embodiment 3

[0064] A method for preparing a stone, comprising the steps of:

[0065] 1) Add silicon dioxide and an adhesive material 3 times the amount of silicon dioxide to the mold to form a silicon dioxide-containing layer with a thickness of 50-100 μm;

[0066] 2) Adding 75% inorganic filler material and 30% binding material to the mold, the inorganic filler material is selected from crushed stones, broken bricks, ceramic particles or chips, glass chips, and One or more of quartz particles;

[0067] 3) Stir evenly;

[0068] 4) Oscillate the whole mold with an oscillating device, so that the distribution of the inorganic filler material becomes uniform and arranged tightly; use a vacuum device to make the inner space of the mold in a vacuum state, and eliminate the air bubbles in the inorganic filler material and the silicon dioxide-containing layer or defect;

[0069] 5) After the bonding material is cured, the mold is removed to obtain a material layer comprising silicon dioxide, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
glossaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a stone preparation method and a polishing system thereof. By preparing a silicon dioxide layer, adding an inorganic filler material and a binder, stirring and mixing molding, after being processed by a polishing system, and finally coating the surface of the stone with modified The transparent UV-curable coating of permanent composite tourmaline powder is used for clean and anti-fouling treatment. The silicon dioxide-containing layer of the prepared stone has better bonding performance with the cured coating containing the modified composite tourmaline powder, and the polishing medium is silicon, silica gel and silicon dioxide, with few impurity elements, and the stone is polished evenly. The glossiness is remarkable; the present invention further improves the glossiness of the stone surface and also increases the durability of the stone surface Corrosion and weather resistance; combined with the polishing monitoring system set in the polishing system, it can more accurately control the polishing degree of the stone.

Description

technical field [0001] The invention relates to the field of stone preparation, in particular to a stone preparation method and a polishing system thereof. Background technique [0002] Artificial stone is made of unsaturated polyester resin as a binder, with natural marble or calcite, dolomite, silica sand, glass powder and other inorganic powders, as well as an appropriate amount of flame retardants, colors, etc., after mixing ingredients, porcelain casting, It is formed and solidified by vibration compression, extrusion and other methods. Compared with natural stone, artificial stone has bright colors, high smoothness, uniform color, compression and wear resistance, good toughness, compact structure, strong and durable, light specific gravity, not easy to absorb water, corrosion and weathering resistance, small color difference, no fading, radioactivity low merit. It has the advantages of comprehensive utilization of resources, and has an inestimable role in environment...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C04B28/00C04B26/14C04B26/18C04B26/12C04B41/68B28B1/087B28B1/08B24C3/04B24C3/10B24C9/00C09D163/10C09D7/63C09D7/61C08L63/00C08L67/06C08L61/06C08K3/36
CPCB24C3/04B24C3/083B24C3/10B24C9/00B28B1/082B28B1/0873C04B26/122C04B26/14C04B26/18C04B28/00C04B41/5027C04B41/68C04B2111/00612C08K3/36C08L61/06C08L63/00C08L67/06C09D163/10C09D7/61C09D7/63C04B14/06C04B14/22C04B14/02C04B18/16C04B41/4853C04B41/4562C08K3/38
Inventor 朱智勇
Owner 佛山市高明成丽厨饰有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products