Electronic skin based on MXene material and preparation method thereof

A technology for electronic skin and sensitive materials, applied in thermometers based on material expansion/contraction, electromagnetic measurement devices, and electric/magnetic profile/curvature measurement, etc. problem, to achieve the effect of low cost, wide response range and simple preparation process

Active Publication Date: 2019-08-09
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
View PDF10 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] Therefore, the purpose of the present invention is to provide an electronic skin and a corresponding preparation method to overcome the existing electronic skin problems such as low sensitivity, complicated preparation process, and being easily interfered by other stimuli, so as to speed up the practical application process of the electronic skin.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electronic skin based on MXene material and preparation method thereof
  • Electronic skin based on MXene material and preparation method thereof
  • Electronic skin based on MXene material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0056] Preparation of MXene materials. Among them, MXene materials (such as Ti 3 C 2 、Ti 2 C. Hf 3 C 2 、 Ta 3 C 2 、 Ta 2 C, Zr 3 C 5 , V 2 C, etc.), that is, two-dimensional transition metal carbide or carbonitride, is a new type of graphene-like layered two-dimensional crystal material, and its chemical formula is M n+1 x n , which can be obtained from the parent phase material MAX phase (such as Ti 3 AlC 2 、Ti 2 AlC, Hf 3 AlC 2 、 Ta 3 AlC 2 、 Ta 2 AlC, Zr 3 AlC 5 , V 2 AlC, etc.) are etched (n=1, 2, 3, M is a transition metal element, A is a main group element, X is carbon and / or nitrogen). Compared with the complex preparation process of graphene, the chemical liquid phase etching method used in the preparation of MXene is easy to operate and controllable, and the cost is low, and the surface of MXene prepared by this method has functional groups such as hydroxyl and oxygen, which can be modified by covalent modification. and surface modification can ...

Embodiment 1

[0066] 1.0-3.0g 200 mesh Ti 3 AlC 2 Add 10.0-30.0ml of hydrofluoric acid with a mass fraction of 20wt% to the powder, and etch for 0.5h. The etched product was centrifuged and washed with deionized water until the pH was greater than 5, and then freeze-dried for 12 hours to obtain Ti 3 C 2 powder. Take 1.0-5.0g Ti 3 C 2 powder, add 10.0-50.0ml of tetramethylammonium hydroxide with a mass fraction of 25wt% and stir for 24 hours, wash off the tetramethylammonium hydroxide by centrifugation with deionized water, then add 100.0-500.0ml of deionized water, and peel off 0.5 h, and then centrifuge the peeled product at 3500 rpm for 1 h, and the supernatant obtained after separation is a single-layer or few-layer MXene material. Take 100.0 ml of the supernatant, vacuum filter and vacuum dry to obtain a conductive film (size (6-7) mm × (6-7) mm). Pour the PDMS prepolymer into the mold and prepolymerize at 80°C for 5min. Then attach the conductive film array on the PDMS surface ...

Embodiment 2

[0068] 1.0-3.0g 200 mesh Ti 3 AlC 2 Add 10.0-30.0ml of hydrofluoric acid with a mass fraction of 20wt% to the powder, and etch for 0.5h. The etched product was centrifuged and washed with deionized water until the pH was greater than 5, and then freeze-dried for 12 hours to obtain Ti 3 C 2 powder. Take 1.0-5.0g Ti 3 C 2 powder, add 10.0-50.0ml of tetramethylammonium hydroxide with a mass fraction of 25wt% and stir for 24 hours, wash off the tetramethylammonium hydroxide by centrifugation with deionized water, then add 100.0-500.0ml of deionized water, and peel off 0.5 h, and then centrifuge the peeled product at 3500 rpm for 1 h, and the supernatant obtained after separation is a single-layer or few-layer MXene material. Take 100.0 ml of the supernatant, vacuum filter and vacuum dry to obtain a conductive film (size (6-7) mm × (6-7) mm). Pour the PDMS prepolymer into the mold and prepolymerize at 80°C for 10min. Then attach the conductive film array on the PDMS surface...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to an electronic skin based on an MXene material and a preparation method thereof. The electronic skin comprises a flexible substrate, a sensitive material and electrodes. The sensitive material is a conductive film array based on the MXene material. The flexible substrate is used for supporting and protecting the sensitive material. The electrodes are distributed at the twoends of the sensitive material. The flexible substrate is made of an elastic rubber material. The temperature response range of the electronic skin is 0 to 200 DEG C and the a sensitivity is from 0.01to 1000 DEG C <-1>.

Description

technical field [0001] The invention relates to an electronic skin based on MXene material and a preparation method thereof, belonging to the field of flexible and wearable electronics and the technical field of new materials. Background technique [0002] With the advancement of science and technology, the rapid development of flexible and wearable electronic devices plays an important role in motion sensing, personal health monitoring (Reference 1), intelligent robots (Reference 2) and human-computer interaction (Reference 3). application. As an important branch of flexible electronics technology, electronic skin has been receiving extensive attention from academia and industry. Through the integration of various sensors, electronic skin can simulate the function of human skin to perceive external stimuli. At present, significant progress has been made in sensing the pressure and strain of mechanical stimuli (refer to literature 4-5), and related technologies are becomin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01K5/52G01B7/28
CPCG01B7/28G01K5/52
Inventor 孙静曹哲瑞王冉冉
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products