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A kind of preparation method of high-purity gold microstructure sample

A microstructure and sample technology, which is applied in the field of preparation of high-purity gold microstructure samples, can solve the problems of difficult control of corrosion rate of aqua regia, influence of observation effect, easy formation of oxide film, etc. stable effect

Active Publication Date: 2021-09-03
国合通用测试评价认证股份公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the corrosion rate of aqua regia is not easy to control, the corrosion effect is poor, and the oxide film is easy to form on the surface, which affects the observation effect

Method used

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  • A kind of preparation method of high-purity gold microstructure sample
  • A kind of preparation method of high-purity gold microstructure sample
  • A kind of preparation method of high-purity gold microstructure sample

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] High-purity gold (99.9999%) is cooled after being heated for 5 minutes under the conditions of 250 bar and 180 °C through carbon-containing phenolic resin to obtain the following: figure 1 For the mosaic samples shown, the mosaic samples were ground by 120#, 220#, 500#, 1000#, and 2400# SiC water sandpaper in sequence, and then polished by 2.5μm and 1.0μm diamond polishing fluid for 1min at a speed of 150r / min. After polishing, the samples were cleaned and corroded. The corrosion solution was ferric chloride: hydrochloric acid: hydrogen peroxide: water = 10g: 30ml: 30ml: 30ml. The corrosion method was etching, and the corrosion time was 30s. After the corrosion was completed, the sample After washing and drying, observe under a metallographic microscope, with figure 2 This is the microstructure picture of the high-purity gold. The microstructure is columnar, and there are deformation twins in the columnar grains.

[0028] The polished samples were corroded with aqua r...

Embodiment 2

[0030] High-purity gold (99.9999%) is cooled after being heated for 3 minutes at a pressure of 220 bar and a temperature of 200 ° C through a phenolic resin with carbon to obtain the following: figure 1 For the mosaic sample shown, the mosaic sample was ground by 120#, 220#, 500#, 1000#, 2400# SiC water sandpaper in turn, and then polished by 2.5μm and 1.0μm diamond polishing fluid for 1.5min at a speed of 125r / min . After polishing, the sample was cleaned and corroded. The corrosion solution was ferric chloride: hydrochloric acid: hydrogen peroxide: water = 8g: 25ml: 35ml: 30ml. The corrosion method was etching, and the corrosion time was 40s. After the corrosion was completed, the sample After washing and drying, observe under a metallographic microscope, with Figure 4 This is the microstructure picture of the high-purity gold. The microstructure is a columnar structure, and there are deformation twins in the columnar grains.

[0031] The polished samples were corroded wi...

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Abstract

The invention discloses a preparation method of a high-purity gold microstructure sample, which comprises the following steps: (1) thermally mounting the high-purity gold sample with a thermal mounting material; (2) grinding the mounted sample on SiC water sandpaper; (3) The ground sample is mechanically polished twice, the polishing agent is 2.5 μm and 1.0 μm diamond polishing liquid, the polishing time is 30s-3min each time, and the rotational speed of the polishing disc is 100r / min-200r / min; (4) three The mixed solution of ferric chloride+hydrochloric acid+hydrogen peroxide+water corrodes the sample; (5) rinse and dry the corroded sample, and then observe the microstructure of the high-purity gold sample under a microscope. The corrosive solution used in the present invention is an aqueous solution of ferric chloride+hydrochloric acid+hydrogen peroxide, which has relatively stable chemical properties, weak corrosion, less harm to human body, and is safer than aqua regia.

Description

technical field [0001] The invention belongs to the technical field of metallographic analysis and testing, and in particular relates to a method for preparing a high-purity gold microstructure sample. Background technique [0002] With the rapid development of the semiconductor industry, my country has gradually become one of the regions with the largest demand for thin film materials in the world, and the demand for sputtering targets is also increasing. High-purity metal sputtering has become a strategic key material for the semiconductor industry. High-purity gold has the advantages of high ductility, high electrical and thermal conductivity, stable chemical properties, and strong corrosion resistance. High-purity gold sputtering targets are widely used in semiconductor manufacturing industries such as silicon semiconductor discrete devices, integrated circuit wafer manufacturing and packaging. application. With the continuous shrinking of the feature size of integrated...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N1/44G01N1/28G01N1/32G01N1/34G01N1/36
CPCG01N1/286G01N1/32G01N1/34G01N1/36G01N1/44G01N2001/2866G01N2001/364
Inventor 夏雯张智慧刘淑凤杨银郭荣贵刘红
Owner 国合通用测试评价认证股份公司