High-water-resistance flexible internal-series-connection CIGS solar cell and preparation method thereof
A solar cell and water-blocking technology, which is applied in the field of flexible CIGS solar cells, can solve problems such as expensive process costs, performance degradation of battery devices, and limitations on the scope of application of flexible CIGS solar cells.
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Embodiment 1
[0063] Step 1. Prepare the back protective layer of the flexible substrate: prepare an 800nm thick back protective layer on the back of the flexible substrate with a thickness of 70um to prevent the selenium vapor from corroding the flexible substrate during the preparation of the CIGS absorber layer; the target used in the preparation is Molybdenum target, Ar is introduced during the preparation process, and the background vacuum degree during sputtering is less than or equal to 5.0×10 ﹣3 Pa, the sputtering power is 3kW, the working pressure is 2Pa, the flexible substrate temperature is 200°C, the sputtering time is 5min, and the Ar flow rate is 90sccm;
[0064] Step 2. Preparation of organic-inorganic alternating multi-layer composite water-blocking insulating layer: 1000nm aluminum nitride high-density insulating inorganic water-blocking film is prepared on a flexible stainless steel substrate with a thickness of 100um by reactive magnetron sputtering method, and the sputt...
Embodiment 2
[0075] Step 1. Prepare the back protective layer of the flexible substrate: prepare a 1800nm thick back protective layer on the back of the flexible substrate with a thickness of 100um to prevent the selenium vapor from corroding the flexible substrate during the preparation of the CIGS absorber layer; the target used in the preparation is Molybdenum target, Ar is introduced during the preparation process, and the background vacuum degree during sputtering is less than or equal to 5.0×10 ﹣3 Pa, the sputtering power is 5kW, the working pressure is 5Pa, the flexible substrate temperature is 300°C, the sputtering time is 10min, and the Ar flow rate is 150sccm;
[0076] Step 2. Preparation of organic-inorganic alternating multi-layer composite water-blocking insulating layer: 1200nm aluminum nitride high-density insulating inorganic water-blocking film is prepared on flexible polyimide with a thickness of 150um by reactive magnetron sputtering method, and the sputtering target ma...
Embodiment 3
[0087] Step 1. Prepare the back protective layer of the flexible substrate: prepare a 2000nm thick back protective layer on the back of the flexible substrate with a thickness of 150um to prevent the selenium vapor from corroding the flexible substrate during the preparation of the CIGS absorber layer; the target used in the preparation is Molybdenum target, Ar is introduced during the preparation process, and the background vacuum degree during sputtering is less than or equal to 5.0×10 ﹣3 Pa, the sputtering power is 10kW, the working pressure is 10Pa, the flexible substrate temperature is 400°C, the sputtering time is 20min, and the Ar flow rate is 200sccm;
[0088] Step 2. Preparation of organic-inorganic alternating multi-layer composite water-blocking insulating layer: 1400nm aluminum nitride high-density insulating inorganic water-blocking film is prepared on flexible polyimide with a thickness of 70um by reactive magnetron sputtering method, and the sputtering target mat...
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