Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Special environment-friendly cultivation medium for Rhododendron and its preparation method

A technology of cultivation substrate and preparation method, applied in the directions of culture medium, planting substrate, botanical equipment and methods, etc., can solve problems such as wetland environment destruction, and achieve the effects of prolonging fertilizer efficiency, reducing cost and promoting growth.

Active Publication Date: 2021-09-24
JIANGSU ACAD OF AGRI SCI
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Rhododendron likes acidic soil, and most urban cultivation soils in my country cannot meet its growth needs, so peat with weakly acidic pH has become the most used substrate in rhododendron cultivation; however, peat, as a non-renewable natural resource, Excessive mining will lead to the destruction of wetland environment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Special environment-friendly cultivation medium for Rhododendron and its preparation method
  • Special environment-friendly cultivation medium for Rhododendron and its preparation method
  • Special environment-friendly cultivation medium for Rhododendron and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] (1), 4 parts of peat, 4 parts of mushroom mud, 5 parts of rice bran and 3 parts of wheat straw are mixed and naturally retting for 30 days;

[0027] (2) Take 4 portions of cornstarch residue and pour them into the fermentation tank, add the same weight of hot water at about 60°C and mix well, wait until the temperature is naturally cooled to 32±2°C, stir properly during this period to prevent precipitation, and then sprinkle the yeast evenly Stir the yeast evenly, add 133.33g per 100kg of cornstarch residue, control the temperature between 28-36°C, stir twice a day for the first 3 days after adding the yeast, and sprinkle acetic acid bacteria after 7 days of anaerobic fermentation. The amount of acetic acid bacteria added is 6.67g per hundred kilograms of cornstarch residue, stirred evenly, and reacted for 10 days under anaerobic conditions;

[0028] (3), mix the products of steps (1) and (2), add Bacillus subtilis and crude fiber degrading bacteria, react at 45-60°C fo...

Embodiment 2

[0033] (1), 10 parts of peat, 8 parts of mushroom mud, 5 parts of rice bran and 3 parts of wheat straw are mixed and naturally retting for 15 days;

[0034] (2) Take 8 portions of cornstarch residue and pour them into the fermentation tank, add the same weight of hot water at about 60°C and mix well, wait until the temperature is naturally cooled to 32±2°C, stir properly during this period to prevent precipitation, and then sprinkle the yeast evenly Stir evenly, add 133.33g per 100kg of cornstarch residue, control the temperature at 28-36°C, stir twice a day for the first 3 days after adding yeast, after 15 days of anaerobic fermentation, sprinkle acetic acid bacteria, add acetic acid bacteria The amount is 6.67g per 100 kilograms of corn starch slag, stirred evenly, and reacted for 15 days under anaerobic conditions;

[0035] (3), mix the products of steps (1) and (2), add Bacillus subtilis and crude fiber degrading bacteria, react under aerobic conditions at 45-60°C for 20 d...

Embodiment 3

[0040] (1), 6 parts of peat, 10 parts of mushroom mud, 3 parts of rice bran and 1 part of wheat straw are mixed and naturally retting for 15 days;

[0041] (2) Take 4 portions of cornstarch residue and pour them into the fermentation tank, add the same weight of hot water at about 70°C and mix well, wait until the temperature is naturally cooled to 32±2°C, stir properly during this period to prevent precipitation, and then sprinkle the yeast evenly Stir evenly, add 133.33g per 100kg of cornstarch residue, control the temperature at 28-36°C, stir twice a day for the first 3 days after adding yeast, after 12 days of anaerobic fermentation, sprinkle acetic acid bacteria, add acetic acid bacteria The amount is 6.67g per 100 kilograms of cornstarch slag, stirred evenly, and reacted for 13 days under anaerobic conditions;

[0042] (3), mix the products of steps (1) and (2), add Bacillus subtilis and crude fiber degrading bacteria, react under aerobic conditions at 45-60°C for 17 day...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an environment-friendly cultivation substrate specially used for rhododendrons. Its components include: natural retting peat, mushroom mud, rice bran and wheat straw, and cornstarch dregs fermented by yeast and acetic acid bacteria. The above components After adding Bacillus subtilis and crude fiber degrading bacteria to react, then add phytase and perlite. Its preparation method is also disclosed. The invention adopts mushroom mud, rice bran, wheat stalk and cornstarch slag which are convenient and cheap to obtain materials, so as to reduce the cost of special environment-friendly cultivation substrate for rhododendron. Phytase can degrade the phytic acid in the matrix, making the matrix more abundant and easier to absorb nutrients. At the same time, the nutrients in the matrix are in a slow-release state, which can prolong the fertilizer effect. The special environment-friendly cultivation substrate for rhododendrons disclosed by the invention has better water retention and air permeability, can more effectively promote the growth of rhododendron seedlings after being treated with mixed strains, and greatly increase the flowering volume of rhododendrons.

Description

technical field [0001] The invention relates to a special environment-friendly cultivation substrate for rhododendrons and a preparation method thereof, belonging to the technical field of seedling breeding. Background technique [0002] With the development of society and economy, people's pursuit of beauty is increasing day by day. Flowers play a mainstream role in improving people's quality of life and decorating the living environment. With the expansion of flower planting area, the amount of cultivation substrate is increasing rapidly. Rhododendron likes acidic soil, and most urban cultivation soils in my country cannot meet its growth needs, so peat with weakly acidic pH has become the most used substrate in rhododendron cultivation; however, peat, as a non-renewable natural resource, Excessive mining will lead to the destruction of wetland environment. In the new situation of global advocacy of environment-friendly agriculture and forestry in the new century, the use ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A01G24/28A01G24/20A01G24/25A01G24/22A01G24/15
CPCC05D9/00C05G3/00C05F5/002C05F11/00C05F11/02C05F11/08
Inventor 何丽斯苏家乐刘晓青李畅肖政周惠民
Owner JIANGSU ACAD OF AGRI SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com