Semiconductor structure and formation method thereof
A semiconductor, regional technology, used in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., to solve problems such as poor performance of multi-threshold voltage transistors
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[0034] As mentioned in the background, the performance of the semiconductor structures formed by the prior art is poor.
[0035] Figure 1 to Figure 3 It is a structural schematic diagram of each step of a method for forming a semiconductor structure.
[0036] Please refer to figure 1 , providing a substrate 100; forming an interface layer 101 on the substrate 100; forming a gate dielectric layer 102 on the interface layer 101; forming a sacrificial layer 103 on the gate dielectric layer 102; forming the sacrificial layer 103 Afterwards, an annealing treatment is performed on the interface layer 101 and the gate dielectric layer 102 .
[0037] Please refer to figure 2 , after the annealing treatment, the sacrificial layer 103 is removed.
[0038] Please refer to image 3 After removing the sacrificial layer 103, a gate layer 110 is formed on the gate dielectric layer 102; a patterned mask layer is formed on the gate layer 110; The gate layer 110 , the gate dielectric la...
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