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Solar cell multi-layer anti-reflection grading film and preparation method thereof

A solar cell and preparation technology, which is applied in metal material coating technology, sustainable manufacturing/processing, coating, etc., can solve the problems of low overall reflectivity of the front of the solar cell, large difference in refractive index, and increased light absorption, etc. Achieve excellent passivation, low reflectivity, and increase light absorption

Pending Publication Date: 2019-10-29
TIANJIN AIKO SOLAR ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The present invention consists of two layers of silicon nitride films, two layers of silicon nitride oxide films and one layer of silicon oxide films from bottom to top. The refractive index of each film decreases layer by layer, which solves the difference in refractive index between the existing silicon nitride film layers. The large problem of light loss caused by optical mismatch makes the overall reflectivity of the solar cell front lower, increases light absorption, and improves the conversion efficiency of the solar cell; Has excellent passivation, further enhances the short-wave response of solar cells, and improves the anti-PID performance of solar cells

Method used

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  • Solar cell multi-layer anti-reflection grading film and preparation method thereof
  • Solar cell multi-layer anti-reflection grading film and preparation method thereof
  • Solar cell multi-layer anti-reflection grading film and preparation method thereof

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Embodiment 1

[0041] Such as figure 1 As shown, it is a solar cell multilayer anti-reflection gradient film of the present invention, which includes a first silicon nitride film 5, a second silicon nitride film 4, a first silicon nitride oxide film 3, a second silicon nitride film, Silicon nitride oxide film 2 and silicon oxide film 1, and the refractive index of each film decreases layer by layer from bottom to top. The film thickness of the first silicon nitride film 5 is 12nm, and the refractive index is 2.23; the film thickness of the second silicon nitride film 4 is 45nm, and the refractive index is 2.05; The ratio is 1.93; the film thickness of the second silicon oxynitride film 2 is 6 nm, and the refractive index is 1.68; the film thickness of the silicon oxide film 1 is 5 nm, and the refractive index is 1.41.

[0042] The multilayer anti-reflection gradient film of the solar cell has a thickness of 74nm and a refractive index of 2.09.

[0043] A preparation process for the above-m...

Embodiment 2

[0051] The difference between this embodiment and Embodiment 1 is that: the film thickness of the first silicon nitride film 5 is 12nm, and the refractive index is 2.21; the film thickness of the second silicon nitride film 4 is 45nm, and the refractive index is 2.09; A silicon oxynitride film 3 has a thickness of 6 nm and a refractive index of 1.96; a second silicon oxynitride film 2 has a thickness of 6 nm and a refractive index of 1.74; a silicon oxide film 1 has a thickness of 6 nm and a refractive index of 1.45.

[0052] The multilayer anti-reflection gradient film of the solar cell has a thickness of 75nm and a refractive index of 2.08.

[0053] A preparation process for the above-mentioned solar cell multilayer anti-reflection gradient film, specifically comprising the following steps:

[0054] S1. Using tubular plasma deposition equipment to deposit the first silicon nitride film 5 on the front side of the monocrystalline silicon wafer 6 after texturing treatment, the ...

Embodiment 3

[0060] The difference between this embodiment and Embodiment 1 is that: the film thickness of the first silicon nitride film 5 is 12nm, and the refractive index is 2.21; the film thickness of the second silicon nitride film 4 is 45nm, and the refractive index is 2.08; A silicon oxynitride film 3 has a thickness of 6 nm and a refractive index of 1.95; a second silicon oxynitride film 2 has a thickness of 6 nm and a refractive index of 1.76; a silicon oxide film 1 has a thickness of 6 nm and a refractive index of 1.46.

[0061] The multilayer anti-reflection gradient film of the solar cell has a thickness of 75nm and a refractive index of 2.09.

[0062] A preparation process for the above-mentioned solar cell multilayer anti-reflection gradient film, specifically comprising the following steps:

[0063] S1. Using tubular plasma deposition equipment to deposit the first silicon nitride film 5 on the front side of the monocrystalline silicon wafer 6 after texturing treatment, the ...

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Abstract

The invention discloses a solar cell multi-layer anti-reflection grading film and a preparation method thereof. The solar cell multi-layer anti-reflection grading film comprises a first silicon nitride film, a second silicon nitride film, a first silicon oxynitride film, a second silicon oxynitride film and a silicon oxide film which are arranged in order from bottom to top, and the refractive index of each film is reduced layer by layer from bottom to top. The solar cell multi-layer anti-reflection grading film is formed by the two layers of silicon nitride films, the two layers of oxynitridefilms and a layer of the silicon oxide film, the refractive index of each film is reduced layer by layer, the problem is solved that the difference of the refractive indexes between the current silicon nitride films is large to cause the light loss due to optical mismatch, the whole refractive index of the front surface of the solar cell is lower, the light absorption is increased, and the conversion efficiency of the solar cell is improved; and moreover, the refractive index of the silicon nitride film at the inner layer is large, the silicon nitride film has an excellent passivation effectto further enhance the short-wave response of the solar cell and improve the anti-PID performance of the solar cell.

Description

technical field [0001] The invention relates to a solar cell multilayer anti-reflection gradient film, and also relates to a preparation process of the solar cell multilayer antireflection gradient film. Background technique [0002] The preparation of anti-reflection film for solar cells is a very important process in the manufacturing process of solar cells. The anti-reflection film can reduce the light reflection on the front surface of the solar cell, increase light absorption, and at the same time have a passivation effect, reduce the recombination of the battery surface, and protect the battery from attenuation caused by external moisture and metal impurities. [0003] The material often used as an anti-reflection film is silicon nitride. At present, silicon nitride films are mainly prepared by plasma coating equipment. Silicon nitride films with different refractive indices can be prepared by changing the nitrogen / silicon ratio. Due to the high refractive index Silic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0216H01L31/18C23C16/30C23C16/34C23C16/50
CPCH01L31/02168H01L31/1868C23C16/50C23C16/345C23C16/308Y02E10/50Y02P70/50
Inventor 姜泽光张欣林纲正
Owner TIANJIN AIKO SOLAR ENERGY TECH CO LTD
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