High-efficiency environment-protective acidic etching solution and etching method thereof
An acid etching solution and an environmentally friendly technology, which is applied in the field of high-efficiency and environment-friendly acid etching solution and its etching, can solve the problems of high etching efficiency, achieve the effects of increasing etching rate, reducing exhaust emissions, and saving procurement costs
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Embodiment 1
[0050] This embodiment discloses a high-efficiency and environment-friendly acid etching solution and an etching method thereof.
[0051] A high-efficiency and environment-friendly acid etching solution. The acidic etching solution includes an etching liquid base liquid containing hydrogen ions, chloride ions, copper ions and cuprous ions, an acidic etching liquid I containing chlorate ions and an acidic etching liquid II containing hydrogen ions; the etching liquid base The content of hydrogen ion in the liquid is 0.5g / L, and the content of chloride ion is 230g / L, and the content of copper ion is 120g / L, and the redox potential difference of copper ion and cuprous ion is 450 millivolts; The content of chlorate ions in the acidic etching solution I is 80g / L; the content of hydrogen ions in the acidic etching solution II is 100g / L.
[0052] Wherein, the acidic etching solution I includes sodium chlorate, sodium chloride, urea and water. The content of each component of this a...
Embodiment 2
[0065] This embodiment discloses a high-efficiency and environment-friendly acid etching solution and an etching method thereof.
[0066] A high-efficiency and environment-friendly acid etching solution. The acidic etching solution includes an etching liquid base liquid containing hydrogen ions, chloride ions, copper ions and cuprous ions, an acidic etching liquid I containing chlorate ions and an acidic etching liquid II containing hydrogen ions; the etching liquid base The content of hydrogen ion in the liquid is 1.5g / L, and the content of chloride ion is 260g / L, and the content of copper ion is 150g / L, and the redox potential difference of copper ion and cuprous ion is 550 millivolts; The content of chlorate ions in the acidic etching solution I is 80g / L; the content of hydrogen ions in the acidic etching solution II is 200g / L.
[0067] Wherein, the acidic etching solution I includes sodium chlorate, sodium chloride, urea and water. The content of each component of this a...
Embodiment 3
[0080] This embodiment discloses a high-efficiency and environment-friendly acid etching solution and an etching method thereof.
[0081] A high-efficiency environment-friendly acid etching solution, including an etching solution base solution containing hydrogen ions, chloride ions, copper ions and cuprous ions, an acid etching solution I containing chlorate ions, and an acid etching solution II containing hydrogen ions; The content of the hydrogen ion in the etching liquid base liquid described above is 1.0g / L, and the content of the chloride ion is 245g / L, and the content of the copper ion is 135g / L, and the redox potential difference of copper ion and cuprous ion is 500 milliseconds. V; The content of the chlorate ion in the described acidic etching solution I is 130g / L; The content of the hydrogen ion in the described acidic etching solution II is 150g / L.
[0082] Wherein, the acidic etching solution I includes sodium chlorate, sodium chloride, urea and water. The conten...
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