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Improvement method for preparing Y2O3 ceramic coating through cold spraying

A technology of ceramic coating and Y2O3 is applied in the improvement field of preparing Y2O3 ceramic coating by cold spraying.

Pending Publication Date: 2019-11-19
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Plasma spraying belongs to thermal spraying technology, which needs to heat the powder at high temperature to deposit and form a coating in a molten state, so that the problem of phase change will inevitably occur, resulting in Y 2 o 3 Reduced coating performance
At the same time, it has been reported that Y produced by plasma spraying method 2 o 3 The coating sometimes appears black instead of white (such as: CN201110396482.3, CN201110396196.7 and other Chinese patent application numbers), which affects the appearance of the coating, and even affects the performance of the coating to a certain extent, such as black powder May contaminate etch chamber

Method used

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  • Improvement method for preparing Y2O3 ceramic coating through cold spraying
  • Improvement method for preparing Y2O3 ceramic coating through cold spraying
  • Improvement method for preparing Y2O3 ceramic coating through cold spraying

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] In this example, Y was prepared by cold spraying 2 o 3 The improved method of ceramic coating comprises following experimental steps:

[0028] (1) Preparation of micron-scale Y agglomerated by nanopowder 2 o 3 Ceramic powder, Y 2 o 3 Nano powder, ammonium sulfate powder and deionized water are mixed according to the mass ratio of 50:3:100, hydrothermal treatment is carried out at 150°C for 2 hours, the sulfate ion is removed by cleaning, and the micron-sized Y powder agglomerated by nano powder is obtained after drying. 2 o 3 Ceramic powder; Y 2 o 3 Ceramic powder is a micron-sized powder formed by agglomeration of nanopowder, its primary particle size is 100-150nm, and the secondary particle size after agglomeration is 30-40μm;

[0029] (2) Al powder and above-mentioned micron grade Y 2 o 3 Mix the powder evenly, the volume ratio is 1:1;

[0030] (3) Al+Y obtained in (2) is transformed by cold spraying 2 o 3 The mixed powder is deposited on the surface of ...

Embodiment 2

[0036] In this example, Y was prepared by cold spraying 2 o 3 The improved method of ceramic coating comprises following experimental steps:

[0037] (1) Preparation of micron-scale Y agglomerated by nanopowder 2 o 3 Ceramic powder, Y 2 o 3 Nano powder, ammonium sulfate powder and deionized water are mixed according to the mass ratio of 30:1:90, hydrothermal treatment is carried out at 120°C for 3 hours, the sulfate ion is cleaned and removed, and the micron-sized Y powder agglomerated by nano powder is obtained after drying. 2 o 3 Ceramic powder; Y 2 o 3 Ceramic powder is a micron-sized powder formed by agglomeration of nanopowder, its primary particle size is 50-80nm, and the secondary particle size after agglomeration is 20-30μm;

[0038] (2) Al powder and above-mentioned micron grade Y 2 o 3 Mix the powder evenly, the volume ratio is 1:2;

[0039] (3) Al+Y obtained in (2) is transformed by cold spraying 2 o 3 The mixed powder is deposited on the surface of 606...

Embodiment 3

[0045] In this example, Y was prepared by cold spraying 2 o 3 The improved method of ceramic coating comprises following experimental steps:

[0046] (1) Preparation of micron-scale Y agglomerated by nanopowder 2 o 3 Ceramic powder, Y 2 o 3 Nano powder, ammonium sulfate powder and deionized water are mixed according to the mass ratio of 40:2:80, hydrothermal treatment is carried out at 160°C for 4 hours, the sulfate ion is cleaned and removed, and the micron-sized Y powder agglomerated by nano powder is obtained after drying. 2 o 3 Ceramic powder; Y 2 o 3 Ceramic powder is a micron-sized powder formed by agglomeration of nanopowder, its primary particle size is 160-200nm, and the secondary particle size after agglomeration is 40-50μm;

[0047] (2) Al powder and above-mentioned micron grade Y 2 o 3 Mix the powder evenly, the volume ratio is 1:2;

[0048] (3) Al+Y obtained in (2) is transformed by cold spraying 2 o 3 The mixed powder is deposited on the surface of 606...

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Abstract

The invention relates to the technical field of preparing of Y2O3 ceramic coatings, in particular to an improvement method for preparing a Y2O3 ceramic coating through cold spraying. The improvement method includes the following specific steps that firstly, micron order Y2O3 ceramic powder agglomerated through nano powder is prepared; secondly, Al powder and the micron order Y2O3 powder are evenlymixed, and the size ratio is 1:1-1:4; thirdly, cold spraying is used for spraying mixed powder of the Al powder and the micron order Y2O3 powder to the surface of an aluminum alloy base body to obtain an Al+Y2O3 metal ceramic coating; fourthly, cold spraying is used for spraying the micron order Y2O3 powder to the surface of the Al+Y2O3 metal ceramic coating to obtain the Y2O3 ceramic coating; and finally, a double-layer composite Y2O3 ceramic coating with the bottom layer being the Al+Y2O3 metal ceramic coating and the upper layer being the Y2O3 ceramic coating is obtained. By means of the improvement method, the composite Y2O3 ceramic coating with the thickness being 10 microns to 400 microns can be prepared on the aluminum alloy base body by only adopting low-cost compressed air as carrier gas, the problem that the heat expansion coefficient difference between the cold spraying Y2O3 ceramic coating and the aluminum alloy metal base body is large is solved, and the combining force of the coating is improved.

Description

technical field [0001] The present invention relates to Y 2 o 3 The preparation technical field of ceramic coating, specifically a kind of cold spraying preparation Y 2 o 3 Improved methods for ceramic coatings. Background technique [0002] In the plasma etching process, the chemically active plasma is usually composed of Cl 2 or CF 4 Produced by gas discharge, it not only contains electrons and ions, but also contains a large number of active free radicals (such as Cl*, C1 2 *, F*, CF*, etc.). These active free radicals are corrosive and will have a strong corrosion effect on the inner surface of the etching chamber, pollute the chamber, affect the etching effect, and even directly cause the etching chamber to fail. In the plasma etching equipment in the 1990s, due to the low power and the use of a single plasma source, the aluminum substrate layer plus Al 2 o 3 The coating can block the etching damage of the plasma to the etching chamber. As the plasma power inc...

Claims

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Application Information

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IPC IPC(8): C23C24/04C22C29/12
CPCC22C29/12C23C24/04
Inventor 熊天英沈艳芳王吉强杨阳吴杰崔新宇杜昊
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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