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Single crystal silicon refining production process and refining device thereof

A refining device and production process technology, which is applied in the field of single crystal silicon refining production process and its refining device, can solve the problems that the tail growth process cannot be accurately controlled, slow cooling, insufficient crystallization strength, etc., to ensure the necking growth process, Accurately generate speed effects

Inactive Publication Date: 2019-12-03
南通晶耀新能源有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Aiming at the deficiencies of the prior art, the present invention provides a single crystal silicon refining production process and its refining device, which solves the problems of the current single crystal silicon refining production process and its refining device in the necking growth process, shoulder growth process, etc. Neither the radial growth process nor the tail growth process can achieve precise control, and after the monocrystalline silicon ingot is produced, it needs to be quickly transferred to the holding furnace for slow cooling, which will damage the newly formed monocrystalline silicon ingot with insufficient crystallization strength The problem

Method used

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  • Single crystal silicon refining production process and refining device thereof
  • Single crystal silicon refining production process and refining device thereof
  • Single crystal silicon refining production process and refining device thereof

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Embodiment

[0033] see Figure 1-4 , the present invention provides the following technical solutions: a single crystal silicon refining production process, including the following steps:

[0034] S1, feeding process: put the accurately weighed polysilicon raw materials and doping materials into the heating tank according to the ratio set by the process. The type of doping materials depends on the N or P type of resistance, and the content of doping materials depends on the conductivity. and purity requirements are determined, and the types of doping materials include boron, phosphorus, antimony, and arsenic;

[0035] S2, melting process: After adding the polysilicon raw material into the quartz crucible, the crystal growth furnace is closed and evacuated, and then filled with high-purity argon to maintain a certain pressure range, and then turn on the power of the graphite heater to heat until the polysilicon is melted Above the temperature, the mixture of polysilicon raw material and d...

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Abstract

The invention belongs to the technical field of single crystal silicon refining, and particularly relates to a single crystal silicon refining production process and a refining device thereof. The refining device comprises a base; a furnace body is fixedly installed at the middle of the top of the base, and four guide pillars are fixed to the sides of the base. A lifting plate is movably fitted inthe middle portions of the four guide columns. A furnace cover is fixedly fastened to the middle of the lifting plate. The top of the furnace cover is vertically connected with a stretching tube. Theinner wall of the stretching tube is fitted with a graphite piston. The bottom end is vertically connected with a seed rod, and the top end of the graphite piston is vertically fixedly connected witha ball screw. In the invention, the servo motor is driven to rotate the screw nut through the gearbox, and then the ball screw and the graphite piston are screwed down to move along the stretching tune, so that the seed rod can contact the silicon melt, and the rotation speed can be accurately controlled. The necking growth process, the shoulder growth process, the isometric growth process and the tail growth process can be well ensured, and the formation speed of the single crystal silicon rod can be precisely controlled.

Description

technical field [0001] The invention relates to the technical field of single crystal silicon refining, in particular to a single crystal silicon refining production process and a refining device thereof. Background technique [0002] Single crystal silicon is a single crystal of silicon with a basically complete lattice structure. Different directions have different properties. It is a good semiconducting material with a purity requirement of more than 99.9999%. Single crystal silicon has a diamond lattice. The crystal is hard and brittle, has a metallic luster, and can conduct electricity, but its conductivity is lower than that of metals and increases with temperature. It has semiconductor properties. Single crystal silicon is an important semiconductor material. Doping a small amount of group IIIA elements into single crystal silicon forms a P-type semiconductor, and doping a small amount of group VA elements forms an N-type semiconductor. The combination of N-type and P...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/06C30B15/04C30B15/20
CPCC30B15/04C30B15/20C30B29/06
Inventor 张大鹏
Owner 南通晶耀新能源有限公司
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