Dual-mode metasurface based on SOI material and dual-mode display application of dual-mode metasurface

A metasurface and top surface technology, applied in the field of micro-nano optics, can solve the problems of limited geometric structure, difficult to put into mass production and application, etc., and achieve the effect of high efficiency and maximized energy utilization

Inactive Publication Date: 2019-12-13
WUHAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, optical devices based on metasurfaces are widely studied, but limited to the fine geometric structure of metasurfaces. Most metasurfaces are limited to scientific research and are difficult to put into mass production and application.

Method used

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  • Dual-mode metasurface based on SOI material and dual-mode display application of dual-mode metasurface
  • Dual-mode metasurface based on SOI material and dual-mode display application of dual-mode metasurface
  • Dual-mode metasurface based on SOI material and dual-mode display application of dual-mode metasurface

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Experimental program
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Embodiment

[0075] See figure 1 The nano-brick unit structure shown includes three layers, which are silicon substrate 1, fused silica medium layer 2 and nano-brick 3 constructed of crystalline silicon in sequence from bottom to top. The nano-brick array is composed of a periodic arrangement of nano-brick unit structures, and the nano-brick is in the shape of a cuboid, and its length, width and height are all sub-wavelength dimensions.

[0076] The nano-brick array structure based on SOI material can be fabricated by a conventional photolithography process in this field, and a specific preparation process will be provided below, including steps:

[0077] (1) SOI surface coated with photoresist;

[0078] (2) Using electron beam direct writing or photolithography machine to expose photoresist;

[0079] (3) After developing and etching in sequence, the array of dielectric nano-bricks is obtained on the SOI substrate (1, 2).

[0080] For the convenience of understanding, the working princi...

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Abstract

The invention discloses a dual-mode metasurface based on an SOI material. Geometrical parameters of a nanometer brick structure of the metasurface are designed so that one structure represents functions of a polarizer or a half-wave plate corresponding to different wavelengths. The metasurface is composed of a silicon nanometer brick array, a fused quartz dielectric layer and a silicon substrate layer. Based on the function, near-field continuous grayscale image display for the polarizer and far-field two-step Fourier holographic imaging for the half-wave plate can be designed by combining light wave intensity and phase modulation effects of the polarizer and the half-wave plate, the two imaging modes do not influence each other, and the dual-mode metasurface and application thereof can beapplied to the fields of polarization display, encryption, counterfeiting prevention and the like.

Description

technical field [0001] The invention relates to the field of micro-nano optics, in particular to a dual-mode metasurface designed based on SOI material, which simultaneously realizes the functions of a polarizer and a half-wave plate and is used for dual-mode display applications. Background technique [0002] As a new type of optical material, metasurfaces are composed of subwavelength structural antennas, and have some extraordinary physical properties that natural materials do not have. By rationally designing the geometry and size parameters of the metasurface unit structure, functions such as amplitude and phase modulation, polarization control, and filtering of light waves can be realized. At present, optical devices based on metasurfaces have been extensively studied, but are limited to the fine geometric structures of metasurfaces. Most metasurfaces are limited to scientific research and are difficult to put into mass production and application. Therefore, there is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00G02B5/30
CPCG02B1/002G02B5/3025G02B5/3083
Inventor 戴琦郑国兴李子乐李仲阳邓娟付娆邓联贵李嘉鑫
Owner WUHAN UNIV
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