Self-purification type developing solution composition, preparation method thereof and developing method using self-purification type developing solution composition

A developing solution and composition technology, applied in the field of developing solution, can solve problems such as substrate contamination, hindering the development process, and inaccurate photoresist images, so as to reduce the probability of agglomeration, have no photoresist residue, and have good developing performance Effect

Pending Publication Date: 2020-01-24
江西卓讯微电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Foam residue will block the contact between the developer and the photoresist, resulting in insufficient removal of the photoresist and poor development effect, thus affecting the integrity and fineness of the wiring
In addition, as the development time prolongs, oily scum will gradually be produced in the developer, and the scum will adhere to the surface of the substrate, hindering the development process, resulting in inaccurate photoresist images formed and contamination of the substrate

Method used

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  • Self-purification type developing solution composition, preparation method thereof and developing method using self-purification type developing solution composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Example 1, preparation of developing solution S1: at normal temperature, 95% inorganic alkali (Na 2 CO 3 ), 2.2% sulfonate type anionic surfactant (ABS), 2% defoamer (GPE), 0.8% inhibitor (C 2 H 2 O 4 ), add it into deionized water and stir well to get it.

[0027] S2-S9 and D1-D4 were prepared by mixing the components in exactly the same way as in Example 1.

[0028] Table 1 List of component names and dosages of developers S1-S9 and D1-D4

[0029]

[0030] ABS: branched alkyl benzene sulfonate

[0031] LAS: Sodium Linear Alkylbenzene Sulfonate

[0032] AOS: alpha-olefin sulfonate

[0033] MES: α-sulfomonocarboxylic acid and its derivatives

[0034] GPE: Polyoxypropylene polyoxyethylene glycerol ether

[0035] PDMS: Polydimethylsiloxane

[0036] EG: Emulsified Glycerin

[0037] C 2 H 2 O 4 :oxalic acid

[0038] C 6 H 8 O 7 : Citric acid

[0039] NMP: N-Methylpyrrolidone

[0040] DM: Diethylene glycol monomethyl ether

[0041] Vo: volume of organ...

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PUM

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Abstract

The invention relates to a developing solution composition. The developing solution composition comprises the following components in percentage by weight: 85 to 95 percent of inorganic base; 2.2 to 7.5 percent of sulfonate type anionic surfactant; 2 to 4 percent of defoaming agent; 0.8 to 3.5 percent of inhibitor; and deionized water serving as a solvent. The concentration of the inorganic base is 8 to 12g/L. The developing solution composition provided by the invention has the advantages of good developing performance, low foam, self-purification and the like, and is widely applied to the developing process of a touch film process.

Description

technical field [0001] The invention belongs to the technical field of developing solutions, and in particular relates to a self-cleaning developing solution composition for removing photoresist for touch films. Background technique [0002] With the expansion of the touch film industry and the continuous advancement of technology, the line width is continuously reduced, and the processing technology requirements for fine patterns are increasing. Although dry etching is more accurate for microfabrication than wet etching, its etching time is longer and it is more suitable for superficial microfabrication. Therefore, mature and reliable wet etching is still the mainstream processing technology. Photoresists are often used in wet processes, and photoresists can be divided into two categories: negative photoresist and positive photoresist. The cross-linking reaction or polymerization reaction occurs after illumination, and the insoluble substance is formed as a negative glue; ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
CPCG03F7/322
Inventor 胡冬生
Owner 江西卓讯微电子有限公司
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