Preparation method of nanoscale ultra-pure silicon oxide microsphere powder
A silicon oxide microsphere and nano-scale technology, applied in the direction of silicon oxide, silicon dioxide, chemical instruments and methods, etc., can solve the problems of difficult development in the field of electronic technology packaging, complicated preparation and operation technology, poor particle uniformity, etc., to achieve true The effect of good roundness, less purity and low production cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0023] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings. It should be understood that these descriptions are exemplary only, and are not intended to limit the scope of the present invention. Also, in the following description, descriptions of well-known structures and techniques are omitted to avoid unnecessarily obscuring the concept of the present invention.
[0024] Such as figure 2 As shown, a preparation device for nano-scale microsphere powder includes a reaction chamber 6, the reaction chamber 6 is a closed chamber, the ambient temperature is 50-150°C, and the reaction chamber 6 is provided with a first container 2 and an electron gun 3 , the first container 2 is made of graphite, for example, the first container 2 can be a crucible made of graphite, silicon 1 is arrange...
PUM
![No PUM](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka.patsnap.com/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap