Composite structure getter film and preparation method thereof

Abstract

The present disclosure provides a composite structure getter thin film and a preparation method thereof. The method includes providing a substrate; using a first getter alloy as a target material, and depositing a magnetron sputtering layer on the substrate by magnetron sputtering; And using the second getter alloy as a target material, a vacuum evaporation coating method is used to deposit a vacuum evaporation layer on the magnetron sputtering layer to obtain a composite structure getter film. The disclosure uses different coating methods to construct a composite structure getter film with a microscopic gradient morphology design, so that the obtained composite structure getter film can simultaneously satisfy good film mechanical properties, high porosity, and high air absorption capacity , high inhalation rate and low-temperature activation, etc., have good industrial application prospects.

Description

technical field [0001] The disclosure relates to the field of getters, in particular to a composite structure getter film and a preparation method thereof. Background technique [0002] As an important component to maintain a long-term vacuum environment, the getter (thin film) plays an irreplaceable role in electric vacuum devices due to its passive and low ultimate vacuum. With the rapid development of electric vacuum devices towards miniaturization and integration, and the emergence of micro-electromechanical systems (MEMS), the high-temperature activation process of traditional getters will increase the probability of damage to micro-devices and the difficulty of vacuum packaging of devices. In addition, with the increasing service life of these microelectronic devices, higher requirements are placed on the getter capacity and mechanical properties of the getter. Therefore, the development of new getters with low activation temperature, convenient device packaging proce...

AI Technical Summary

Problems solved by technology

[0004] Although the above method can obtain a getter film with a low activation temperature and good mechanical properties, which brings convenience to the application of the getter in microelectronic devices, there is a disadvantage that the getter film has a significantly low getter capacity. For block getters, the ultimate vacuum degree that can be maintained is not high, and the vacuum maintenance time is not long, etc.

Images