Chalcogenide phase-material with transparent communication waveband and preparation method thereof
A phase change material and wave band technology, applied in the field of microelectronics, can solve the problems of high extinction coefficient and low thermal stability in the communication band, and achieve the effects of low extinction coefficient, high thermal stability and good phase stability.
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Embodiment 1
[0029] The general chemical formula of the transparent chalcogenide phase change material in the communication band prepared in this example is Ge z Sb 2 Te y -S(Se) x , in this example, S(Se) selects Se, z=2, y=1, x=4.
[0030] Ge 2 Sb 2 Se 4 Te 1 The thin film is prepared by thermal evaporation method, and the vacuum degree is less than 10 during the preparation. -6 In the vacuum chamber with a pressure of Pa, place a 2cm×2cm quartz substrate on the upper sample stage of the vacuum coating machine, and use the heating heat to evaporate the tantalum boat to heat the Ge 2Sb 2 Se 4 Te 1 The target glass is deposited at a deposition rate of 10A / s, and the deposition rate and film thickness are monitored in real time by the film thickness meter inside the coating machine. Concrete preparation method comprises the following steps:
[0031] 1. Select a quartz substrate with a size of 2cm×2cm, clean the surface and back, remove dust particles, organic and inorganic impur...
Embodiment 2
[0046] The general chemical formula of the transparent chalcogenide phase change material in the communication band prepared in this example is Ge z Sb 2 Te y -S(Se) x , in this example, S(Se) selects S, z=2, y=1, x=4.
[0047] Ge 2 Sb 2 S 4 Te 1 The thin film is prepared by thermal evaporation method, and the vacuum degree is less than 10 during the preparation. -6 In the vacuum chamber with a pressure of Pa, place a 2cm×2cm quartz substrate on the upper sample stage of the vacuum coating machine, and use the heating heat to evaporate the tantalum boat to heat the Ge 2 Sb 2 S 4 Te 1 The target glass is deposited at a deposition rate of 10A / s, and the deposition rate and film thickness are monitored in real time by the film thickness meter inside the coating machine. Concrete preparation method comprises the following steps:
[0048] 1. Select a quartz substrate with a size of 2cm×2cm, clean the surface and back, remove dust particles, organic and inorganic impurit...
Embodiment 3
[0063] The general chemical formula of the transparent chalcogenide phase change material in the communication band prepared in this example is Ge z Sb 2 Te y -S(Se) x , in this example, S(Se) selects S, z=0, y=0, x=3.
[0064] The Sb2S3 thin film is prepared by thermal evaporation method, and the vacuum degree is less than 10 during preparation. -6 In a vacuum chamber with a pressure of Pa, place a 2cm×2cm quartz substrate on the upper sample stage of the vacuum coating machine, heat the Sb2S3 target glass by evaporating a tantalum boat with heating heat, and deposit a film at a deposition rate of 10A / s. The rate and film thickness are monitored in real time by the film thickness gauge inside the coating machine. Concrete preparation method comprises the following steps:
[0065] 1. Select a quartz substrate with a size of 2cm×2cm, clean the surface and back, remove dust particles, organic and inorganic impurities:
[0066] a) Ultrasonic the quartz substrate with 30W po...
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