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Liquid methacrylic acid functionalized POSS, photo-cured acrylic resin modified by liquid methacrylic acid functionalized POSS, and preparation methods thereof

A methacrylic acid, functionalized technology, applied in the field of light-curing resin, can solve the problems of poor performance of composite materials, poor compatibility between POSS and substrates, etc., and achieve poor high temperature resistance of modification, good heat resistance and mechanical properties, good compatibility

Active Publication Date: 2020-05-08
HANGZHOU NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The present invention aims to overcome the defects of poor performance of composite materials in the prior art due to the poor compatibility between POSS and the base material

Method used

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  • Liquid methacrylic acid functionalized POSS, photo-cured acrylic resin modified by liquid methacrylic acid functionalized POSS, and preparation methods thereof
  • Liquid methacrylic acid functionalized POSS, photo-cured acrylic resin modified by liquid methacrylic acid functionalized POSS, and preparation methods thereof
  • Liquid methacrylic acid functionalized POSS, photo-cured acrylic resin modified by liquid methacrylic acid functionalized POSS, and preparation methods thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] A kind of liquid methacrylic acid functionalized POSS, its structural formula of described liquid methacrylic acid functionalized POSS is as shown in (I):

[0048]

Embodiment 2

[0050] A preparation method of liquid methacrylic acid functionalized POSS, said preparation method comprising the following steps:

[0051] (1) Dissolve 6.25g tetraethyl orthosilicate (0.03mol) and 5.43g tetramethylammonium hydroxide pentahydrate (0.03mol) in 50ml methanol, add 0.54ml distilled water (0.03mol) dropwise thereto, room temperature The hydrolysis and condensation reaction was carried out for 12 hours to obtain the clathrate octapolytetramethylammonium silicate, and then a solution of 9.9g dimethylchlorosilane (0.105mol) dissolved in 20ml n-hexane was added dropwise thereto for substitution reaction to obtain the clathrate tetramethylammonium silicate. Poly(dimethylsiloxy)silsesquioxane;

[0052] (2) Dissolve 1.016g cage-shaped octapoly(dimethylsiloxy)silsesquioxane (0.01mol) and 10.08g allyl methacrylate (0.08mol) in 50ml toluene, at a concentration of Hydrosilylation reaction occurs under the catalysis of 50ppm of Castel catalyst containing 2% platinum, and liq...

Embodiment 3

[0055] A preparation method of liquid methacrylic acid functionalized POSS, said preparation method comprising the following steps:

[0056] (1) Dissolve 4.16g of tetraethyl orthosilicate (0.02mol) and 3.623g of tetramethylammonium hydroxide pentahydrate (0.02mol) in 50ml of isopropanol, and dropwise add 0.3.6ml of distilled water (0.02mol ), reflux hydrolysis condensation reaction 6h, obtain clathrate octapolytetramethylammonium silicate, then add 9.46g dimethyl chlorosilane (0.1mol) to it and carry out substitution reaction and obtain clathrate octapoly (dimethyl Silsesquioxane (siloxy)silsesquioxane;

[0057] (2) Dissolve 1.016g cage-shaped octapoly(dimethylsiloxy)silsesquioxane (0.01mol) and 12.6g allyl methacrylate (0.1mol) in 50ml toluene, at a concentration of Hydrosilylation reaction occurs under the catalysis of 50ppm platinum-containing 2% Castel catalyst, and liquid methacrylic acid functionalized POSS is obtained.

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Abstract

The invention relates to the field of photo-cured resin, in particular to liquid methacrylic acid functionalized POSS and photo-cured acrylic resin modified by the liquid methacrylic acid functionalized POSS, and preparation methods thereof. According to the preparation method for the liquid methacrylic acid functionalized POSS, tetraethoxysilane is used as a raw material and undergoes hydrolysisunder the catalysis of tetramethylammonium hydroxide to obtain cage-like octakis(tetramethylammonium)silicate, then cage-like octa(tetramethylammonium)silicate undergoes a substitution reaction with dimethylchlorosilane to synthesize octakis(dimethylsiloxy)-T8-silsesquioxane, and octakis(dimethylsiloxy)-T8-silsesquioxane and allyl methacrylate are subjected to a hydrosilylation reaction so as to obtain the liquid methacrylic acid functionalized POSS. According to the invention, the liquid methacrylic acid functionalized POSS is introduced into acrylic resin through a photocuring reaction, so the defects of poor compatibility between the POSS and a substrate and poor performance of a composite material in the prior art are overcome; and the method can greatly enhance the thermodynamic properties of the acrylic resin and lower the water absorptivity and curing shrinkage rate of the resin, and has the advantages of simple operation, usage of easily-available raw materials and easy control, so the photo-cured acrylic resin has great development advantages in the aspect of modified 3D printing photosensitive resin.

Description

technical field [0001] The invention relates to the field of photocurable resins, in particular to a liquid methacrylic acid functionalized POSS and a photocurable acrylic resin modified by the POSS and a preparation method thereof. Background technique [0002] 3D printing is a new type of technology that is widely concerned at present, and it is expected to be widely used in our daily life production. With the rapid development of this technology, people's requirements for the quality of 3D printed products are also getting higher and higher. In addition to further optimizing the performance of the printer, the most important thing for researchers is to be able to prepare a photosensitive resin with the properties required by the target finished product. In other words, the performance of photosensitive resin will directly affect the quality of printed products and determine the application prospect of 3D printing technology. [0003] At present, acrylic resin is one of t...

Claims

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Application Information

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IPC IPC(8): C08G77/04C08G77/06C08G77/38C08F283/12C08F220/14C08F220/18
CPCC08G77/045C08G77/06C08G77/38C08F283/124C08F220/14
Inventor 吴连斌吴徐芳邱化玉裴勇兵颜悦
Owner HANGZHOU NORMAL UNIVERSITY
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