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Acid etching solution and acid etching treatment method for titanium implants

A treatment method and implant technology, applied in the directions of titanium oxide/hydroxide, titanium dioxide, etc., can solve the problems of acid gas polluting the environment, volatile acid etching solution, endangering the health of operators, etc., to increase the effective area of ​​etching , good surface quality, good surface quality effect

Active Publication Date: 2022-03-29
广东安特齿科有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It aims to solve the problem of polluting the environment and endangering the health of operators due to the volatile acid gas in the acid etching solution in the related technology

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0067] In parts by weight, the etching solution contains: 30 parts of sulfuric acid with a mass fraction of 50%, 0.01 part of hydrofluoric acid with a mass fraction of 40%, 3 parts of ethylenediaminetetraacetic acid, 2 parts of sodium lauryl sulfate, sulfamic acid 3 parts of acid and 50 parts of water.

[0068] First, configure the etching solution according to the above ratio, and place the prepared etching solution in the etching tank for use. At the same time, high-temperature steam is used to clean the surface of the titanium implant to be etched to remove surface oil and obtain a clean titanium implant. Then put the clean titanium implant into the etching solution in the etching tank, perform ultrasonic treatment at room temperature for 60 minutes, then take it out, clean and dry it. Finally, the acid etching solution after acid etching is subjected to aging treatment, and then filtered to obtain titanium dioxide and the acid etching solution for reuse.

Embodiment 2

[0070] In parts by weight, the etching solution contains: 45 parts of sulfuric acid with a mass fraction of 60%, 0.04 parts of a fluorine-containing salt with a mass fraction of 50%, 2 parts of phosphate, 4 parts of ethylene glycol n-butyl ether, 3 parts of ethylenediamine, 3 parts of alkylsulfonate, 2 parts of aminotetrazole compound, 3 parts of dimethylformamide, 2 parts of butynediol and 65 parts of water.

[0071] First, configure the etching solution according to the above ratio, and place the prepared etching solution in the etching tank for use. At the same time, high-temperature steam is used to clean the surface of the titanium implant to be etched to remove surface oil and obtain a clean titanium implant. Then put the clean titanium implant into the etching solution in the etching tank, perform ultrasonic treatment at room temperature for 80 minutes, then take it out, clean and dry it. Finally, the acid etching solution after acid etching is subjected to aging treat...

Embodiment 3

[0073] In parts by weight, the etching solution contains: 50 parts of sulfuric acid with a mass fraction of 60%, 0.2 parts of hydrofluoric acid with a mass fraction of 60%, 2 parts of organic phosphonates, 2 parts of ethylene glycol n-butyl ether, 3 parts of sulfamic acid 4 parts of succinate, 3 parts of cyclohexanediamine acetic acid, 4 parts of methylpropanediol, 3.5 parts of pyridine and 70 parts of water.

[0074] First, configure the etching solution according to the above ratio, and place the prepared etching solution in the etching tank for use. At the same time, high-temperature steam is used to clean the surface of the titanium implant to be etched to remove surface oil and obtain a clean titanium implant. Then put the clean titanium implant into the etching solution in the etching tank, perform ultrasonic treatment at room temperature for 90 minutes, then take it out, clean and dry it. Finally, the acid etching solution after acid etching is subjected to aging treat...

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Abstract

The invention discloses an acid etching solution and an acid etching treatment method for a titanium implant. Wherein, by weight, the acid etching solution contains: sulfuric acid, 30-50 parts; fluorine compound, 0.01-5 parts; complexing agent, 1-5 parts; surfactant, 1-5 parts; ‑5 parts and 50‑100 parts water. The technical scheme of the invention can solve the problems in the related art that the acid etching liquid is easy to volatilize the acid gas, which will pollute the environment and endanger the health of operators.

Description

technical field [0001] The invention relates to the technical field of surface treatment of titanium implants, in particular to an acid etching solution and an acid etching treatment method for titanium implants. Background technique [0002] At present, titanium implants (such as dental implants, intraosseous implants, etc.) are mainly made of pure titanium or titanium alloys, and the surface roughness is improved by sandblasting and acid etching to form a microstructure. The acid etching solution used in the acid etching treatment in the related art is usually a mixed acid of hydrochloric acid and sulfuric acid. In this way, when the acid etching solution is prepared, due to the volatility of hydrochloric acid, a large amount of acid gas is often produced, causing environmental pollution, and causing damage to the environment. Hazard to operator's health. [0003] The above content is only used to assist in understanding the technical solution of the present invention, an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/26C23F1/46C01G23/053
CPCC23F1/26C23F1/46C01G23/053
Inventor 王五星
Owner 广东安特齿科有限公司