Micro-mirror with completely symmetrical differential capacitance angle feedback

A differential capacitance, completely symmetrical technology, applied in the field of micromirrors with completely symmetrical differential capacitance angle feedback, can solve problems such as poor control accuracy, inability to apply high frequency and low frequency at the same time, and complex system

Active Publication Date: 2020-05-29
XIAN CHISHINE OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] In view of the poor control accuracy of the existing micromirror without feedback, the angle measurement scheme of the micromirror with angle feedback has problems such as complex system, low signal-to-noise ratio, inability to apply to high frequency and low frequency at the same time, and poor process compatibility. The present invention provides a A Micromirror with Fully Symmetrical Differential Capacitive Angle Feedback

Method used

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  • Micro-mirror with completely symmetrical differential capacitance angle feedback
  • Micro-mirror with completely symmetrical differential capacitance angle feedback
  • Micro-mirror with completely symmetrical differential capacitance angle feedback

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Embodiment 1

[0081] The micro-mirror with fully symmetrical differential capacitance angle feedback described in this embodiment, see Figure 1-Figure 3 , comprising a base 1, the upper surface of the base 1 is provided with a first insulating layer 2, the upper surface of the first insulating layer 2 is provided with a first fixed layer 3, and the upper surface of the first fixed layer 3 is provided There is a second insulating layer 4, the upper surface of the second insulating layer 4 is provided with a reflective element layer 5, the upper surface of the reflective element layer 5 is provided with a third insulating layer 6, and the upper surface of the third insulating layer 6 is A second fixed layer 7 is provided on the surface, and a fourth insulating layer 8 is provided on the upper surface of the second fixed layer 7 , and a welding pad 9 is provided on the fourth insulating layer 8 . There are 13 pads in total. The pads are electrically connected to each structural layer through...

Embodiment 2

[0101] The micromirror with fully symmetrical differential capacitive angle feedback described in this embodiment includes a base 1, the upper surface of the base 1 is provided with a first insulating layer 2, and the upper surface of the first insulating layer 2 is provided with a second A fixed layer 3, the upper surface of the first fixed layer 3 is provided with a second insulating layer 4, the upper surface of the second insulating layer 4 is provided with a reflective element layer 5, and the upper surface of the reflective element layer 5 is provided There is a third insulating layer 6, the upper surface of the third insulating layer 6 is provided with a second fixed layer 7, the upper surface of the second fixed layer 7 is provided with a fourth insulating layer 8, and the fourth insulating layer 8 Pad 9 is provided on it. The base 1 is a hollow frame structure surrounded by borders, see Figure 4-Figure 5 , the first insulating layer 2, the first fixed layer 3, the s...

Embodiment 3

[0102] Embodiment 3 concrete preparation method

[0103] In order to better illustrate the manufacturing method of the micromirror with complete symmetrical differential capacitance angle feedback described in embodiment 1, in combination Figure 20(1)-Figure 20(18) The production method is listed and explained as shown.

[0104] The described micromirror with symmetrical differential capacitance angle feedback, its manufacturing method comprises the following steps:

[0105] (1) Prepare the silicon wafer. The silicon wafer is monocrystalline silicon or polycrystalline silicon, polished on both sides, with a thickness of 150 μm and a resistivity of 0.01Ω·cm. See Figure 20(1).

[0106] (2) The first photolithography on the front side defines the corresponding pattern of the vertical position change of the oxygen ion implantation area on the front side. See Figure 20(2).

[0107] (3) For the first dry etching on the front side, a groove-like structure is etched on the front...

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Abstract

The invention relates to the field of micro-nano optical devices, and specifically relates to a micro-mirror with completely symmetrical differential capacitance angle feedback. The micro-mirror comprises a base. A first insulating layer is arranged on the upper surface of the base. A first fixing layer is arranged on the upper surface of the first insulating layer. A second insulating layer is arranged on the upper surface of the first fixing layer, a reflecting element layer is arranged on the upper surface of the second insulating layer, a third insulating layer is arranged on the upper surface of the reflecting element layer, a second fixing layer is arranged on the upper surface of the third insulating layer, a fourth insulating layer is arranged on the upper surface of the second fixing layer, and a bonding pad is arranged on the fourth insulating layer. According to the scheme, the angle sensor is integrated in the micro-mirror, the structure is compact, power consumption is low, and process compatibility is high. The structure has vertical and planar symmetry at the same time, driving is reliable and easy, the detection signal-to-noise ratio is high, and the complexity of adetection signal processing circuit is remarkably reduced. Application requirements from low frequency to high frequency can be met.

Description

technical field [0001] The invention relates to the field of micro-nano optical devices, in particular to a micromirror with fully symmetrical differential capacitance angle feedback. Background technique [0002] Micromirror is a kind of micro-nano chip that can effectively control the optical path, and is widely used in projection, imaging, laser navigation and other fields. At present, the most widely used micromirrors include electrostatic, electromagnetic, piezoelectric and electrothermal. Most of the currently used micromirrors adopt the open-loop control method without angle feedback. A serious shortcoming of this kind of micromirror is the lack of effective angle feedback, which causes the problem of inaccurate control of the micromirror, which leads to projection and imaging drift. , Navigation deviation and other issues. Some existing micromirrors use a certain angle feedback, but there are still many problems. [0003] For the currently used micromirrors, one w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81B7/00B81C1/00G02B26/08
CPCB81B7/0006B81B7/007B81C1/00301G02B26/0841B81B2201/02
Inventor 李欢欢白民宇郭迪李晓晓马力彭磊
Owner XIAN CHISHINE OPTOELECTRONICS TECH CO LTD
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