A manufacturing process for target crystal grain miniaturization

A target and grain technology, applied in metal material coating process, manufacturing tools, metal rolling, etc., can solve the problems of insufficient concentration of size distribution, large target grain size, high production cost, etc., and achieve the concentration of size distribution , Small target grain size, low production cost

Active Publication Date: 2021-11-19
爱发科电子材料(苏州)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is that the grain size of the target material in the prior art is large, and the size distribution is not concentrated enough, and there are technical problems such as complex process and high production cost in the target material manufacturing process.

Method used

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  • A manufacturing process for target crystal grain miniaturization
  • A manufacturing process for target crystal grain miniaturization
  • A manufacturing process for target crystal grain miniaturization

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] A manufacturing process for target crystal grain miniaturization, comprising the following steps:

[0037] (1) One-time rolling: Put the aluminum ingot into the heating furnace, set the maximum temperature of the furnace body to 250°C, use the temperature detection head in the heating furnace to observe the temperature of the aluminum ingot in real time, when the actual temperature of the aluminum ingot is 170°C, Rolling the aluminum ingot once;

[0038] Among them, in one calendering, it is divided into 13 passes, and the reduction amount of each pass is 20mm. After the calendering is completed, cut off the irregular parts of the head and tail of the calendered plate to obtain a semi-finished target material; the thickness of the semi-finished target material It is 118mm.

[0039] (2) Secondary calendering: Put the semi-finished target material into the heating furnace, set the maximum heating temperature of the furnace body to 380°C, use the temperature detection hea...

Embodiment 2

[0043] A manufacturing process similar to that of Example 1 was adopted, except that in the first rolling step of step (1), when the actual temperature of the aluminum ingot was 220° C., the aluminum ingot was rolled once. The finished target material is denoted as S2.

[0044] Calculate the step retention rate during the target material manufacturing process, and the final step retention rate = 93-95%.

Embodiment 3

[0046] A manufacturing process similar to that of Example 1 was adopted, except that in the second calendering step of step (2), when the actual temperature of the semi-finished target was 350° C., the semi-finished target was subjected to secondary calendering. The finished target material is denoted as S3.

[0047] Calculate the step retention rate during the target material manufacturing process, and the final step retention rate = 93-95%.

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Abstract

The invention discloses a manufacturing process of target crystal grain miniaturization. Firstly, the aluminum ingot is heated to 170-220°C and then rolled once. The amount is equal to get a semi-finished target material; then the semi-finished target material is heated to 300-350°C and then secondly rolled. The second rolling is divided into ≧2 passes, and the reduction amount of the first pass is lower than that of the remaining passes. The reduction amount of the finished target material was obtained, and it was found by metallographic microscope observation that the average size of the grains in the finished target material was ≦90 μm, and the size distribution of the grains was more concentrated.

Description

technical field [0001] The invention belongs to the technical field of target material preparation, and in particular relates to a manufacturing process for target material crystal grain miniaturization. Background technique [0002] In the semiconductor industry, the target can play a variety of roles by forming surface-coated thin-film materials through sputtering, ion plating, or other coating processes. For the aluminum target, in its preparation process, it is first necessary to carry out a series of processing on high-purity aluminum to make a material with a certain shape and size, and then go through the film forming process to make a semi-finished material for industrial production . [0003] The production process of aluminum targets includes: first, the production of high-purity aluminum: extract alumina from bauxite, and undergo electrolysis, smelting and other processes to obtain aluminum materials with a purity of more than 99%. Second, the deformation treatm...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B21B15/00B21B37/00B21B37/74C23C14/34
CPCB21B15/0007B21B37/00B21B37/74C23C14/3414
Inventor 尤小磊常艳超中村晃董常亮
Owner 爱发科电子材料(苏州)有限公司
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