Glass core, multilayer wiring substrate, and method for manufacturing glass core
A manufacturing method, glass core technology, applied in multilayer circuit manufacturing, printed circuit manufacturing, including printed capacitors, etc., to achieve the effect of suppressing cracks
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Embodiment 1
[0153] according to Figures 6A-6I Manufactured by the manufacturing process shown Figure 5 Glass core 4 shown.
[0154] First, if Figure 6A As shown, a glass panel 1000 (EAGLE XG; manufactured by Corning Co., Ltd.) having a through hole TH having a size of 500 mm×500 mm and a thickness of 200 μm was prepared. The surface roughness of the obtained glass plate 1000 measured by a non-contact interference microscope was 0.5 nm.
[0155] In addition, the diameter of the through-hole TH provided in the glass plate 1000 is 80 μm on one main surface of the glass plate 1000 , and is 60 μm on the other main surface of the glass plate 1000 . However, the diameters are set to be the same in the drawings.
[0156] Next, a 50-nm titanium layer 200A and a 300-nm copper layer 200B were sequentially formed on one main surface of the glass plate 1000 by a sputtering method as the first metal layer 200 .
[0157] Next, if Figure 6B As shown, a photosensitive dry film resist is laminate...
Embodiment 2
[0171] In Example 2, the bath composition of the electroless nickel plating A described in Example 1 was prepared by the same method as in Example 1, except that the pH was set to 9 and the temperature was set to 50°C. the glass core. The plating time was adjusted so that the thickness of the electroless nickel plating layer became 0.1 μm.
[0172] The thickness of the electroless nickel plating layer prepared in this example was measured and found to be 0.1 μm. In addition, the phosphorus content rate of this electroless nickel plating layer was measured by the said method, and the content rate was 1 mass %.
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