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A high-entropy alloy composition, a high-entropy alloy film, and a preparation method for a high-entropy alloy target and film

A high-entropy alloy and thin-film technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the requirements of mechanical properties that are difficult to meet, the application prospect of high-entropy alloy is unclear, and the theory of high-entropy alloy preparation Improve performance, reduce defects, and improve compactness

Active Publication Date: 2021-10-08
INST OF MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, once high-entropy alloys are put into practical production and application, they often have certain requirements for their mechanical properties, and general high-entropy alloys (especially bulk high-entropy alloys obtained by conventional methods) have requirements for mechanical properties. also often unsatisfactory
At the same time, due to the imperfection of the theoretical system for the preparation of high-entropy alloys, the application prospects of high-entropy alloys are not clear.
Especially when used under complex environmental conditions, it is undoubtedly required to meet various properties such as high strength, high temperature resistance, and corrosion resistance. There are reports

Method used

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  • A high-entropy alloy composition, a high-entropy alloy film, and a preparation method for a high-entropy alloy target and film
  • A high-entropy alloy composition, a high-entropy alloy film, and a preparation method for a high-entropy alloy target and film
  • A high-entropy alloy composition, a high-entropy alloy film, and a preparation method for a high-entropy alloy target and film

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preparation example Construction

[0051] The present invention also provides a method for preparing a high-entropy alloy target, comprising vacuum melting the above-mentioned high-entropy alloy composition to prepare a high-entropy alloy target. Of course, the vacuum smelting method here can be operated in a manner understandable by those skilled in the art, as long as each metal can be smelted uniformly to form an alloy.

[0052] The present invention also provides a method for preparing a high-entropy alloy thin film. In a further preferred embodiment, in order to ensure the performance of the high-entropy alloy thin film, it is further selected that the above-mentioned high-entropy alloy target is subjected to magnetron sputtering, High-entropy alloy thin films were prepared.

[0053] In a more preferred embodiment, the magnetron sputtering can be further defined as DC magnetron sputtering, such as Figure 10 As shown, the DC magnetron sputtering specifically includes:

[0054] S100. Place the substrate a...

Embodiment 1

[0068] 1) Weighing Al, Cr, Ti, Gd, Zr raw materials with a material ratio of 1:1:1:1:1, and using a vacuum casting method to prepare a high-entropy alloy target;

[0069] 2) Wash the substrate in acetone, deionized water, and absolute ethanol for 10 minutes respectively, and place it in a magnetron sputtering vacuum chamber facing the target 10 cm after drying;

[0070] 3) After the mechanical pump is vacuumed to a vacuum degree of 10Pa, turn on the molecular pump to pump a vacuum to a vacuum degree of 5×10 －3 Pa, flow argon gas at a flow rate of 80sccm, adjust the partial pressure valve to make the vacuum degree reach 1.0Pa, turn on the bias power supply, increase the bias voltage to -900V, and perform glow cleaning on the substrate for 10min; then turn off the bias power supply , adjust the partial pressure valve so that the vacuum degree is 0.5Pa, the sputtering current is 0.7A, and the high-entropy alloy target is sputtered and cleaned for 5 minutes;

[0071] 4) Open the ...

Embodiment 2

[0074] Prepare according to the method of Example 1, the difference is that the ratio of the amount of substance of Al, Cr, Ti, Gd, Zr raw materials is 2:2:1:1:1, and the sputtering current in step 4) is 0.8A , the sputtering time is 1.5h, and the high-entropy alloy thin film A2 is obtained. (the XRD collection of A2 obtained at room temperature is as Figure 7 , showing an amorphous structure; SEM at room temperature as Figure 8 As shown, it presents a dense, smooth and defect-free cross-sectional morphology; the nanohardness of A2 is as follows Figure 9 As shown, it can be seen that its hardness is as high as 13Gpa or more, which has very good hardness. )

[0075] The invention can conveniently convert the cast AlCrTiGdZr high-entropy alloy into an amorphous AlCrTiGdZr high-entropy alloy thin film through the method of magnetron sputtering. At the same time, it can be further seen from the above examples and characterization diagrams that the prepared high-entropy allo...

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Abstract

The embodiment of the present invention discloses a preparation method of a high-entropy alloy composition, a high-entropy alloy film, a high-entropy alloy target material and a film. The composition includes Al, Cr, Ti, Gd and Zr; Melting and magnetron sputtering system. Embodiments of the present invention have the following advantages: 1. The synergy between specific raw material types makes the final high-entropy alloy film have excellent properties such as high temperature resistance, corrosion resistance and high strength; 2. Using magnetron sputtering The method transforms the crystalline AlCrTiGdZr alloy in the as-cast state into an amorphous film, which greatly improves the compactness of the film, reduces the defects of the film, further improves the performance of the film, and makes it more widely used. Prospect; 3. The whole operation process can be carried out at room temperature, and no polluting discharge is generated, so that the whole preparation has the advantages of high efficiency and cleanliness.

Description

technical field [0001] The embodiments of the present invention relate to the field of alloy materials, in particular to a high-entropy alloy composition, a high-entropy alloy film, and a method for preparing a high-entropy alloy target and film. Background technique [0002] After the high-entropy alloy material was proposed in 2004, it has received extensive attention due to its potential to break through the performance of traditional alloys. Based on the initial research on FeCoNiCrCuAl high-entropy alloys, many mechanisms of high-entropy alloys have been studied in a variety of ways. At present, high-entropy alloys with high hardness, soft magnetic properties, and high electrical resistance have been manufactured, and the common The preparation methods of high entropy alloy mainly include vacuum melting method, powder metallurgy method, mechanical melting method and so on. [0003] However, once high-entropy alloys are put into practical production and application, the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C22C45/00C23C14/14C23C14/35
CPCC22C45/00C23C14/14C23C14/3407C23C14/35
Inventor 夏原许亿李光
Owner INST OF MECHANICS CHINESE ACAD OF SCI