Low-water-connection high-refractive-index hardening liquid and method for preparing ITO conductive membrane by using same

A high-refractive-index, hardening liquid technology, applied in the direction of equipment, circuits, and electrical components used to manufacture conductive/semiconductive layers, can solve the problems of poor preparation effect and cumbersome preparation process of ITO conductive film, and achieve the effect of overcoming preparation. Poor, good preparation effect, overcoming the effect of cumbersome preparation process

Active Publication Date: 2020-10-30
NINGBO HUGHSTAR ADVANCED MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The problem to be solved by the present invention is to provide a low-water contact high-refractive index hardening solution and a method for preparing an ITO conductive film, so as to overcome the defects of poor preparation effect and cumbersome preparation process of the existing ITO conductive film

Method used

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  • Low-water-connection high-refractive-index hardening liquid and method for preparing ITO conductive membrane by using same

Examples

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Effect test

Embodiment 1

[0023] This embodiment provides a low-water contact high-refractive index hardening solution, which includes a high-wear-resistant high-hardness resin, a high-refractive index filler, a dispersant, a photoinitiator, an organic solvent, and a recoatable leveling agent. agent. This low water contact high refractive index hardening fluid has the characteristics of low water contact angle and high refractive index. By adding high refractive index fillers, the refractive index can be further improved. By adding recoatable leveling agent, the low water contact height can be achieved, and the improvement can be achieved. Adhesion with ITO, by sputtering the ITO conductive film on the hardened layer formed after the low-water contact high-refractive index hardening solution is cured, it can effectively remove the etching lines on the ITO conductive film, and effectively improve the adhesion between the base film and the ITO conductive film. Adhesion, good preparation effect.

[0024]...

Embodiment 2

[0037] The difference between the low-hydration high-refractive index hardening solution provided in this embodiment and the embodiment 1 is that the high-refractive index filler is 20 parts by weight of zirconium acrylic acid, and other components remain unchanged.

[0038] The difference between the method of preparing an ITO conductive film with a low-water high-refractive index hardening solution provided in this embodiment and that of Embodiment 1 is that in step S002, when configuring component B, 20 parts by weight of zirconium acrylic acid, other The ingredients are unchanged.

Embodiment 3

[0040] The difference between the low-hydration and high-refractive-index hardening solution provided in this example and Example 1 is that the high-wear-resistant and high-hardness resin is 10 parts by weight of polyurethane acrylate compound, and the high-refractive index filler is 40 parts by weight of zirconium Acrylic acid, dispersant is the dispersant 2140 of 4 weight parts, photoinitiator is the photoinitiator 184 of 2 weight parts, and organic solvent is the mixture of the ethyl acetate of 30 weight parts and the methyl isobutyl ketone of 30 weight parts, can The leveling agent for recoating is 0.2 parts by weight of leveling agent A227.

[0041] This embodiment also provides a method for preparing an ITO conductive film with a low-water contact high-refractive index hardening solution. 30 parts by weight, after stirring evenly, add 2 parts by weight of photoinitiator 184, stir evenly to obtain component A; take 30 parts by weight of methyl isobutyl ketone, add 4 parts...

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Abstract

The invention provides a low-water-connection high-refractive-index hardening liquid and a method for preparing an ITO conductive membrane by using the same. The low-water-connection high-refractive-index hardening liquid comprises high-wear-resistance high-hardness resin, a high-refractive-index filler, a dispersing agent, a photoinitiator, an organic solvent and a recoatable leveling agent, themethod for preparing the ITO conductive membrane from the low-water-connection high-refractive-index hardening liquid comprises the following steps: step S001, selecting a proper base material; step S002, preparing the low-water-connection high-refractive-index hardening liquid; step S003, coating a low-water-connection high-refractive-index layer, namely coating the base material with the low-water-connection high-refractive-index hardening liquid, and forming the low-water-connection high-refractive-index layer after UV curing; and step S004, sputtering an ITO conductive layer, namely sputtering the ITO conductive layer on the low-water-connection high-refractive-index layer to form the ITO conductive membrane. The low-water-connection high-refractive-index hardening liquid and ther method for preparing the ITO (indium tin oxide) conductive membrane by using the same overcome the defects of poor preparation effect and complicated preparation process of the existing ITO conductive membrane.

Description

technical field [0001] The invention relates to the field of conductive thin films, in particular to a low-water contact high-refractive index hardening solution and a method for preparing an ITO conductive film. Background technique [0002] With the rise of touch-sensitive display devices, the demand for transparent conductive films is increasing. There are three main technical routes for transparent conductive films, namely ITO conductive film, nano-silver conductive film and metal mesh. Among them, ITO conductive film has been widely used in the market because of its stable resistance and price advantage. ITO conductive film refers to a high-tech product obtained by sputtering a transparent indium tin oxide (ITO) conductive film coating on a transparent organic film material by magnetron sputtering and then undergoing high-temperature annealing treatment. The thickness of the ITO film layer is different, and the conductivity and light transmission properties of the film...

Claims

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Application Information

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IPC IPC(8): C09D175/14C09D7/61C09D7/63C09D7/47H01B13/00
CPCC08K2003/2244C09D175/14C09D7/47C09D7/61C09D7/63H01B13/0026C08K3/22C08K5/098
Inventor 刘楷楷董红星
Owner NINGBO HUGHSTAR ADVANCED MATERIAL TECH
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