A kind of molybdenum-tungsten sputtering target material and preparation method thereof

A sputtering target, molybdenum-tungsten technology, applied in the field of powder metallurgy, can solve the problems of delamination or segregation, large density difference, affecting the uniformity of target structure, etc. Effect

Active Publication Date: 2022-04-19
XIAMEN HONGLU TUNGSTEN MOLYBDENUM IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the preparation of molybdenum-tungsten sputtering targets usually uses molybdenum powder and tungsten powder as raw materials, and the density of molybdenum and tungsten is quite different, which is very prone to layering or segregation of the structure, which affects the uniformity of the structure of the target.

Method used

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  • A kind of molybdenum-tungsten sputtering target material and preparation method thereof
  • A kind of molybdenum-tungsten sputtering target material and preparation method thereof
  • A kind of molybdenum-tungsten sputtering target material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] 1) Weigh molybdenum powder with a particle size of 6.5 μm and a purity of ≥3N and tungsten trioxide powder with a particle size of 8 μm and a purity of ≥4N according to a mass fraction of tungsten trioxide of 20%;

[0037] 2) The mixture was prepared by high-energy ball milling process under Ar atmosphere, the speed of the ball mill was 110rpm, the mixing time was 18h, tungsten balls were used as the balls, and the ball-to-material ratio was 6:1;

[0038] 3) Put the mixed powder obtained in step 2) in a molybdenum boat, the powder thickness is 10mm, firstly carry out one-stage reduction at 480°C for 1h in a hydrogen furnace, and then carry out two-stage reduction at 920°C for 1.5h to obtain Molybdenum and tungsten mixed powder;

[0039] 4) The molybdenum-tungsten mixed powder obtained in step 3) is formed by cold isostatic pressing (CIP) to obtain a molybdenum-tungsten green body, the forming pressure is 180 MPa, and the holding time is 20 minutes;

[0040] 5) Place th...

Embodiment 2

[0044] 1) Weigh molybdenum powder with a particle size of 4.6 μm and a purity of ≥3N and tungsten trioxide powder with a particle size of 8.0 μm and a purity of ≥4N according to the mass fraction of tungsten trioxide of 15%;

[0045] 2) The mixture was prepared by high-energy ball milling process under vacuum atmosphere, the rotation speed of the ball mill was 120rpm, and the mixing time was 20h; molybdenum balls were used as grinding balls, and the ball-to-material ratio was 10:1;

[0046] 3) Place the mixed powder obtained in step 2) in a molybdenum boat with a powder thickness of 15mm. In a hydrogen furnace, firstly conduct a first-stage reduction at 460°C for 1.5h, and then conduct a second-stage reduction at 910°C for 1.2h. Obtain molybdenum-tungsten mixed powder;

[0047] 4) The molybdenum-tungsten mixed powder obtained in step 3) is formed by cold isostatic pressing (CIP) to obtain a molybdenum-tungsten green body, the forming pressure is 150 MPa, and the holding time i...

Embodiment 3

[0052] 1) Weigh molybdenum powder with a particle size of 5 μm and a purity of ≥3N and tungsten trioxide powder with a particle size of 8 μm and a purity of ≥4N according to a mass fraction of tungsten trioxide of 20%;

[0053] 2) The mixture was prepared by high-energy ball milling process under Ar atmosphere, the speed of the ball mill was 110rpm, the mixing time was 18h, tungsten balls were used as the balls, and the ball-to-material ratio was 6:1;

[0054] 3) Put the mixed powder obtained in step 2) in a molybdenum boat, the powder thickness is 10mm, firstly carry out one-stage reduction at 480°C for 1h in a hydrogen furnace, and then carry out two-stage reduction at 920°C for 1.5h to obtain Molybdenum and tungsten mixed powder;

[0055] 4) The molybdenum-tungsten mixed powder obtained in step 3) is formed by cold isostatic pressing (CIP) to obtain a molybdenum-tungsten green body, the forming pressure is 180MPa, and the holding time is 30min;

[0056] 5) Place the molybden...

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Abstract

The invention discloses a molybdenum-tungsten sputtering target and a preparation method thereof. The relative density is 99.0-99.5%, the oxygen content is 350-600ppm, and the raw materials are tungsten trioxide powder with a purity ≥ 4N and molybdenum powder with a purity ≥ 3N composition, and the content of tungsten trioxide powder is 15-20wt%, the balance is molybdenum powder, the particle size of the tungsten trioxide powder is 7-10μm, and the particle size of the molybdenum powder is 4.5-6.5μm. The invention is suitable for preparing flat-panel displays with uniform structure, no holes and low oxygen content.

Description

technical field [0001] The invention belongs to the technical field of powder metallurgy, and in particular relates to a molybdenum-tungsten sputtering target and a preparation method thereof. Background technique [0002] Vacuum sputtering coating is a commonly used thin film preparation process, and the target is an important raw material for sputtering coating. During sputtering, argon ions are accelerated to impact the surface of the target under the action of an electric field, thereby exchanging energy with the atoms on the target surface, and the target atoms with sufficient energy escape from the surface of the target and deposit on the surface of the substrate. A film is formed on the surface of the substrate. [0003] Molybdenum-tungsten sputtering target is a kind of target that is often used in the vacuum sputtering process. The molybdenum-tungsten thin film obtained by sputtering is mainly used as a transparent conductive film or metal wiring film, and is used ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34B22F9/04B22F9/22B22F3/04B22F3/10B22F3/14
CPCC23C14/3407C23C14/3414B22F9/04B22F9/22B22F3/04B22F3/14B22F3/1007B22F2009/043
Inventor 陈金李保强刘文迪黄志民
Owner XIAMEN HONGLU TUNGSTEN MOLYBDENUM IND CO LTD
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