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Ultra-thin g-C3N4 layer loaded and wrapped UiO-66 compound, preparation method and photocatalytic application thereof

A technology of uio-66 and g-c3n4, which is applied in the field of preparing ultra-thin g-C3N4 layer to load and wrap UiO-66 composites, can solve the problems of reducing active site exposure, affecting photocatalytic performance, reducing surface area, etc. Increased transmission distance, short processing time, and low operational difficulty

Active Publication Date: 2021-01-01
NANJING FORESTRY UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using the direct mixing method will result in UiO-66 or g-C 3 N 4 serious agglomeration, which seriously affects the photocatalytic performance
in g-C 3 N 4 The method of growing UiO-66 in nanosheets will lead to excessive loading of g-C on the surface of UiO-66 3 N 4 , which reduces the surface area and reduces the exposure of active sites

Method used

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  • Ultra-thin g-C3N4 layer loaded and wrapped UiO-66 compound, preparation method and photocatalytic application thereof
  • Ultra-thin g-C3N4 layer loaded and wrapped UiO-66 compound, preparation method and photocatalytic application thereof
  • Ultra-thin g-C3N4 layer loaded and wrapped UiO-66 compound, preparation method and photocatalytic application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] 190.3 mg of ZrCl 4 and 133mg of H 2 BDC was dissolved in 81.7mL of DMF solution, then 4.6g of acetic acid was added and ultrasonicated for 20min, then stirred for 2h. The mixed solution was transferred to a 150 mL autoclave and heated in an oven at 120 °C for 24 h. After natural cooling at room temperature, it was centrifuged and washed three times with DMF and methanol, and dried overnight in an oven at 80°C to obtain UiO-66.

[0031] Put 2.0 g of melamine on the bottom of the crucible, and the prepared UiO-66 on the porous support in the middle of the crucible, and then put the crucible in a muffle furnace and heat it at 350 ° C for 30 min to obtain g-C 3 N 4 @UiO-66.

Embodiment 2

[0033] 190.3 mg of ZrCl 4 and 133mg of H 2 BDC was dissolved in 81.7mL of DMF solution, then 4.6g of acetic acid was added and ultrasonicated for 20min, then stirred for 2h. The mixed solution was transferred to a 150 mL autoclave and heated in an oven at 120 °C for 24 h. After natural cooling at room temperature, it was centrifuged and washed three times with DMF and methanol, and dried overnight in an oven at 80°C to obtain UiO-66.

[0034] Put 2.0g of melamine on the bottom of the crucible, and put the prepared UiO-66 on the porous support in the middle of the crucible, then place the crucible in a muffle furnace at 350°C for 1h to obtain g-C 3 N 4 @UiO-66.

Embodiment 3

[0036] 190.3 mg of ZrCl 4 and 133mg of H 2 BDC was dissolved in 81.7mL of DMF solution, then 4.6g of acetic acid was added and ultrasonicated for 20min, then stirred for 2h. The mixed solution was transferred to a 150 mL autoclave and heated in an oven at 120 °C for 24 h. After natural cooling at room temperature, it was centrifuged and washed three times with DMF and methanol, and dried overnight in an oven at 80°C to obtain UiO-66.

[0037] Put 2.0 g of melamine on the bottom of the crucible, and the prepared UiO-66 on the porous support in the middle of the crucible, and then put the crucible in a muffle furnace at 350 ° C for 2 h to obtain g-C 3 N 4 @UiO-66.

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Abstract

The invention discloses an ultra-thin g-C3N4 layer loaded and wrapped UiO-66 compound, a preparation method and photocatalytic application thereof, and the ultra-thin g-C3N4 layer loaded and wrapped UiO-66 compound comprises g-C3N4 and UiO-66. Compared with pure UiO-66, the g-C3N4-coated UiO-66 compound obtained by a chemical vapor deposition method has higher photocatalytic activity, and can be used for efficiently removing organic pollutants such as tetracycline in a water body.

Description

technical field [0001] The invention relates to the technical field of material synthesis and photocatalytic application, in particular to a method for preparing ultra-thin g-C 3 N 4 A method for layer-loaded encapsulation of UiO-66 composites. Background technique [0002] Photocatalytic technology is considered to be an environmentally friendly pollutant treatment method, which has the advantages of energy saving, environmental protection and high efficiency. At present, photocatalytic technology has certain applications in the treatment of wastewater, waste gas and hydrogen production. [0003] UiO-66 is a classic metal-organic framework material, which has attracted widespread attention due to its high specific surface area and thermal / chemical stability. With so many advantages, it also has a relatively wide band gap, so that UiO-66 only responds to ultraviolet radiation, and cannot effectively respond to visible light. As a result, in the field of UiO-66 preparation ...

Claims

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Application Information

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IPC IPC(8): B01J31/22B01J27/24B01J37/34B82Y40/00C02F1/30C02F101/30C02F101/34C02F101/38
CPCB01J31/2239B01J31/1691B01J31/1625B01J27/24B01J37/348B82Y40/00C02F1/30C02F2101/30C02F2101/34C02F2101/38C02F2305/10B01J2531/48B01J35/397B01J35/39Y02W10/37
Inventor 姚建峰陈钱冯艺王铎颖
Owner NANJING FORESTRY UNIV