Gel casting preparation method of nickel oxide-based ceramic target material

A technology of gel injection molding and nickel-based ceramics, which is applied in the field of gel injection molding preparation of nickel oxide-based ceramic target materials, and can solve the problems that nickel oxide-based ceramic target materials cannot be prepared.

Inactive Publication Date: 2021-02-05
北京航大微纳科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing technology cannot prepare this kind of nickel oxide-based ceramic target material.

Method used

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  • Gel casting preparation method of nickel oxide-based ceramic target material
  • Gel casting preparation method of nickel oxide-based ceramic target material
  • Gel casting preparation method of nickel oxide-based ceramic target material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0092] 1. Preparation of nickel oxide powder:

[0093] (a) Pass high-purity nickel vapor into oxygen at 1650°C to form high-nickel oxide;

[0094] (b) mixing high-nickel oxide and high-purity graphite reducing agent and roasting at 700°C to obtain a nickel oxide block;

[0095] (c) jet pulverization obtains nickel oxide coarse powder;

[0096] (d) The nickel oxide coarse powder is subjected to wet ball milling: the ball-to-material ratio is 3:1, the average diameter of the balls is 5mm, the volume of the balls and the slurry accounts for 50% of the volume of the grinding chamber, and the ball mills for 15 hours to obtain the nickel oxide The purity of the powder is 99.99%, and the micrograph of the nickel oxide powder is figure 1 , the XRD pattern of nickel oxide powder is figure 2 , the PSD picture of nickel oxide powder is image 3 , it can be obtained from the figure that the average particle size of the nickel oxide powder prepared in this example is 1.0 μm, and the D...

Embodiment 2

[0112] The difference between this example and Example 1 is that the dopant source components in the raw material preparation step A are Li:Na:Zn:W=1:0.5:0.8:1.2 in terms of molar ratio.

[0113] The obtained ceramic target has an average grain size of 4 μm, a doped phase size of 190 nm, a bulk electrical conductivity of 25 S / cm, and a relative density of 99.0% measured by the drainage method.

Embodiment 3

[0115] 1. Preparation of nickel oxide powder:

[0116] (a) Pass high-purity nickel vapor into oxygen at 1600°C to form high-nickel oxide;

[0117] (b) roasting high nickel oxide in a hydrogen atmosphere at 1000°C to obtain a nickel oxide block;

[0118] (c) jet pulverization obtains nickel oxide coarse powder;

[0119] (d) The nickel oxide coarse powder is subjected to wet ball milling: the ball-to-material ratio is 2:1, the average diameter of the balls is 0.3mm, the volume of the balls and the slurry accounts for 2 / 3 of the volume of the grinding chamber, and the ball mills for 20 hours to obtain the Described nickel oxide powder; The purity of the nickel oxide powder that obtains is 99.995%, and the micrograph of the nickel oxide powder that present embodiment prepares is Figure 5 , the PSD picture is Figure 6 , the average particle size of the nickel oxide powder prepared in this example is 500nm, and the D50 particle size is 50nm. The solvent used in the wet ball mi...

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Abstract

The invention relates to a gel casting preparation method of a nickel oxide-based ceramic target material. The gel casting preparation method comprises the following steps of A, preparing raw materials, B, preparing a premixed solution, C, preparing high-fluidity slurry, D, preparing a biscuit, E, degumming the biscuit: carrying out gradient heating on the biscuit, and carrying out furnace coolingto obtain a degummed blank, F, sintering: specifically, enabling the blank to be subjected to vacuum gradient sintering with the first gradient temperature of 650-800 DEG C, the temperature rising speed not higher than 1.5 DEG C / min, and the heat preservation time not shorter than 2 hours, heating to a second gradient temperature of 900-1200 DEG C at a heating speed of not higher than 1 DEG C / min, keeping the temperature for not less than 5 hours, cooling and molding, and G, machining, specifically, conducting or not conducting machining according to needs. The preparation method can be usedfor preparing the nickel oxide-based ceramic target material with good conductivity, higher purity and fine grain size, and is simple and convenient to operate and low in cost.

Description

technical field [0001] The invention relates to a method for preparing a ceramic target material, in particular to a method for preparing a nickel oxide-based ceramic target material by gel injection molding. Background technique [0002] Nickel oxide is a P-type transition group wide bandgap semiconductor material with 3d outermost electronic structure, which has excellent chemical stability and some special photoelectric properties. At present, nickel oxide thin films have been found to have great application potential, including P-type transparent conductive thin films, electrochromic thin films, catalytic thin films, magnetic thin films, etc. [0003] In order to prepare the above-mentioned thin films, it is a promising direction to use nickel oxide-based ceramic targets to prepare films using magnetron sputtering and other coating methods. However, the nickel oxide-based ceramics in the prior art have poor conductivity, which makes the prepared nickel oxide film poor i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/01C04B35/622
CPCC04B35/01C04B35/622C04B2235/5436C04B2235/3203C04B2235/3244C04B2235/3232C04B2235/3258C04B2235/6562C04B2235/6567C04B2235/786C04B2235/3201C04B2235/5445C04B2235/3284
Inventor 高明张虎张花蕊杨本润
Owner 北京航大微纳科技有限公司
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