Method of printing and in situ reduction of graphene

Abstract

The invention discloses a method for printing and in-situ reduction of graphene. On the basis of a printing technology, graphene oxide slurry is used for patterning printing on a substrate, a chemicalreducing agent is further used, normal-temperature chemical reduction is carried out on the pattern in situ, and then the reduced high-conductivity graphene pattern is obtained. According to the method, the graphene oxide pattern does not need to be transferred, and the reducing agent is directly printed on the pattern in situ, so that rapid chemical reduction is carried out, compact stacking ofgraphene sheet layers and original precise patterns can be kept in the process, the reduction process is simple, and the reduction effect is good.

Description

technical field [0001] The invention belongs to the technical field of materials, and relates to a method for printing and in-situ reducing graphene. Background technique [0002] Graphene has gradually become a potential substitute for existing conductors and semiconductors due to its excellent optical and electrical properties. Graphene's intrinsic optoelectronic properties can be used in electronic components, such as sensors, diodes, photodetectors, radio frequency antennas, terahertz antennas, etc. Its preparation method has three kinds usually: (1) adopt chemical vapor deposition method, prepare transparent, patterned graphene monolayer material [quote patent, CN104023993B forms patterned graphene layer; CN108545725A a kind of graphene preparation device and application The device patterned method for growing graphene], (2) disperse the graphene powder to form a slurry, and prepare a patterned graphene assembly by coating, printing and other methods [citing patent CN1...

AI Technical Summary

Problems solved by technology

[0003] Among these three methods, (1) graphene prepared by vapor deposition method has the most complete conjugated structure of its six-membered carbon ring, which can be used to prepare high-quality graphene films, but the shrinkage of the film is poor, and the preparation process It needs to be carried out on metal substrates such as copper, and it needs to be etched and transferred after completion, which will cause problems such as defect introduction and pattern destruction, and the preparation cost is extremely high

The patterning operations of graphene mainly include maskless direct laser writing, masked plasma etching, and vapor deposition growth on pre-patterned metal substrates. Although these techniques provide relatively high-resolution graphene patterns, but The method of using laser, mask and vacuum will increase the process cost, and the above-mentioned technologies are mostly used in small-area manufacturing in the actual production process

(2) Using the method of graphene powder slurry printing, graphene itself has a large surface energy and curls and agglomerates, which requires the use of high-boiling polar solvents, and it cannot be spread flat and dispersed in solvents, and in most cases However, additional surfactants or dispersants are required, so the graphene sheets cannot be effectively overlapped to form a conductive network after printing, which is affected by additives such as surfactants and dispersants, and the prepared patterns have poor conductivity.

(3) The graphene oxide powder slurry printing method is adopted. Due to the presence of polar functional groups, graphene oxide can be flattened and dispersed in water. After printing into a pattern, as the water volatilizes, the graphene oxide sheets can be densely stacked face to face to form It is better to build a plane, but it needs to further reduce the graphene oxide film. Thermal reduction can be used, but it requires a higher temperature (usually above 800 ° C), which will damage the substrate. Chemical reduction can also be used, but it needs Soak the pattern in chemical agents, soaking will cause the film to fluff up and dissolve again, and the restoration effect is not good

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