Absorption film based on atomic layer deposition and manufacturing method thereof

Abstract

The invention discloses an absorption film based on atomic layer deposition. The absorption film is composed of a substrate and multiple layers of absorption film systems on the substrate, the multiple layers of absorption film systems are alternately composed of absorption film layers and dielectric film layers, and the absorption film layer is the innermost layer and is arranged close to the substrate; the dielectric film layer is the outermost layer; the multilayer absorption film system is obtained by an atomic layer deposition method. According to the invention, the advantages of the design and preparation of the absorption film and the atomic layer deposition technology are ingeniously combined, and the difficulty that the traditional physical vapor deposition method cannot meet thebasic requirements of uniformity and coverage rate of the deposited film of the large-curvature element is overcome. The absorptivity of the absorption film prepared through the atomic layer deposition technology can reach 99% or above within the designed waveband, and the absorption film can be importantly applied to the special fields of complex optical surfaces with high depth-to-width ratios,large-curvature optical elements and the like and is expected to be widely applied to the aspects of virtual reality, counterfeiting prevention and the like. Contributions are made to the fields of national economy, social development, science and technology, national defense construction and the like.

Description

technical field [0001] The invention proposes a novel absorption film based on atomic layer deposition and a manufacturing method thereof, and specifically relates to the fields of stray light elimination, detection, imaging and the like. Background technique [0002] Large-curvature optical components such as hemispherical lenses, aspheric mirrors, quartz tubes, etc., are important components in optical systems such as laser systems, optical microscope systems, and projection systems. In order to meet the requirements of different optical systems for transmittance, reflectivity and polarization, it is usually necessary to deposit thin films on the surface of large curvature optical elements, and the uniformity and coverage of the thin films have a great influence on the performance of the optical system (such as imaging quality, test accuracy, etc.) Significant influence. Due to the directional distribution and motion trajectory of deposited particles in the existing physi...

AI Technical Summary

Problems solved by technology

Due to the directional distribution and motion trajectory of deposited particles in the existing physical vapor deposition method, the spatial distribution is sensitive to the film thickness, so the uniformity of the thin film prepared on large curvature optical elements and complex surfaces is greatly limited.

By changing the airflow distribution, component trajectory, target position, etc., the uniformity of the film on the surface of regular large-curvature optical components can be improved, but it is still difficult to achieve full coverage for high aspect ratios and complex surfaces

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