Method for transferring graphene film on metal substrate

A graphene film and metal substrate technology, applied in the field of two-dimensional materials, can solve the problems of graphene wrinkles or breakage, damage the integrity of graphene, etc., and achieve the effects of reducing cracks, ensuring contact, and improving quality

Inactive Publication Date: 2021-03-26
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The embodiment of the present invention provides a method for transferring a graphene film on a metal substrate, which is used to solve the technical problem of easily causing wrinkles or damage of graphene and destroying the integrity of graphene in the transfer process in the prior art, and achieves ...

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  • Method for transferring graphene film on metal substrate
  • Method for transferring graphene film on metal substrate
  • Method for transferring graphene film on metal substrate

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Embodiment 1

[0027] The embodiment of the present invention provides a method for transferring a graphene film on a metal substrate, please refer to figure 1 , image 3 , the method includes S110-S150:

[0028] S110: Spin-coat a protective film on the graphene film grown on the metal substrate, add an etching solution into the water tank, and place the metal substrate with the graphene film in the etching solution in the water tank , completely etching the metal base;

[0029] Further, the protective film is a PMMA protective film. Further, the etching solution is ammonium persulfate solution.

[0030] Specifically, a PMMA protective film will be spin-coated on the graphene film grown on the metal substrate. Add the etching solution ammonium persulfate solution to the water tank to the first scale of the water tank, such as 50 mL of the water tank. The metal base of the graphene thin film with a protective film is placed in the etching solution in the water tank, and the metal base is...

Embodiment 2

[0039] The embodiment of the present invention provides a device for transferring a graphene film on a metal substrate, please refer to figure 2 , the device includes:

[0040] Water tank 1; target substrate 3, the target substrate 3 is placed on the bottom surface of the water tank 1, and the area of ​​the target substrate 3 is smaller than the bottom surface area of ​​the water tank 1; etching solution 7, the etching The liquid 7 is filled in the water tank 1, and the etching liquid 7 has a first liquid level in the water tank 1;

[0041] Further, the volume of the water tank 1 ranges from 10ml to 1000mL. Further, the water tank 1 is made of polytetrafluoroethylene, ceramics, polycarbonate, glass or quartz.

[0042] Specifically, the embodiment of the present application provides a device for transferring a graphene film on a metal substrate, and the device includes: a water tank 1, a syringe 2, a target substrate 3, and the like. The volume of the water tank 1 in the em...

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Abstract

The invention discloses a method for transferring a graphene film on a metal substrate. The method comprises the steps of placing the metal substrate with the graphene film in an etching solution in awater tank, and carrying out complete etching on the metal substrate; pumping out the etching solution in the water tank through an injector, injecting cleaning liquid into the water tank, and cleaning the graphene film and the protective film for multiple times; pumping out the cleaning liquid, attaching and transferring the graphene film and the protective film to a target substrate, taking outthe target substrate, and heating and drying the target substrate for the first time; placing the heated and dried target substrate on the bottom surface of the water tank, injecting an acetone solution into the water tank to dissolve the protective film, and extracting the acetone solution; and taking out the target substrate and heating and drying the target substrate for the second time to finish the transfer of the graphene film, thereby realizing the technical effects of transferring the graphene of the metal substrate in a large area and reducing the breakage of the graphene film in thetransfer process.

Description

technical field [0001] The invention relates to the technical field of two-dimensional materials, in particular to a method for transferring a graphene film on a metal substrate. Background technique [0002] Graphene is a monoatomic layer flat film in which carbon atoms form a hexagonal lattice according to hybrid orbitals. As a new type of semiconductor material, graphene has many excellent properties. Due to its special nanostructure and electrical and thermodynamic properties, such as high mechanical strength, high thermal conductivity, high specific surface area and high electron mobility, etc., it is widely used in micro-nano electronic devices, photoelectric catalysis, biosensing, Fields such as fuel cells have shown great application potential and have become international research hotspots in recent years. [0003] At present, the industrial large-scale preparation of single-layer graphene films mainly adopts the chemical vapor deposition method. The key to the hi...

Claims

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Application Information

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IPC IPC(8): C01B32/194
CPCC01B32/194
Inventor 节喜卢维尔李楠夏洋
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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