Supercharge Your Innovation With Domain-Expert AI Agents!

Brain organoid in-vitro culture chip

A technology for in vitro culture and organoids, applied in tissue culture, tissue cell/virus culture devices, biochemical instruments, etc., can solve the problem of changing gene expression profiles, neurodevelopment, brain organoids with different sizes and shapes, and affecting the production of brain organoids. In order to achieve the effects of reducing pollution and damage, low preparation cost, and avoiding multiple transfers

Pending Publication Date: 2021-03-26
SOUTHEAST UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This process is very cumbersome, and the transfer process is extremely prone to contamination or mechanical damage, resulting in loss of embryonic bodies and damage, thereby affecting the yield of brain organoids
In addition, when multiple brain organoids are cultured in the same culture container, different brain organoids are prone to fusion during the formation process, resulting in different sizes and shapes of brain organoids, which have a great impact on subsequent experiments and applications. When the diameter of brain organoids is too large, it is easy to produce hypoxic cores causing necrosis, altering the neural development of gene expression profiles, and reducing the yield of organoids

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Brain organoid in-vitro culture chip
  • Brain organoid in-vitro culture chip
  • Brain organoid in-vitro culture chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] a. Preparation of the upper layer chip 1: use PDMS with a width of 3cm*length of 5cm, and cultivate a 4*4 hole array in the middle of the PDMS through mechanical drilling. The distance from the short edge is 18mm, the diameter of the entrance and exit is 4mm, the center of the circle is 8mm from the short edge, and 15mm from the long edge. Using a polymer microporous structure 3 with a diameter of 10 μm, the center of the microporous structure 3 is 25 mm away from the short edge and 15 mm away from the long edge, and the microporous structure 3 is connected to the culture hole by using a bonding process.

[0029] b. Preparation of the lower layer chip 6: use a quartz plate with a width of 3 cm * a length of 5 cm, cut a 4 mm circular hole in the quartz plate through laser micromachining, the center of the circle is 8 mm from the short edge, 15 mm from the long edge, and extend along the long direction A channel with a length of 5mm and a width of 2mm emerges, and after b...

Embodiment 2

[0036] a. Preparation of the upper layer chip 1: use PMMA with a width of 3cm*length of 5cm, and cultivate an 8*8 hole array in the middle of the PMMA by punching and drilling. , 17.5mm from the edge of the short side, 4mm in diameter of the entrance and exit, 8mm from the edge of the short side, and 15mm from the edge of the long side. Using a polymer microporous structure 3 with a diameter of 10 μm, the center of the microporous structure 3 is 25 mm away from the short edge and 15 mm away from the long edge, and the microporous structure 3 is connected to the culture hole by using a bonding process.

[0037] b. Preparation of the lower layer chip 6: use a quartz plate with a width of 3 cm * a length of 5 cm, cut a 4 mm circular hole in the quartz plate through laser micromachining, the center of the circle is 8 mm from the short edge, 15 mm from the long edge, and extend along the long direction Out of a channel with a length of 5mm and a width of 2mm, the back branch is 8 c...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a brain organoid in-vitro culture chip. The brain organoid in-vitro culture chip comprises an upper-layer chip, a lower-layer chip and a cover plate, the upper-layer chip is asolid material substrate, a liquid inlet, culture hole arrays and a liquid outlet are sequentially formed in a surface of the upper-layer chip, a micropore structure is arranged at a bottom of each culture hole, and a culture pool is formed by the micropore structures and the culture holes; the lower-layer chip is a solid material substrate, a groove is formed in a surface of the lower-layer chip,a circular hole is formed in the groove and extends out of a first channel in a long edge direction of the chip, the first channel is branched into a plurality of branch channels, the branch channelsare converged into a second channel, the circular hole communicates with the liquid inlet, and the branch channels correspond to the hole arrays above; and the cover plate is a solid material substrate and an inlet and an outlet are arranged in a surface of the cover plate. Diameter or the number of the culture hole arrays in the chip can be adjusted, organs are independently cultured in the culture holes, the formed brain organoids have a uniform size and shape, and the brain organoids with the same size can be produced in batches. The brain organoid in-vitro culture chip can avoid generation of large-size brain organoids, reduce a formation of a hypoxia core, and improve a survival rate.

Description

technical field [0001] The invention relates to an organ culture device, in particular to a brain organoid culture chip in vitro. Background technique [0002] Organoids refer to the use of 3D culture technology to cultivate organ-like tissue structures with relatively stable phenotype and genetic characteristics in vitro, which can be used as models and are of great significance in the research of growth and development, physiology and pathology, drug effects, etc. , of which brain organoids are an important branch. Traditionally, rodents are often used for neuroscience research, but the brain tissue structure and development of any rodent are quite different from those of humans. On the other hand, due to ethical and other reasons, it is very difficult to use living brain tissue, so induction The differentiation of pluripotent stem cells to form brain organoids is extremely important. [0003] Brain organoid preparation generally includes four steps, embryonic body forma...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C12M3/06C12M3/00C12N5/079C12N5/10
CPCC12M21/08C12M23/12C12M23/20C12M23/22C12M23/38C12M29/04C12N5/0622C12N2506/45C12N2510/00
Inventor 赵祥伟常宁顾忠泽
Owner SOUTHEAST UNIV
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More