A device for reducing background leak rate of large vacuum chamber at high temperature
A vacuum chamber, high vacuum technology, applied in measuring devices, using liquid/vacuum degree for liquid tightness measurement, by detecting the appearance of fluid at the leak point, etc., can solve the problem of high maintenance and repair cost, background leak rate and system Problems such as poor sensitivity and difficulty in reducing leak rate, to achieve the effect of improving detection sensitivity, improving detection sensitivity, and improving gas compression ratio
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[0025] A device for reducing the background leak rate of a large vacuum chamber at high temperature provided by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments.
[0026] like figure 1 As shown, the present invention provides a device for reducing the background leakage rate of a large vacuum chamber at high temperature, including a dry pump 2, a reaction furnace 5, a heating wire 6, a getter material 7, a molecular pump 11, and a liquid nitrogen heat exchanger 14 ,
[0027] The dry pump 2, the reaction furnace 5, the heating wire 6, the getter material 7, the molecular pump 11, and the liquid nitrogen heat exchanger 14 are installed inside the box body, and the dry pump 2 is fixedly installed at the bottom of the box body, and is connected with High vacuum flapper valve A3, high vacuum flapper valve A3 is connected with the three-way pipeline, one end of the three-way pipeline is connected ...
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