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A chemical mechanical polishing fluid for polycrystalline YAG ceramics

A ceramic chemical and mechanical polishing technology, applied in polishing compositions containing abrasives, etc., can solve the problems of crystal phase reaction rate difference, polycrystalline YAG is not suitable, and the polishing liquid system has not yet been found, so as to suppress the grain boundary height difference. , The effect of high material removal efficiency and improved removal efficiency

Active Publication Date: 2022-06-07
DALIAN UNIV OF TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Patent (CN 109913133 A), patent (CN 103059738 A) and patent (CN 109913133 A) disclose YAG polishing fluids under several different acidic systems, which have a certain effect on the preparation of single crystal YAG, but due to polycrystalline YAG crystal The difference in the reaction rate of each crystal phase caused by the different phases is not applicable to polycrystalline YAG
Therefore, no effective polishing liquid system has been found for the preparation of ultra-smooth polycrystalline YAG

Method used

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  • A chemical mechanical polishing fluid for polycrystalline YAG ceramics
  • A chemical mechanical polishing fluid for polycrystalline YAG ceramics
  • A chemical mechanical polishing fluid for polycrystalline YAG ceramics

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Based on 100% of the total mass fraction of the polishing liquid, its components and mass percentages are as follows: 10wt% 20nm silica sol, 1wt% 20nm alumina abrasive grains, 0.5wt% cetyltrimethylammonium bromide, 88.5wt% %Deionized water.

[0029] The polycrystalline YAG ceramic chemical mechanical polishing liquid described in this embodiment is prepared by the following steps:

[0030] Rinse the beaker with deionized water and blow dry with nitrogen;

[0031] Add 88.5wt% deionized water to the cleaned beaker;

[0032] Add 10wt% 20nm silica sol to the above deionized water and initially stir until uniform;

[0033] Add pH adjuster citric acid to adjust the pH of the solution to 7;

[0034] Add 1wt% of 20nm alumina abrasive grains and perform ultrasonic stirring for 10min;

[0035] Add 0.5wt% cetyltrimethylammonium bromide and stir;

[0036] The above mixed liquid was placed in a water bath and sonicated for 30 minutes and stirred until uniformly mixed.

[0037]...

Embodiment 2

[0039] Based on 100% of the total mass fraction of the polishing liquid, its components and mass percentages are as follows: 20wt% 20nm silica sol, 3wt% 1μm alumina abrasive particles, 0.3wt% fatty acid polyethylene glycol ester, 76.7wt% deionized water .

[0040] The polycrystalline YAG ceramic chemical mechanical polishing liquid described in this embodiment is prepared by the following steps:

[0041] Rinse the beaker with deionized water and blow dry with nitrogen;

[0042] Add 76.7wt% deionized water to the cleaned beaker;

[0043] Add 20wt% 20nm silica sol to the above deionized water and initially stir until uniform;

[0044] Add pH adjuster citric acid to adjust pH to 7;

[0045] Add 3wt% of 1μm alumina abrasive grains and perform ultrasonic stirring for 10min;

[0046] Add 0.3wt% fatty acid polyethylene glycol ester;

[0047] The above mixed liquid was placed in a water bath and sonicated for 30 minutes and stirred until uniformly mixed.

[0048] The polishing exp...

Embodiment 3

[0050] Based on 100% of the total mass fraction of the polishing liquid, its components and mass percentages are as follows: 30wt% 50nm silica sol, 5wt% 1μm alumina abrasive grains, 0.1wt% cetyltrimethylammonium bromide and stir, 64.9 wt% deionized water.

[0051] Appropriate amount of pH adjuster, each substance is uniformly mixed by ultrasonic in deionized water.

[0052] The polycrystalline YAG ceramic chemical mechanical polishing liquid described in this embodiment is prepared by the following steps:

[0053] Rinse the beaker with deionized water and blow dry with nitrogen;

[0054] Add 64.9wt% deionized water to the cleaned beaker;

[0055] Add 30wt% 50nm silica sol to the above deionized water and initially stir until uniform;

[0056] Add pH adjuster citric acid to adjust pH to 7;

[0057] Add 5wt% of 1μm alumina abrasive grains and perform ultrasonic stirring for 10min;

[0058] Add 0.1wt% cetyltrimethylammonium bromide and stir;

[0059] The above mixed liquid ...

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Abstract

The invention discloses a polycrystalline YAG ceramic chemical mechanical polishing fluid, which belongs to the technical field of precision / ultraprecision processing. The polycrystalline YAG ceramic chemical mechanical polishing fluid has a pH of 7 and contains two parts: a solute and a solvent: the solvent is deionized water. Based on 100% of the total mass fraction of the polishing liquid, its components and mass percentages are as follows: 10-30 wt% silica sol, 1-5 wt% alumina abrasive grains, 0.1-0.5 wt% abrasive grain dispersant, appropriate pH Regulator, each substance is mixed uniformly by ultrasonic in deionized water. The ultra-smooth polishing of polycrystalline YAG ceramics can be realized by using the polishing liquid. The grain boundary height difference of the polished polycrystalline YAG crystal surface is significantly reduced, and an ultra-smooth and non-damaged polycrystalline YAG crystal surface can be obtained; In addition, the polishing liquid of the present invention has high material removal efficiency, which is significantly improved compared with the polishing liquid containing only silica sol or alumina.

Description

technical field [0001] The invention belongs to the technical field of precision / ultra-precision machining, and relates to a polishing liquid for chemical mechanical polishing of polycrystalline YAG ceramics. Background technique [0002] Polycrystalline yttrium aluminum garnet (YAG) has great potential in laser fabrication due to its advantages of controllable shape and size and controllable doping concentration compared with single crystal materials. In order to obtain a high-quality laser with a high output threshold, the crystal surface must be ultra-smooth and surface damage-free after ultra-precision machining. However, there are still many problems in the process of preparing YAG ceramics with high surface quality. On the one hand, YAG crystals have high wear resistance and hard brittleness, so they are usually susceptible to mechanical damage during growth and processing. In addition, they can also fail due to crack propagation if the thermal stress is excessive du...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 郭江张鹏飞潘博司立坤
Owner DALIAN UNIV OF TECH
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