A method for enhancing the fluorescence of molybdenum disulfide based on double L-type metasurface structure
A molybdenum disulfide and structure-enhancing technology, applied in the field of nanophotonics, can solve problems such as insufficient photoluminescence intensity, and achieve the effects of less processing process, simple process and enhanced intensity
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Embodiment 1
[0028] Example 1: as figure 1 As shown, the metasurface structure is a double-L chiral structure, which is fixed in the metal groove, no filler is arranged in the metal groove, and a single layer of molybdenum disulfide is suspended on the metasurface structure and is only monolithic with the metasurface structure. Surface-to-surface contact, and silicon oxide is used as the substrate at the bottom of the metal groove. The metasurface structure consists of several arrays of double-L chiral structures.
[0029] Among them, the array period is 0.4 μm, the metal thickness of the metasurface structure is 60 nm, and the metal groove material is silver, which has a small intrinsic loss.
[0030] In this embodiment, the single-layer molybdenum disulfide of the light-emitting material is only in contact with one side of the metal groove, thereby ensuring that the excited surface plasmon resonance has a small intrinsic loss. Secondly, the design of the suspended molybdenum disulfide ...
Embodiment 2
[0031] Example 2: as figure 2 , the silver nanoarray is composed of two L-like grooves, the size of which is shown in the figure. The two L-shaped structures have the same size parameters as each other and are centrally symmetric, forming a chiral structure. The distance between the two L-shaped structures is 40 nm, the long side is 140 nm, and the widths are 85 nm and 65 nm.
Embodiment 3
[0032] Example 3: as image 3 is the selected specific preparation flow chart based on the double L-type metasurface structure;
[0033] Step 1: Coating a layer of silver metal film on the silicon oxide substrate;
[0034] Step 2: The metal layer is etched, and a centrosymmetric double L-shaped metasurface chiral structure is constructed by focused ion beam etching;
[0035] Step 3: The monolayer of molybdenum disulfide is wet transferred to the upper surface of the metal tank of the post-treated sample;
[0036] In step 1, the coating method is one of electron beam evaporation method EBE, chemical vapor deposition method CVD, magnetron sputtering method and thermal evaporation method.
[0037] In step 2, the etching method is one of electron beam lithography EBL and focused ion beam etching FIB.
[0038] In step 3, the wet transfer method for transferring molybdenum disulfide to the metasurface structure is as follows: taking the film-formed molybdenum disulfide on a silic...
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