Polishing solution for germanium crystal and preparation method thereof
A polishing liquid and crystal technology, which is applied to polishing compositions containing abrasives and other directions, can solve the problems of high wafer roughness, easy scratching, complex chemical reagents, etc., and achieves low wafer roughness, not easy to scratch, Simple effect of chemical reagents
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[0022] Next, the preparation method of the polishing solution for germanium crystals according to the second aspect of the application is described, which is used to prepare the polishing solution for germanium crystals described in the second aspect of the application, which includes the steps: Step 1, adding the polishing agent under stirring conditions An organic solvent; Step 2, adding the pH additive into Step 1, stirring evenly to obtain a polishing solution.
[0023] In the method for preparing the polishing solution for germanium crystals according to the second aspect of the present application, in step 1, adding an organic solvent under stirring conditions facilitates better dispersion of the polishing agent in the organic solvent.
Embodiment 1
[0026] The polishing liquid for germanium crystal of the present embodiment is made up of the raw material of following content:
[0027] The particle size is 0.1um, the content of diamond powder with a concentration of 0.1g / L is 80%wt; the content of propylene glycol with a purity of 99% is 10%wt; the content of citric acid with a purity of 99% is 1%wt; the balance is deionized water ;
[0028] The preparation method of the above-mentioned germanium crystal polishing liquid is as follows:
[0029] Step 1, adding propylene glycol under the condition of stirring diamond powder and deionized water; Step 2, continuing to add citric acid with a good ratio, and stirring evenly to obtain a chemical mechanical polishing liquid.
Embodiment 2
[0031] The polishing liquid for germanium crystal of the present embodiment is made up of the raw material of following content:
[0032] The particle size is 0.3um, the content of diamond powder with a concentration of 0.5g / L is 40%wt; the content of propylene glycol with a purity of 99% is 50%wt; the content of citric acid with a purity of 99% is 2%wt; the balance is deionized water ;
[0033] The preparation method of the above-mentioned germanium crystal polishing liquid is as follows:
[0034] Step 1, adding propylene glycol under the condition of stirring diamond powder and deionized water; Step 2, continuing to add citric acid, stirring evenly to obtain a chemical mechanical polishing solution.
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