Polishing solution for germanium crystal and preparation method thereof

A polishing liquid and crystal technology, which is applied to polishing compositions containing abrasives and other directions, can solve the problems of high wafer roughness, easy scratching, complex chemical reagents, etc., and achieves low wafer roughness, not easy to scratch, Simple effect of chemical reagents

Inactive Publication Date: 2021-11-02
安徽光智科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, at present, the roughness of the polished wafer is high, and scratches are easy to occur. The chemical reagents of the polishing liquid are relatively complicated, resulting in low polishing efficiency. Therefore, the performance of the polishing liquid needs to be further improved.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0022] Next, the preparation method of the polishing solution for germanium crystals according to the second aspect of the application is described, which is used to prepare the polishing solution for germanium crystals described in the second aspect of the application, which includes the steps: Step 1, adding the polishing agent under stirring conditions An organic solvent; Step 2, adding the pH additive into Step 1, stirring evenly to obtain a polishing solution.

[0023] In the method for preparing the polishing solution for germanium crystals according to the second aspect of the present application, in step 1, adding an organic solvent under stirring conditions facilitates better dispersion of the polishing agent in the organic solvent.

Embodiment 1

[0026] The polishing liquid for germanium crystal of the present embodiment is made up of the raw material of following content:

[0027] The particle size is 0.1um, the content of diamond powder with a concentration of 0.1g / L is 80%wt; the content of propylene glycol with a purity of 99% is 10%wt; the content of citric acid with a purity of 99% is 1%wt; the balance is deionized water ;

[0028] The preparation method of the above-mentioned germanium crystal polishing liquid is as follows:

[0029] Step 1, adding propylene glycol under the condition of stirring diamond powder and deionized water; Step 2, continuing to add citric acid with a good ratio, and stirring evenly to obtain a chemical mechanical polishing liquid.

Embodiment 2

[0031] The polishing liquid for germanium crystal of the present embodiment is made up of the raw material of following content:

[0032] The particle size is 0.3um, the content of diamond powder with a concentration of 0.5g / L is 40%wt; the content of propylene glycol with a purity of 99% is 50%wt; the content of citric acid with a purity of 99% is 2%wt; the balance is deionized water ;

[0033] The preparation method of the above-mentioned germanium crystal polishing liquid is as follows:

[0034] Step 1, adding propylene glycol under the condition of stirring diamond powder and deionized water; Step 2, continuing to add citric acid, stirring evenly to obtain a chemical mechanical polishing solution.

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Abstract

The invention provides a polishing solution for germanium crystals. The polishing solution is mainly prepared from the following raw materials in percentage by weight: 20-80% of a polishing agent; 10%-50% of an organic solvent; 1%-30% of a pH value regulator; and the balance of deionized water. The invention also provides a preparation method of the polishing solution for the germanium crystal. The preparation method comprises the following steps: step 1, adding deionized water into the polishing agent, and adding an organic solvent under a stirring condition; and 2, adding the pH additive into the solution obtained in the step 1, and uniformly stirring to obtain the polishing solution. The polishing solution for the germanium crystal does not contain an oxidizing agent, does not contain heavy metal ions and has no pollution to the environment. The polished wafer has low roughness and is not easy to scratch, and the chemical reagent of the polishing solution is simple and is an ideal polishing solution material.

Description

technical field [0001] The invention relates to the technical field of surface processing, in particular to a polishing liquid for germanium crystals and a preparation method thereof. Background technique [0002] Germanium is a kind of off-white metalloid, shiny, hard, belonging to the carbon group, has obvious non-metallic properties, its chemical properties are stable, and it does not interact with air or water vapor at room temperature. The content of germanium in the earth's crust is about 0.0007%. It is one of the most dispersed elements in the earth's crust. There are almost no concentrated germanium ores. It is widely used in electronics, optics, chemical industry, biomedicine, energy and other high-tech fields. As an infrared optical material, germanium has the advantages of high infrared refractive index, wide infrared transmission range, small absorption coefficient, low dispersion rate, easy processing, flash and corrosion, etc. Materials for windows, lenses, pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 杨安黄雪丽尹士平
Owner 安徽光智科技有限公司
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