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Method for improving quality of trichlorosilane

A trichlorosilane and high-quality technology, which is applied in the direction of chemical instruments and methods, silicon compounds, halosilanes, etc., can solve problems such as difficult removal, achieve the effect of improving quality, avoiding overtemperature and overpressure, and improving quality

Pending Publication Date: 2021-11-30
SICHUAN YONGXIANG POLY SILICON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The boron and phosphorus impurities in the silicon powder participate in the reaction in the trichlorosilane synthesis furnace and the cold hydrogenation furnace to form borophosphorus compounds and methyl silane, which exist in the trichlorosilane liquid and can be removed by multi-stage rectification. However, in the high-purity rectification system, the light and heavy components of boron, phosphorus and methyl silane are still not easy to remove.

Method used

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  • Method for improving quality of trichlorosilane
  • Method for improving quality of trichlorosilane
  • Method for improving quality of trichlorosilane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] This example is a method of increasing the quality of trichloride, mainly including an anti-disordered resin column and a resin adsorption column added in the synthetic distillation system. figure 1 A synthetic rectification process flow and a resin adsorption column of the present embodiment and an anti-disseminated resin column are included. Synthetic rectification process includes synthetic distillation raw materials, synthetic distillation 1 column, synthetic distillation 2 column, synthetic distillation 3 tower, synthetic distillation 4 column, synthetic distillation 5 column and synthetic rectification Level 6 tower.

[0027] When used, the synthesis, cold hydrogenated product liquid is supplied to the synthetic distillation raw material tank (V9101) and then enter the synthetic distillation 1 level tower for separation, the tower extrapolate the STC, the top of the tower is taken. TCS and DCS. Separated STC and slag evaporator (807-3, 807-4) STC together into the syn...

Embodiment 2

[0050] The resin adsorption column and an anti-disseminated resin column described in Example 1 are added to the existing synthetic distillation process system, and facilities such as a set of coolers, instruments, pipes, and valves are provided. The investment budget table is shown in Table 1 below.

[0051] Table 1 Investment Budget Form

[0052]

[0053] This example is expected to have a total investment of 530,000 yuan, of which the equipment fee is 400,000 yuan, and the supporting facilities are 130,000 yuan.

[0054] The process flow, installation, debugging, and resin drying, and then operates, after operation, after operation, after operation, after operation (30 days / 180 days), tetrachlorination Silicon product fluid, refined trichloride silica materials and polysilicon product quality are sampled, and the detection data is shown in Table 2, Table 3, Table 4, Table 5.

[0055] Table 2 Operation system material material sampling detection data

[0056]

[0057] Tabl...

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Abstract

The invention discloses a method for improving the quality of trichlorosilane, which comprises the following steps: mixing a trichlorosilane heavy component obtained by de-weighting when trichlorosilane is purified in synthetic rectification with a silicon tetrachloride product liquid, sequentially enabling the mixture to pass through a resin adsorption column and an anti-disproportionated resin column, and recycling the treated mixture as a synthetic rectification raw material so as to control the content of boron in the refined trichlorosilane material obtained by synthesis and rectification to be less than or equal to 0.06 ppb, the content of phosphorus to be 0.2-0.5 ppb, and the content of organic silicon to be 1-4 ppm. According to the method, the trichlorosilane heavy component circulated in synthesis rectification is mixed with silicon tetrachloride, boron, phosphorus and other impurities are removed, the mixture is repeatedly used for synthesis rectification to obtain refined trichlorosilane, and the purpose of improving the quality of refined trichlorosilane and polycrystalline silicon products is achieved.

Description

Technical field [0001] The present invention belongs to the field of polysilicon production, in particular, is a method of improving trichlorosily quality. Background technique [0002] With the development of the photovoltaic industry, especially the electronic industry, its requirements for polysilicon quality are continuously improved, and the quality of trichlorosilicon as the main raw material directly affects the quality and yield of polysilicon products. At present, due to the quality of raw material manufacturers, especially the amount of impurities such as boron tide and phosphorus trichloride in raw materials, the increase in mass production and quality of the enterprise has had a certain impact. In this case, the polysilicon enterprises seek new technical methods, and it is desirable to remove part of a part of trichloride, phosphorus phosphorus, etc., improve and stabilize the quality of the material, to ensure product quality. [0003] As a new type of adsorbent, the...

Claims

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Application Information

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IPC IPC(8): C01B33/107
CPCC01B33/10794C01B33/10784Y02P20/10
Inventor 官健刘逸枫罗轩袁野钟国俊
Owner SICHUAN YONGXIANG POLY SILICON
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